| EP3596756 - METHOD OF MANUFACTURING A PLURALITY OF CRYSTALLINE SEMICONDUCTOR ISLANDS OF VARYING LATTICE CONSTANT [Right-click to bookmark this link] | |||
| Former [2020/04] | GROWTH SUBSTRATE FOR FORMING OPTOELECTRONIC DEVICES, METHOD FOR PRODUCING SUCH A SUBSTRATE AND USE OF THE SUBSTRATE, IN PARTICULAR IN THE FIELD OF MICRO-DISPLAYS | ||
| [2022/32] | Status | No opposition filed within time limit Status updated on 22.12.2023 Database last updated on 28.03.2026 | |
| Former | The patent has been granted Status updated on 13.01.2023 | ||
| Former | Grant of patent is intended Status updated on 17.10.2022 | ||
| Former | Examination is in progress Status updated on 10.12.2021 | ||
| Former | Request for examination was made Status updated on 20.12.2019 | ||
| Former | The international publication has been made Status updated on 22.09.2018 | ||
| Former | unknown Status updated on 11.04.2018 | Most recent event Tooltip | 19.12.2025 | Lapse of the patent in a contracting state New state(s): TR | published on 21.01.2026 [2026/04] | Applicant(s) | For all designated states Soitec Parc Technologique des Fontaines Chemin des Franques 38190 Bernin / FR | [2020/04] | Inventor(s) | 01 /
SOTTA, David 19 rue Louis et Auguste Lumière 38100 Grenoble / FR | 02 /
LEDOUX, Olivier 11 rue Masséna 38100 Grenoble / FR | 03 /
BONNIN, Olivier 4 rue du Fiaret 38320 Bresson / FR | 04 /
BETHOUX, Jean-Marc 672 Route du Gros Bois 38500 La Buisse / FR | 05 /
LOGIOU, Morgane 248 rue Maurice Carême 38920 Crolles / FR | 06 /
CAULMILONE, Raphaël La Reina Route des 3 villages 38660 Saint Pancrasse / FR | [2020/04] | Representative(s) | IP Trust 2, rue de Clichy 75009 Paris / FR | [2020/04] | Application number, filing date | 18714309.4 | 14.03.2018 | [2020/04] | WO2018FR50606 | Priority number, date | FR20170052230 | 17.03.2017 Original published format: FR 1752230 | FR20180052155 | 13.03.2018 Original published format: FR 1852155 | FR20180052156 | 13.03.2018 Original published format: FR 1852156 | [2020/04] | Filing language | FR | Procedural language | FR | Publication | Type: | A2 Application without search report | No.: | WO2018167426 | Date: | 20.09.2018 | Language: | FR | [2018/38] | Type: | A2 Application without search report | No.: | EP3596756 | Date: | 22.01.2020 | Language: | FR | The application published by WIPO in one of the EPO official languages on 20.09.2018 takes the place of the publication of the European patent application. | [2020/04] | Type: | B1 Patent specification | No.: | EP3596756 | Date: | 15.02.2023 | Language: | FR | [2023/07] | Search report(s) | International search report - published on: | EP | 22.11.2018 | Classification | IPC: | H01L25/075, H01L21/02, H01L33/00, H01L33/02 | [2020/04] | CPC: |
H10W90/00 (EP,KR);
H10H20/01335 (US);
H10H20/018 (EP,KR);
H10H20/817 (KR);
H10H20/819 (KR);
H10H20/8215 (EP,KR);
H10W10/011 (KR)
(-)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2020/04] | Extension states | BA | Not yet paid | ME | Not yet paid | Validation states | KH | Not yet paid | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | VERFAHREN ZUR HERSTELLUNG EINER MEHRZAHL VON KRISTALLINEN HALBLEITERINSELN MIT VARIIERENDER GITTERKONSTANTE | [2022/32] | English: | METHOD OF MANUFACTURING A PLURALITY OF CRYSTALLINE SEMICONDUCTOR ISLANDS OF VARYING LATTICE CONSTANT | [2022/32] | French: | PROCÉDÉ DE FABRICATION D'UNE PLURALITÉ D'ÎLOTS SEMI-CONDUCTEURS CRISTALLINS PRÉSENTANT UNE VARIÉTÉ DE PARAMÈTRES DE MAILLE | [2022/32] |
| Former [2020/04] | WACHSTUMSSUBSTRAT ZUR BILDUNG OPTOELEKTRONISCHER VORRICHTUNGEN, VERFAHREN ZUR HERSTELLUNG SOLCH EINES SUBSTRATS UND VERWENDUNG DES SUBSTRATS, INSBESONDERE IM BEREICH DER MIKRODISPLAYS | ||
| Former [2020/04] | GROWTH SUBSTRATE FOR FORMING OPTOELECTRONIC DEVICES, METHOD FOR PRODUCING SUCH A SUBSTRATE AND USE OF THE SUBSTRATE, IN PARTICULAR IN THE FIELD OF MICRO-DISPLAYS | ||
