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Extract from the Register of European Patents

EP About this file: EP3584636

EP3584636 - PELLICLE, USE OF A PELLICLE IN AN EXPOSURE ORIGINAL PLATE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD [Right-click to bookmark this link]
Former [2019/52]PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
[2021/29]
StatusThe application is deemed to be withdrawn
Status updated on  25.03.2022
Database last updated on 30.03.2026
FormerGrant of patent is intended
Status updated on  04.07.2021
FormerRequest for examination was made
Status updated on  22.11.2019
FormerThe international publication has been made
Status updated on  25.08.2018
Most recent event   Tooltip25.03.2022Application deemed to be withdrawnpublished on 27.04.2022  [2022/17]
Applicant(s)For all designated states
Mitsui Chemicals, Inc.
5-2, Higashi-Shimbashi 1-chome
Minato-ku
Tokyo 105-7122 / JP
[2019/52]
Inventor(s)01 / KOHMURA Kazuo
c/o Mitsui Chemicals Inc.
580-32 Nagaura
Sodegaura-shi Chiba 299-0265 / JP
02 / ONO Yosuke
c/o Mitsui Chemicals Inc.
580-32 Nagaura
Sodegaura-shi Chiba 299-0265 / JP
03 / OKUBO Atsushi
c/o Mitsui Chemicals Inc.
580-32 Nagaura
Sodegaura-shi Chiba 299-0265 / JP
04 / TANEICHI Daiki
c/o Mitsui Chemicals Inc.
1-2 Waki 6-chome
Wakicho
Kuga-gun Yamaguchi 740-0061 / JP
05 / ISHIKAWA Hisako
c/o Mitsui Chemicals Inc.
580-32 Nagaura
Sodegaura-shi Chiba 299-0265 / JP
06 / BIYAJIMA Tsuneaki
c/o Mitsui Chemicals Inc.
1-2 Waki 6-chome
Wakicho
Kuga-gun Yamaguchi 740-0061 / JP
 [2019/52]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2019/52]
Application number, filing date18754194.109.02.2018
[2019/52]
WO2018JP04726
Priority number, dateJP2017002774217.02.2017         Original published format: JP 2017027742
[2019/52]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2018151056
Date:23.08.2018
Language:JA
[2018/34]
Type: A1 Application with search report 
No.:EP3584636
Date:25.12.2019
Language:EN
[2019/52]
Search report(s)International search report - published on:JP23.08.2018
(Supplementary) European search report - dispatched on:EP01.12.2020
ClassificationIPC:G03F1/62, G03F1/64, G03F1/24
[2021/01]
CPC:
G03F1/62 (EP,US); G03F1/64 (EP,KR,US); G03F1/24 (EP,US);
G03F1/66 (KR); G03F7/2004 (KR,US); G03F7/70033 (KR)
Former IPC [2019/52]G03F1/64, G03F7/20
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2019/52]
TitleGerman:PELLIKEL, VERWENDUNG DES PELLIKELS IN EINER BELICHTUNGSORIGINALPLATTE, UND HALBLEITERBAUELEMENTHERSTELLUNGSVERFAHREN[2021/29]
English:PELLICLE, USE OF A PELLICLE IN AN EXPOSURE ORIGINAL PLATE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD[2021/29]
French:PELLICULE, UTILISATION D'UNE PELLICULE DANS UN PLAQUE ORIGINALE D'EXPOSITION, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF SEMI-CONDUCTEUR[2021/29]
Former [2019/52]PELLIKEL, BELICHTUNGSORIGINALPLATTE, BELICHTUNGSVORRICHTUNG UND HALBLEITERBAUELEMENTHERSTELLUNGSVERFAHREN
Former [2019/52]PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
Former [2019/52]PELLICULE, PLAQUE ORIGINALE D'EXPOSITION, DISPOSITIF D'EXPOSITION ET PROCÉDÉ DE FABRICATION DE DISPOSITIF SEMI-CONDUCTEUR
Entry into regional phase02.09.2019Translation filed 
02.09.2019National basic fee paid 
02.09.2019Search fee paid 
02.09.2019Designation fee(s) paid 
02.09.2019Examination fee paid 
Examination procedure02.09.2019Examination requested  [2019/52]
02.03.2021Amendment by applicant (claims and/or description)
05.07.2021Communication of intention to grant the patent
16.11.2021Application deemed to be withdrawn, date of legal effect  [2022/17]
07.12.2021Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time  [2022/17]
Fees paidRenewal fee
21.02.2020Renewal fee patent year 03
10.02.2021Renewal fee patent year 04
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Documents cited:Search[A] JP2009169380  (MITSUI CHEMICALS INC et al.) [A] 1-13 * paragraphs [0015] - [0021]; figure 1 *
 [A] JPH0619124  (SEIKO EPSON CORP et al.) [A] 1-13 * paragraphs [0024] - [0028]; figures 3a,3b,4a,4b *
International search[XY] JP2001343738  (ASAHI KASEI DENSHI KK et al.) [X] 1, 4-7, 9-11, 13 * , paragraphs [0001], [0018]-[0020], [0032], [0037]-[0039], fig. 1(a), (b) (Family: none) *[Y] 2-3, 8
 [XY] WO2016079051  (ASML NETHERLANDS BV et al.) [X] 1, 4-7, 9-13 * , paragraphs [0002], [0003], [0275], [0292]-[0294], fig. 11 & TW 201619692 A *[Y] 2-3, 8
 [Y] WO2015166927  (MITSUI CHEMICALS INC et al.) [Y] 2-3, 8 * , paragraphs [0052]-[0059], fig. 8 & EP 3118683 A1, paragraphs [0144]-[0159], fig. 8 & TW 201543141 A *
 [Y] WO2016043301  (MITSUI CHEMICALS INC et al.) [Y] 2-3 * , paragraphs [0050]-[0070], fig. 1, 2(a), (b) & US 2017/0184957 Al, paragraphs [0111]-[0131], fig. 1, 2A, 2B & TW 201614367 A *
 [Y] JP2013097308  (SHINETSU CHEMICAL CO et al.) [Y] 8 * , paragraph [0004] & CN 103091975 A *
 [A] US2007287074  (PAS SYLVIA D et al.) [A] 1-13 * , entire text, all drawings (Family: none) *
by applicantWO2016124536
   B. L. HENKEE. M. GULLIKSONJ. C. DAVIS: "X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50?30,000 eV, Z = 1 - 92", AT. DATA NUCL. DATA TABLES, vol. 54, 1993, pages 181 [Y] 2-3, 8
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.