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EP3746738

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Extract from the Register of European Patents

EP About this file: EP3746738

EP3746738 - WAVELENGTH TRACKING SYSTEM, METHOD TO CALIBRATE A WAVELENGTH TRACKING SYSTEM, LITHOGRAPHIC APPARATUS, METHOD TO DETERMINE AN ABSOLUTE POSITION OF A MOVABLE OBJECT, AND INTERFEROMETER SYSTEM [Right-click to bookmark this link]
Status	Request for examination was made Status updated on 06.11.2020 Database last updated on 30.10.2024
Former	The international publication has been made Status updated on 10.08.2019
Former	unknown Status updated on 24.01.2019
Most recent event Tooltip	26.01.2024	New entry: Renewal fee paid
Applicant(s)	For all designated states ASML Netherlands B.V. P.O. Box 324 5500 AH Veldhoven / NL
	[2020/50]
Inventor(s)	01 / VAN DER PASCH, Engelbertus, Antonius, Fransiscus P.O. Box 324 5500 AH Veldhoven / NL
	02 / JANSEN, Maarten, Jozef PO Box 324 5500 AH Veldhoven / NL
	03 / COSIJNS, Suzanne, Johanna, Antonetta, Geertruda P.O. Box 324 5500 AH Veldhoven / NL
	04 / VAN DE MEERAKKER, Koen, Govert, Olivier PO Box 324 5500 AH Veldhoven / NL
	05 / WIDDERSHOVEN, Ivo P.O. Box 324 5500 AH Veldhoven / NL
	[2020/50]
Representative(s)	ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL
	[2020/50]
Application number, filing date	19700393.2	15.01.2019
	[2020/50]
	WO2019EP50848
Priority number, date	EP20180154460	31.01.2018 Original published format: EP 18154460
	EP20180197177	27.09.2018 Original published format: EP 18197177
	[2020/50]
Filing language	EN
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	WO2019149515
	Date:	08.08.2019
	Language:	EN
	[2019/32]
	Type:	A1 Application with search report
	No.:	EP3746738
	Date:	09.12.2020
	Language:	EN
	The application published by WIPO in one of the EPO official languages on 08.08.2019 takes the place of the publication of the European patent application.
	[2020/50]
Search report(s)	International search report - published on:	EP	08.08.2019
Classification	IPC:	G01B9/02, G03F7/20, G01J9/02	[2020/50]
	CPC:	G03F7/70725 (EP,KR,US); G01J9/0246 (EP,KR,US); G01B11/002 (US); G01B9/02002 (US); G01B9/02007 (US); G01B9/02028 (US); (+) G03F7/0002 (US); G01J2009/0261 (KR) (-)
Designated contracting states	AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2020/50]
Title	German:	WELLENLÄNGENVERFOLGUNGSSYSTEM, VERFAHREN ZUR KALIBRIERUNG EINES WELLENLÄNGENVERFOLGUNGSSYSTEMS, LITHOGRAFISCHER APPARAT, VERFAHREN ZUR BESTIMMUNG DER ABSOLUTEN POSITION EINES BEWEGLICHEN OBJEKTS UND INTERFEROMETERSYSTEM	[2020/50]
	English:	WAVELENGTH TRACKING SYSTEM, METHOD TO CALIBRATE A WAVELENGTH TRACKING SYSTEM, LITHOGRAPHIC APPARATUS, METHOD TO DETERMINE AN ABSOLUTE POSITION OF A MOVABLE OBJECT, AND INTERFEROMETER SYSTEM	[2020/50]
	French:	SYSTÈME DE SUIVI DE LONGUEUR D'ONDE, PROCÉDÉ D'ÉTALONNAGE D'UN SYSTÈME DE SUIVI DE LONGUEUR D'ONDE, APPAREIL LITHOGRAPHIQUE, PROCÉDÉ DE DÉTERMINATION D'UNE POSITION ABSOLUE D'UN OBJET MOBILE ET SYSTÈME D'INTERFÉROMÈTRE	[2020/50]
Entry into regional phase	27.07.2020	National basic fee paid
	27.07.2020	Designation fee(s) paid
	27.07.2020	Examination fee paid
Examination procedure	27.07.2020	Examination requested [2020/50]
	27.07.2020	Date on which the examining division has become responsible
	08.03.2021	Amendment by applicant (claims and/or description)
Fees paid	Renewal fee
	27.01.2021	Renewal fee patent year 03
	26.01.2022	Renewal fee patent year 04
	26.01.2023	Renewal fee patent year 05
	25.01.2024	Renewal fee patent year 06
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited in	International search	[Y]US4765741 (DETRO SCOTT M [US], et al) [Y] 10 * column 4, lines 13-46; figures 1,2 *;
		[XI]EP0401799 (CANON KK [JP]) [X] 16,21-23,27,37-40,43,45 * column 1, lines 8-17 * * column 4, line 57 - column 5, line 5 * * column 7, line 25 - column 10, line 47; figures 1,2,7 * [I] 46;
		[Y]EP0657713 (RENISHAW PLC [GB]) [Y] 1,4,8,9,11 * column 6, lines 3-48; figure 3 *;
		[X]US5539520 (TELLE HARALD [DE]) [X] 16,38 * column 2, lines 18-47 * * column 4, line 30 - column 7, line 24; figures 1,2 *;
		[Y]JP2000100704 (NEC CORP) [Y] 13-15 * abstract *;
		[A]US6573996 (DELIWALA SHRENIK [US], et al) [A] 1-46* sentence 36, paragraph 5 - sentence 50, paragraph 6; figures 1,2 *;
		[Y]US2006290937 (HIRATA TAKAAKI [JP], et al) [Y] 1-4,8-11,13-15 * paragraphs [0008] - [0015]; figures 13,14 *;
		[Y]JP2010238933 (ADVANCED MASK INSPECTION TECH) [Y] 13-15 * abstract *;
		[X]US2013148129 (WARDEN MATTHEW [GB], et al) [X] 16,28,30-32,38-42 * paragraphs [0009] - [0014] * * paragraphs [0036] - [0039] * * paragraphs [0080] - [0102]; figure 4 *;
		[YA]CN102564613B (SHANGHAI MICROELECTRONICS EQUI) [Y] 1-4,8-11,13-15 * paragraphs [0033] - [0054]; figure 3 * [A] 5-7,12;
		[X] - KARL-HEINZ BECHSTEIN ET AL, "Absolute interferometric distance measurements applying a variable synthetic wavelength", JOURNAL OF OPTICS, (19980601), vol. 29, no. 3, doi:10.1088/0150-536X/29/3/014, ISSN 0150-536X, pages 179 - 182, XP055051800 [X] 16,37,38 * the whole document * DOI: http://dx.doi.org/10.1088/0150-536X/29/3/014

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