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EP3594741
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EP About this file: EP3594741
| EP3594741 - PATTERN FORMING METHOD FOR LIQUID CRYSTAL ALIGNMENT OF ZENITHAL BI-STABLE LIQUID CRYSTAL PANEL, LIQUID CRYSTAL-ALIGNED SUBSTRATE INCLUDING PATTERN FORMED THEREBY, AND MASK SUBSTRATE USED IN FORMATION OF PATTERN [Right-click to bookmark this link] | Status | Examination is in progress Status updated on 29.05.2020 Database last updated on 02.11.2024 | |
| Former | Request for examination was made Status updated on 13.12.2019 | ||
| Former | The international publication has been made Status updated on 17.09.2018 | Most recent event Tooltip | 21.02.2024 | New entry: Renewal fee paid | Applicant(s) | For all designated states LG Chem, Ltd. 128 Yeoui-daero Yeongdeungpo-gu Seoul 07336 / KR | [2020/03] | Inventor(s) | 01 /
CHOO, So Young LG Chem Research Park 188 Munji-ro Yuseong-gu Daejeon 34122 / KR | 02 /
LEE, Jin Soo LG Chem Research Park 188 Munji-ro Yuseong-gu Daejeon 34122 / KR | 03 /
HER, Eun Kyu LG Chem Research Park 188 Munji-ro Yuseong-gu Daejeon 34122 / KR | 04 /
SHIN, Bu Gon LG Chem Research Park 188 Munji-ro Yuseong-gu Daejeon 34122 / KR | [2020/03] | Representative(s) | Goddar, Heinz J. Boehmert & Boehmert Anwaltspartnerschaft mbB Pettenkoferstrasse 22 80336 München / DE | [2020/03] | Application number, filing date | 18763943.0 | 13.02.2018 | [2020/03] | WO2018KR01898 | Priority number, date | KR20170028839 | 07.03.2017 Original published format: KR 20170028839 | [2020/03] | Filing language | KO | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2018164388 | Date: | 13.09.2018 | Language: | KO | [2018/37] | Type: | A1 Application with search report | No.: | EP3594741 | Date: | 15.01.2020 | Language: | EN | [2020/03] | Search report(s) | International search report - published on: | KR | 13.09.2018 | (Supplementary) European search report - dispatched on: | EP | 07.02.2020 | Classification | IPC: | G02F1/1337, G02F1/139 | [2020/11] | CPC: |
G02F1/1337 (EP);
G02F1/13378 (KR,US);
G02F1/133749 (KR);
G02F1/133792 (EP,KR,US);
G02F1/139 (EP);
G02F1/1391 (EP,US);
|
| Former IPC [2020/03] | G02F1/1337 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2020/03] | Title | German: | VERFAHREN ZUR MUSTERBILDUNG FÜR DIE FLÜSSIGKRISTALLINE AUSRICHTUNG EINER ZENITHALEN BISTABILEN FLÜSSIGKRISTALLTAFEL, FLÜSSIGKRISTALLAUSGERICHTETES SUBSTRAT MIT DADURCH GEBILDETEM MUSTER UND MASKENSUBSTRAT ZUR BILDUNG VON MUSTERN | [2020/03] | English: | PATTERN FORMING METHOD FOR LIQUID CRYSTAL ALIGNMENT OF ZENITHAL BI-STABLE LIQUID CRYSTAL PANEL, LIQUID CRYSTAL-ALIGNED SUBSTRATE INCLUDING PATTERN FORMED THEREBY, AND MASK SUBSTRATE USED IN FORMATION OF PATTERN | [2020/03] | French: | PROCÉDÉ DE FORMATION D'UN MOTIF PERMETTANT L'ALIGNEMENT DE CRISTAUX LIQUIDES D'UN PANNEAU À CRISTAUX LIQUIDES BISTABLE ZÉNITHAL, SUBSTRAT À CRISTAUX LIQUIDES COMPRENANT UN MOTIF AINSI FORMÉ, ET SUBSTRAT DE MASQUE UTILISÉ DANS LA FORMATION D'UN MOTIF | [2020/03] | Entry into regional phase | 24.07.2019 | Translation filed | 24.07.2019 | National basic fee paid | 24.07.2019 | Search fee paid | 24.07.2019 | Designation fee(s) paid | 24.07.2019 | Examination fee paid | Examination procedure | 24.07.2019 | Examination requested [2020/03] | 27.04.2020 | Amendment by applicant (claims and/or description) | 03.06.2020 | Despatch of a communication from the examining division (Time limit: M04) | 22.09.2020 | Reply to a communication from the examining division | 08.02.2021 | Despatch of a communication from the examining division (Time limit: M04) | 27.05.2021 | Reply to a communication from the examining division | 31.05.2022 | Despatch of a communication from the examining division (Time limit: M04) | 08.09.2022 | Reply to a communication from the examining division | Fees paid | Renewal fee | 25.02.2020 | Renewal fee patent year 03 | 24.02.2021 | Renewal fee patent year 04 | 23.02.2022 | Renewal fee patent year 05 | 23.02.2023 | Renewal fee patent year 06 | 21.02.2024 | Renewal fee patent year 07 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]US2005237471 (KAWAMURA TADASHI [JP]); | [Y]US2006115603 (FRANCIS MATTHEW [GB], et al) | International search | [Y]JPH11112014 (MITSUBISHI ELECTRIC CORP) [Y] 1-16 * ^ [0016], [0021]; 2, 6 *; | [Y]KR20090054746 (SAMSUNG ELECTRONICS CO LTD [KR], et al) [Y] 1-16 * [0004], [0074], [0113]; 9, 19; 4, 12 *; | [A]KR20150144936 (AND CORP [KR]) [A] 1-16 * [0028]-[0039]; 4a-4f *; | [A]JP2002287146 (SEIKO EPSON CORP) [A] 1-16 * [0042]-[0074]; 4-7 *; | [A]KR970004881B (ALPS ELECTRIC KK [JP]) [A] 1-16 * 1-3; 1-4 * | by applicant | KR20170028839 | KR20160039655 |