| Former [2020/04] | SUBSTRAT DE CROISSANCE POUR LA FORMATION DE DISPOSITIFS OPTOELECTRONIQUES, PROCEDE DE FABRICATION D'UN TEL SUBSTRAT, ET UTILISATION DU SUBSTRAT NOTAMMENT DANS LE DOMAINE DES MICRO-ECRANS D'AFFICHAGE | Entry into regional phase | 28.08.2019 | National basic fee paid | 28.08.2019 | Designation fee(s) paid | 28.08.2019 | Examination fee paid | Examination procedure | 28.08.2019 | Amendment by applicant (claims and/or description) | 28.08.2019 | Examination requested [2020/04] | 28.08.2019 | Date on which the examining division has become responsible | 14.12.2021 | Despatch of a communication from the examining division (Time limit: M04) | 14.03.2022 | Reply to a communication from the examining division | 18.10.2022 | Communication of intention to grant the patent | 28.12.2022 | Receipt of the translation of the claim(s) | 29.12.2022 | Fee for grant paid | 29.12.2022 | Fee for publishing/printing paid | Divisional application(s) | EP22161925.7 / EP4033531 | Opposition(s) | 16.11.2023 | No opposition filed within time limit [2024/04] | Fees paid | Renewal fee | 20.03.2020 | Renewal fee patent year 03 | 12.03.2021 | Renewal fee patent year 04 | 16.02.2022 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | CY | 14.03.2018 | HU | 14.03.2018 | AT | 15.02.2023 | BG | 15.02.2023 | CZ | 15.02.2023 | DK | 15.02.2023 | EE | 15.02.2023 | ES | 15.02.2023 | FI | 15.02.2023 | HR | 15.02.2023 | IT | 15.02.2023 | LT | 15.02.2023 | LV | 15.02.2023 | MC | 15.02.2023 | NL | 15.02.2023 | PL | 15.02.2023 | RO | 15.02.2023 | RS | 15.02.2023 | SE | 15.02.2023 | SI | 15.02.2023 | SK | 15.02.2023 | SM | 15.02.2023 | TR | 15.02.2023 | LU | 14.03.2023 | BE | 31.03.2023 | CH | 31.03.2023 | LI | 31.03.2023 | NO | 15.05.2023 | GR | 16.05.2023 | IS | 15.06.2023 | PT | 15.06.2023 | [2026/04] |
| Former [2025/39] | CY | 14.03.2018 | |
| HU | 14.03.2018 | ||
| AT | 15.02.2023 | ||
| BG | 15.02.2023 | ||
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| IT | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| MC | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SI | 15.02.2023 | ||
| SK | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| LU | 14.03.2023 | ||
| BE | 31.03.2023 | ||
| CH | 31.03.2023 | ||
| LI | 31.03.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2025/36] | CY | 14.03.2018 | |
| AT | 15.02.2023 | ||
| BG | 15.02.2023 | ||
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| IT | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| MC | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SI | 15.02.2023 | ||
| SK | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| LU | 14.03.2023 | ||
| BE | 31.03.2023 | ||
| CH | 31.03.2023 | ||
| LI | 31.03.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2024/51] | AT | 15.02.2023 | |
| BG | 15.02.2023 | ||
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| IT | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| MC | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SI | 15.02.2023 | ||
| SK | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| LU | 14.03.2023 | ||
| BE | 31.03.2023 | ||
| CH | 31.03.2023 | ||
| LI | 31.03.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2024/26] | AT | 15.02.2023 | |
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| IT | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| MC | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SI | 15.02.2023 | ||
| SK | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| LU | 14.03.2023 | ||
| BE | 31.03.2023 | ||
| CH | 31.03.2023 | ||
| LI | 31.03.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2024/11] | AT | 15.02.2023 | |
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| MC | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SI | 15.02.2023 | ||
| SK | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| LU | 14.03.2023 | ||
| BE | 31.03.2023 | ||
| CH | 31.03.2023 | ||
| LI | 31.03.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2024/09] | AT | 15.02.2023 | |
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| MC | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SK | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| LU | 14.03.2023 | ||
| CH | 31.03.2023 | ||
| LI | 31.03.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2024/08] | AT | 15.02.2023 | |
