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Extract from the Register of European Patents

EP About this file: EP3642674

EP3642674 - MAGNIFICATION COMPENSATION AND/OR BEAM STEERING IN OPTICAL SYSTEMS [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  19.01.2024
Database last updated on 31.08.2024
FormerThe patent has been granted
Status updated on  10.02.2023
FormerGrant of patent is intended
Status updated on  16.10.2022
FormerRequest for examination was made
Status updated on  27.03.2020
FormerThe international publication has been made
Status updated on  31.12.2018
Formerunknown
Status updated on  20.07.2018
Most recent event   Tooltip24.05.2024Lapse of the patent in a contracting state
New state(s): IT		published on 26.06.2024  [2024/26]
Applicant(s)For all designated states
SUSS MicroTec Solutions GmbH & Co. KG
Ferdinand-von-Steinbeis-Ring 10
75447 Sternenfels / DE
[2022/50]
Former [2022/48]For all designated states
Süss Microtec Photomask Equipment GmbH & Co. KG
Ferdinand-von-Steinbeis-Ring 10
75447 Sternenfels / DE
Former [2020/18]For all designated states
SUSS MicroTec Photonic Systems Inc.
220 Klug Circle
Corona, CA 92880 / US
Inventor(s)01 / YUAN, Yanrong
220 Klug Circle
Corona, California 92880 / US
02 / BJORKMAN, John
220 Klug Circle
Corona, California 92880 / US
03 / FERRARI, Paul
220 Klug Circle
Corona, California 92880 / US
04 / HANSEN, Jeff
220 Klug Circle
Corona, California 92880 / US
 [2020/18]
Representative(s)Prinz & Partner mbB
Patent- und Rechtsanwälte
Rundfunkplatz 2
80335 München / DE
[N/P]
Former [2023/11]Murgitroyd & Company
Murgitroyd House
165-169 Scotland Street
Glasgow G5 8PL / GB
Former [2020/18]Hanna Moore + Curley
Garryard House
25/26 Earlsfort Terrace
Dublin 2, D02 PX51 / IE
Application number, filing date18738170.218.06.2018
[2020/18]
WO2018US38119
Priority number, dateUS201762522062P19.06.2017         Original published format: US 201762522062 P
[2020/18]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2018236770
Date:27.12.2018
Language:EN
[2018/52]
Type: A1 Application with search report 
No.:EP3642674
Date:29.04.2020
Language:EN
The application published by WIPO in one of the EPO official languages on 27.12.2018 takes the place of the publication of the European patent application.
[2020/18]
Type: B1 Patent specification 
No.:EP3642674
Date:15.03.2023
Language:EN
[2023/11]
Search report(s)International search report - published on:EP27.12.2018
ClassificationIPC:G03F7/20, G02B15/00, G02B13/26, G02B15/177
[2022/42]
CPC:
G03F7/70225 (EP,KR,US); G02B17/0896 (KR,US); G02B15/177 (EP,KR);
G02B17/008 (KR,US); G02B17/0892 (KR,US); G02B7/09 (KR,US);
G02B7/102 (KR,US); G03B13/26 (KR); G03F7/70191 (KR,US);
G03F7/70258 (EP,KR,US); H01L21/682 (KR,US); G02B13/26 (EP,US) (-)
Former IPC [2020/18]G03F7/20, G02B13/26, G02B15/00
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2020/18]
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:VERGRÖSSERUNGSKOMPENSATION UND/ODER STRAHLLENKUNG IN OPTISCHEN SYSTEMEN[2020/18]
English:MAGNIFICATION COMPENSATION AND/OR BEAM STEERING IN OPTICAL SYSTEMS[2020/18]
French:COMPENSATION DE GROSSISSEMENT ET/OU ORIENTATION DE FAISCEAU DANS DES SYSTÈMES OPTIQUES[2020/18]
Entry into regional phase09.01.2020National basic fee paid 
09.01.2020Designation fee(s) paid 
09.01.2020Examination fee paid 
Examination procedure09.01.2020Examination requested  [2020/18]
09.01.2020Date on which the examining division has become responsible
07.08.2020Amendment by applicant (claims and/or description)
17.10.2022Communication of intention to grant the patent
30.01.2023Fee for grant paid
30.01.2023Fee for publishing/printing paid
30.01.2023Receipt of the translation of the claim(s)
Opposition(s)18.12.2023No opposition filed within time limit [2024/08]
Fees paidRenewal fee
29.06.2020Renewal fee patent year 03
28.06.2021Renewal fee patent year 04
27.06.2022Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipCZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
IT15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
GB18.06.2023
IE18.06.2023
LU18.06.2023
BE30.06.2023
CH30.06.2023
IS15.07.2023
[2024/26]
Former [2024/24]CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
GB18.06.2023
IE18.06.2023
LU18.06.2023
BE30.06.2023
CH30.06.2023
IS15.07.2023
Former [2024/21]CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IE18.06.2023
LU18.06.2023
IS15.07.2023
Former [2024/15]CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
LU18.06.2023
IS15.07.2023
Former [2024/10]CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SI15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IS15.07.2023
Former [2024/09]CZ15.03.2023
DK15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
MC15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IS15.07.2023
Former [2023/50]CZ15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
PL15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SK15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
IS15.07.2023
Former [2023/49]CZ15.03.2023
EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
RO15.03.2023
RS15.03.2023
SE15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
Former [2023/48]EE15.03.2023
ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
RS15.03.2023
SE15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
Former [2023/46]ES15.03.2023
FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
RS15.03.2023
SE15.03.2023
SM15.03.2023
NO15.06.2023
GR16.06.2023
Former [2023/37]FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
RS15.03.2023
SE15.03.2023
NO15.06.2023
GR16.06.2023
Former [2023/36]FI15.03.2023
HR15.03.2023
LT15.03.2023
LV15.03.2023
RS15.03.2023
SE15.03.2023
NO15.06.2023
Former [2023/35]HR15.03.2023
LT15.03.2023
RS15.03.2023
NO15.06.2023
Former [2023/34]LT15.03.2023
RS15.03.2023
Former [2023/33]LT15.03.2023
Cited inInternational search[Y]US5557469  (MARKLE DAVID A [US], et al) [Y] 7 * column 7, lines 16-44; figures 5, 8a-c ** column 8, lines 25-39 *;
 [XAY]EP0815480  (ETEC SYSTEMS INC [US]) [X] 17,18,20,22,23,25,26 * paragraphs [0065] - [0069]; figure 7a * [A] 24 [Y] 3,4,6,7,12,14,19,21,27;
 [X]US2006001855  (LOF JOERI [NL], et al) [X] 1,8-10,15,16 * paragraphs [0105] , [ 106]; figure 2; claim 16 *;
 [Y]US2008192216  (TANAKA MASASHI [JP], et al) [Y] 19,21,27 * paragraphs [0262] - [ 264]; figure 33 *;
 [XAY]WO2016066076  (SHANGHAI MICROELECTRONICS EQUI [CN]) [X] 1,2,11 * figures 1, 2a * [A] 5,13 [Y] 3,4,6,7,12,14;
 [P]US2017322493  (SUN JINGLU [CN]) [P] * paragraphs [0052] - [0072]; figures 1, 2a; claim 16 *
ExaminationEP0815480
by applicantUS5559629
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.