EP3782190 - MULTI STACK OPTICAL ELEMENTS USING TEMPORARY AND PERMANENT BONDING [Right-click to bookmark this link] | Status | Examination is in progress Status updated on 01.03.2024 Database last updated on 19.10.2024 | |
Former | Request for examination was made Status updated on 22.01.2021 | ||
Former | The international publication has been made Status updated on 25.10.2019 | Most recent event Tooltip | 17.06.2024 | New entry: Reply to examination report | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue Santa Clara, California 95054 / US | [2021/08] | Inventor(s) | 01 /
GODET, Ludovic 299 W Washington Avenue Sunnyvale, California 94086 / US | 02 /
MCMILLAN, Wayne 1141 Mountain Quail Circle San Jose, California 95120 / US | 03 /
MEYER TIMMERMAN THIJSSEN, Rutger 1042 Michelangelo Drive Sunnyvale, California 94087 / US | 04 /
ARGAMAN, Naamah 1648 Fairwood Avenue San Jose, California 95125 / US | 05 /
ROY, Tapashree A1203 Spectra Palmwoods Nallurhalli Road Bangalore 560066 / IN | 06 /
DOSHAY, Sage 15555 Bohlman Road Saratoga, California 95070 / US | [2021/08] | Representative(s) | Zimmermann & Partner Patentanwälte mbB Postfach 330 920 80069 München / DE | [2021/08] | Application number, filing date | 19787886.1 | 21.02.2019 | [2021/08] | WO2019US18885 | Priority number, date | US201862658553P | 16.04.2018 Original published format: US 201862658553 P | US201862780536P | 17.12.2018 Original published format: US 201862780536 P | [2021/08] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2019203926 | Date: | 24.10.2019 | Language: | EN | [2019/43] | Type: | A1 Application with search report | No.: | EP3782190 | Date: | 24.02.2021 | Language: | EN | The application published by WIPO in one of the EPO official languages on 24.10.2019 takes the place of the publication of the European patent application. | [2021/08] | Search report(s) | International search report - published on: | KR | 24.10.2019 | (Supplementary) European search report - dispatched on: | EP | 31.03.2022 | Classification | IPC: | H01L21/768, H01L21/027, H01L21/52, H01L33/00, H01L27/146, G03F7/00, G02B5/18, // G02B3/00, H01L33/58 | [2022/02] | CPC: |
G02B5/1847 (EP);
H01L25/167 (KR,US);
H01L21/76816 (US);
H01L21/311 (US);
H01L21/32134 (US);
H01L25/043 (US);
H01L27/14643 (KR);
H01L33/58 (EP,KR);
H01S5/183 (KR);
H10K50/10 (KR);
G02B3/0012 (EP);
G02B5/1857 (EP);
H01L2933/0058 (EP,KR)
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Former IPC [2021/08] | H01L21/768, H01L21/027, H01L21/52, H01L33/00, H01L27/146, G03F7/00 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2021/08] | Title | German: | OPTISCHE MEHRSTAPELELEMENTE MIT VERWENDUNG TEMPORÄRER UND PERMANENTER BINDUNG | [2021/08] | English: | MULTI STACK OPTICAL ELEMENTS USING TEMPORARY AND PERMANENT BONDING | [2021/08] | French: | ÉLÉMENTS OPTIQUES À EMPILEMENTS MULTIPLES UTILISANT UNE LIAISON TEMPORAIRE ET PERMANENTE | [2021/08] | Entry into regional phase | 19.10.2020 | National basic fee paid | 19.10.2020 | Search fee paid | 19.10.2020 | Designation fee(s) paid | 19.10.2020 | Examination fee paid | Examination procedure | 19.10.2020 | Examination requested [2021/08] | 24.10.2022 | Amendment by applicant (claims and/or description) | 01.03.2024 | Despatch of a communication