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Extract from the Register of European Patents

EP About this file: EP3619630

EP3619630 - POWER GRID ARCHITECTURE AND OPTIMIZATION WITH EUV LITHOGRAPHY [Right-click to bookmark this link]
StatusExamination is in progress
Status updated on  08.07.2021
Database last updated on 14.09.2024
FormerRequest for examination was made
Status updated on  07.02.2020
FormerThe international publication has been made
Status updated on  09.11.2018
Formerunknown
Status updated on  28.05.2018
Most recent event   Tooltip28.08.2024New entry: Reply to examination report 
Applicant(s)For all designated states
Advanced Micro Devices, Inc.
2485 Augustine Drive
Santa Clara, CA 95054 / US
[2020/11]
Inventor(s)01 / SCULTZ, Richard T.
4243 Widgeon Street
Fort Collins, Colorado 80526 / US
 [2020/11]
Representative(s)Hancox, Jonathan Christopher
Venner Shipley LLP
Windsor House
6-10 Mount Ephraim Road
Tunbridge Wells, Kent TN1 1EE / GB
[N/P]
Former [2020/11]Brookes IP
Windsor House
6-10 Mount Ephraim Road
Tunbridge Wells, Kent TN1 1EE / GB
Application number, filing date18724699.627.04.2018
[2020/11]
WO2018US29760
Priority number, dateUS201762492705P01.05.2017         Original published format: US 201762492705 P
US20171563627828.06.2017         Original published format: US201715636278
[2020/11]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2018204179
Date:08.11.2018
Language:EN
[2018/45]
Type: A1 Application with search report 
No.:EP3619630
Date:11.03.2020
Language:EN
The application published by WIPO in one of the EPO official languages on 08.11.2018 takes the place of the publication of the European patent application.
[2020/11]
Search report(s)International search report - published on:EP08.11.2018
ClassificationIPC:G06F17/50, H01L23/528
[2020/11]
CPC:
G06F30/39 (EP,US); H01L27/0207 (EP,KR,US); G06F30/392 (US);
G06F30/394 (EP,US); G06F30/398 (US); H01L23/5286 (EP,KR,US);
H01L27/11807 (EP); G06F2119/06 (US); H01L2027/11881 (EP,KR,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2020/11]
TitleGerman:STROMNETZARCHITEKTUR UND -OPTIMIERUNG MIT EUV-LITHOGRAPHIE[2020/11]
English:POWER GRID ARCHITECTURE AND OPTIMIZATION WITH EUV LITHOGRAPHY[2020/11]
French:ARCHITECTURE ET OPTIMISATION DE RÉSEAU ÉLECTRIQUE AVEC LITHOGRAPHIE EUV[2020/11]
Entry into regional phase26.11.2019National basic fee paid 
26.11.2019Designation fee(s) paid 
26.11.2019Examination fee paid 
Examination procedure26.11.2019Examination requested  [2020/11]
26.11.2019Date on which the examining division has become responsible
12.06.2020Amendment by applicant (claims and/or description)
07.07.2021Despatch of a communication from the examining division (Time limit: M06)
17.01.2022Reply to a communication from the examining division
28.02.2024Despatch of a communication from the examining division (Time limit: M06)
28.08.2024Reply to a communication from the examining division
Fees paidRenewal fee
31.03.2020Renewal fee patent year 03
15.04.2021Renewal fee patent year 04
31.03.2022Renewal fee patent year 05
20.03.2023Renewal fee patent year 06
29.03.2024Renewal fee patent year 07
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Cited inInternational search[I]US6609242  (SLADE JEREMY GLEN [US]);
 [A]US2013154128  (WANG CHUNG-HSING [TW], et al);
 [I]US2014252650  (UTSUMI TETSUAKI [JP])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.