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| MC | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SK | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| LU | 14.03.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2024/02] | AT | 15.02.2023 | |
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SK | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| LU | 14.03.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2023/50] | AT | 15.02.2023 | |
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SK | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2023/49] | AT | 15.02.2023 | |
| CZ | 15.02.2023 | ||
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RO | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2023/48] | AT | 15.02.2023 | |
| DK | 15.02.2023 | ||
| EE | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2023/46] | AT | 15.02.2023 | |
| DK | 15.02.2023 | ||
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| SM | 15.02.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2023/39] | AT | 15.02.2023 | |
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| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| IS | 15.06.2023 | ||
| PT | 15.06.2023 | ||
| Former [2023/38] | AT | 15.02.2023 | |
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
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| LT | 15.02.2023 | ||
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| NL | 15.02.2023 | ||
| PL | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| PT | 15.06.2023 | ||
| Former [2023/37] | AT | 15.02.2023 | |
| ES | 15.02.2023 | ||
| FI | 15.02.2023 | ||
| HR | 15.02.2023 | ||
| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| NL | 15.02.2023 | ||
| RS | 15.02.2023 | ||
| SE | 15.02.2023 | ||
| NO | 15.05.2023 | ||
| GR | 16.05.2023 | ||
| PT | 15.06.2023 | ||
| Former [2023/36] | AT | 15.02.2023 | |
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| LT | 15.02.2023 | ||
| LV | 15.02.2023 | ||
| NL | 15.02.2023 | ||
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| SE | 15.02.2023 | ||
| NO | 15.05.2023 | ||
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| Former [2023/35] | AT | 15.02.2023 | |
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| LT | 15.02.2023 | Cited in | International search | [XAI] US2009045394 (SMEETON TIM MICHAEL et al.) | [A] EP2151852 (S O I TEC SILICON et al.) | [A] EP2151856 (S O I TEC SILICON et al.) | [A] SEKIGUCHI HIROTO ET AL: "Emission color control from blue to red with nanocolumn diameter of InGaN/GaN nanocolumn arrays grown on same substrate", APPLIED PHYSICS LETTERS, A I P PUBLISHING LLC, US, vol. 96, no. 23, 7 June 2010 (2010-06-07), pages 231104 - 231104, XP012131471, ISSN: 0003-6951, DOI: 10.1063/1.3443734 DOI: http://dx.doi.org/10.1063/1.3443734 | [A] SHIODA T ET AL: "Selective Area Metal-Organic Vapor Phase Epitaxy of Nitride Semiconductors for Multicolor Emission", IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, vol. 15, no. 4, 1 July 2009 (2009-07-01), pages 1053 - 1065, XP011344263, ISSN: 1077-260X, DOI: 10.1109/JSTQE.2009.2015433 DOI: http://dx.doi.org/10.1109/JSTQE.2009.2015433 | Examination | EP0786149 | by applicant | EP2151852 | EP2151856 | EP2865021 | FR2936903 | US9478707 | ZHAO JUN LIU ET AL.: "360 PPI Flip-Chip Mounted Active Matrix Adressable Light Emitting Diode on Silicon (LEDoS) Micro-Displays", JOURNAL OF DISPLAY TECHNOLOGIE, April 2013 (2013-04-01) | YIN ET AL.: "Buckling suppression of SiGe islands on compliant substrates", JOURNAL OF APPLIED PHYSICS, vol. 94, no. 10, 2003, pages 6875 - 6882, XP055181038, DOI: doi:10.1063/1.1621069 DOI: http://dx.doi.org/10.1063/1.1621069 | M.V DURNEV ET AL.: "Strain effects on indium incorporation and optical transitions in green-light InGaN heterostructures of diffrent orientations", PHYS. STATUS SOLIDI A, vol. 208, no. 11, 2011, pages 2671 - 2675 | LIU ET AL.: "Monolithic LED Microdisplay on Active Matrix Substrate Using Flip-Chip Technology", IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, vol. 15, no. 4, July 2009 (2009-07-01), XP011344266, DOI: doi:10.1109/JSTQE.2009.2015675 DOI: http://dx.doi.org/10.1109/JSTQE.2009.2015675 |