from the examining division (Time limit: M04) | 17.06.2024 | Reply to a communication from the examining division | Fees paid | Renewal fee | 19.02.2021 | Renewal fee patent year 03 | 17.02.2022 | Renewal fee patent year 04 | 22.02.2023 | Renewal fee patent year 05 | 20.02.2024 | Renewal fee patent year 06 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XI]US6411765 (ONO HIDEKI [JP]) [X] 1 * column 7, line 59 - column 8, line 6 * * column 8, lines 29-51 * * column 12, lines 46-56 * [I] 4; | [XI]US2005275944 (WANG JIAN J [US], et al) [X] 1-3 * figures 2,6 * * paragraphs [0004] , [0 65] , [0 66] , [0 74] , [ 101] * [I] 5; | [X]WO2008154473 (MICRON TECHNOLOGY INC [US], et al) [X] 12,14,15 * figures 4A-F * * claims 11, 12 ** paragraphs [0056] , [0 57] *; | [X]DE102016116748 (OSRAM OPTO SEMICONDUCTORS GMBH [DE]) [X] 12-15 * paragraphs [0014] , [0 16] , [0 17] , [0 25] , [0 26] , [0 32] * * figures 1-4 *; | [XI] - SHIN JU-HYEON ET AL, "Fabrication of functional nanosized patterns with UV-curable polysilsesquioxane on photovoltaic protective glass substrates using hybrid nano-imprint lithography", JOURNAL OF MATERIALS CHEMISTRY C, GB, (20140423), vol. 2, no. 29, doi:10.1039/C4TC00101J, ISSN 2050-7526, pages 5864 - 5869, XP055903340 [X] 6-8,11 * figure 3 * * section: Introduction section: Preparation of PV protective glass section: Fabricating Ni and PDMS molds and replicating anti reflection patterns on the PV protective glass * [I] 9,10 DOI: http://dx.doi.org/10.1039/C4TC00101J | [X] - JU KANG HO ET AL, "Improving light-emitting diode performance through sapphire substrate double-side patterning", OPTICAL ENGINEERING, SOC. OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, BELLINGHAM, vol. 52, no. 2, doi:10.1117/1.OE.52.2.023002, ISSN 0091-3286, (20130212), page 23002, (20130212), XP060025687 [X] 12 * figure 7 * * table 2 * * section 3 Nanoimprint Lithography * DOI: http://dx.doi.org/10.1117/1.OE.52.2.023002 | [X] - ROSSI MARKUS ET AL, "Optical module fabrication using nanoimprint technology", PROCEEDINGS OF SPIE, 1000 20th St. Bellingham WA 98225-6705 USA, (20060121), vol. 6110, doi:10.1117/12.646520, ISSN 0277-786X, ISBN 978-1-5106-4548-6, page 61100L, XP055903374 [X] 12,15 * page 2, lines 4-6, 30-32 * * figure 2 * * section 2 NIL process * DOI: http://dx.doi.org/10.1117/12.646520 | International search | [A]US2011284975 (BRAEUER JOERG [DE], et al) [A] 1-15 * See paragraph [0093] and figures 5-6. *; | [A]US2013143414 (THOMAS JAYAN [US], et al) [A] 1-15 * See paragraphs [0072]-[0085] and figures 1-2. *; | [A]KR20140073622 (KOREA MACH & MATERIALS INST [KR]) [A] 1-15* See paragraphs [0035]-[0072] and figures 1-5. *; | [A]US2015069523 (OR-BACH ZVI [US], et al) [A] 1-15 * See claim 1 and figures 1-5. *; | [A]US9537098 (LEE YEON KEUN [KR], et al) [A] 1-15 * See column 7, line 41 - column 8, line 34 and figure 5. * | by applicant | US6411765 | US2005275944 | WO2008154473 | DE102016116748 | - SHIN JU-HYEON et al., "Fabrication of Functional Nanosized Patterns With UV-Curable Polysilsesquioxane On Photovoltaic Protective Glass Substrates Using Hybrid NanoImprint Lithography", Journal of Materials Chemistry C | - ROSSI MARKUS et al., "Optical Module Fabrication Using Nanoimprint Technology", Proceedings Of SPIE |