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EP3837585
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EP About this file: EP3837585
| EP3837585 - PHOTORESIST-FREE PHOTOLITHOGRAPHY, PHOTOPROCESSING TOOLS, AND METHODS WITH VUV OR DEEP-UV LAMPS [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 21.05.2021 Database last updated on 20.12.2024 | |
| Former | The international publication has been made Status updated on 24.02.2020 | Most recent event Tooltip | 28.08.2024 | New entry: Renewal fee paid | Applicant(s) | For all designated states The Board of Trustees of the University of Illinois 352 Henry Administration Building 506 South Wright Street Urbana, IL 61801 / US | [2021/25] | Inventor(s) | 01 /
EDEN, James Gary 4401 Trostshire Circle Champaign, Illinois 61822 / US | 02 /
SIEVERS, Dane 202 S. First Street Fisher, Illinois 61843 / US | 03 /
MIRONOV, Andrey 308 E Iowa Street Apt 8 Urbana, Illinois 61801 / US | 04 /
KIM, Jinhong 352 Henry Administration Building 506 S. Wright St. Urbana, Illinois 61801 / US | [2021/25] | Representative(s) | Taruttis, Stefan Georg TARUTTIS Patentanwaltskanzlei Aegidientorplatz 2b 30159 Hannover / DE | [2021/25] | Application number, filing date | 19849642.4 | 13.08.2019 | [2021/25] | WO2019US46367 | Priority number, date | US201862718421P | 14.08.2018 Original published format: US 201862718421 P | US201862746797P | 17.10.2018 Original published format: US 201862746797 P | [2021/25] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2020036971 | Date: | 20.02.2020 | Language: | EN | [2020/08] | Type: | A1 Application with search report | No.: | EP3837585 | Date: | 23.06.2021 | Language: | EN | The application published by WIPO in one of the EPO official languages on 20.02.2020 takes the place of the publication of the European patent application. | [2021/25] | Search report(s) | International search report - published on: | US | 20.02.2020 | (Supplementary) European search report - dispatched on: | EP | 16.09.2022 | Classification | IPC: | G03F7/20, H01L21/67, G03F7/039 | [2022/28] | CPC: |
G03F7/2004 (EP,US);
G03F7/039 (EP,US);
G03F7/2008 (EP);
G03F7/201 (EP);
G03F7/2014 (EP);
G03F7/203 (EP,US);
H01L21/67115 (EP)
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| Former IPC [2021/25] | G03F7/20, H01L21/67 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2021/25] | Title | German: | FOTOLACKFREIE PHOTOLITHOGRAPHIE, FOTOBEHANDLUNGSWERKZEUGE UND VERFAHREN MIT VUV ODER TIEFEN-UV-LAMPEN | [2021/25] | English: | PHOTORESIST-FREE PHOTOLITHOGRAPHY, PHOTOPROCESSING TOOLS, AND METHODS WITH VUV OR DEEP-UV LAMPS | [2021/25] | French: | PHOTOLITHOGRAPHIE SANS PHOTORÉSINE, OUTILS DE PHOTOTRAITEMENT ET PROCÉDÉS UTILISANT DES LAMPES UV SOUS VIDE OU UV PROFOND | [2021/25] | Entry into regional phase | 17.02.2021 | National basic fee paid | 17.02.2021 | Search fee paid | 17.02.2021 | Designation fee(s) paid | 17.02.2021 | Examination fee paid | Examination procedure | 17.02.2021 | Examination requested [2021/25] | 17.03.2023 | Amendment by applicant (claims and/or description) | Fees paid | Renewal fee | 29.11.2021 | Renewal fee patent year 03 | 29.08.2022 | Renewal fee patent year 04 | 28.08.2023 | Renewal fee patent year 05 | 27.08.2024 | Renewal fee patent year 06 | Penalty fee | Additional fee for renewal fee | 31.08.2021 | 03 M06 Fee paid on 29.11.2021 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XAY]US2004191703 (SOPER STEVEN A [US], et al) [X] 15 * paragraphs [0025] , [0026] , [0033] , [0038] , [0039] , [0109] , [0110] , [0061] , [0007] - [0012] * [A] 6,7 [Y] 1-5,8,9; | [A]US2012274004 (KOBRIN BORIS [US]) [A] 7,9* paragraphs [0023] , [0038] - [0046] *; | [YA]US2018099257 (EDEN JAMES GARY [US], et al) [Y] 1-5,8,9 * paragraphs [0032] - [0035] * [A] 6; | [E]WO2020236518 (UNIV ILLINOIS [US]) [E] 15 * The disclosure of par. 67 is inconsistent and thus is considered to align with other consistent disclosures in that UV exposure renders polymers more hydrophilic not hydrophobic; paragraph [0067] *; | [Y] - PARK S-J ET AL, "25 W of average power at 172 nm in the vacuum ultraviolet from flat, efficient lamps driven by interlaced arrays of microcavity plasmas", APL PHOTONICS, AMERICAN INSTITUTE OF PHYSICS, 2 HUNTINGTON QUADRANGLE, MELVILLE, NY 11747, (20170308), vol. 2, no. 4, doi:10.1063/1.4976530, XP012216849 [Y] 1-5,8 * pages 041302-7, lines 1-7 * * pages 041301-1 - pages 041301-6 * DOI: http://dx.doi.org/10.1063/1.4976530 | [A] - ASAKURA ET AL, "A simple lithographic method employing 172 nm vacuum ultraviolet light to prepare positive- and negative-tone poly(methyl methacrylate) patterns", THIN SOLID FILMS, ELSEVIER, AMSTERDAM, NL, (20060403), vol. 500, no. 1-2, doi:10.1016/J.TSF.2005.11.015, ISSN 0040-6090, pages 237 - 240, XP005277049 [A] 9 * page 237, column 2, lines 2,3 * * pages 238-239 * DOI: http://dx.doi.org/10.1016/j.tsf.2005.11.015 | International search | [A]US2012255932 (TABIB-AZAR MASSOOD [US], et al) [A] 1-17 * ; para [0064]-[0065] *; | [A]US2014265036 (EDEN J GARY [US], et al) [A] 1-17* ; para [0018], [0046] *; | [A]US2018099257 (EDEN JAMES GARY [US], et al) [A] 1-17 * ; para [0021], [0035], [0043] * | by applicant | US2004191703 | US2018099257 | - Y. MAEZONOY. IWASAM. WASAMOTOLI. YAMAMOTOM. KATTOA.I YOKOTANI, Japan. J. Appl. Phys., (20080000), vol. 47, page 7266 | - K. HAMAMOTOY. TANAKAT. WATANABEN. SAKAYAM. HOSOYAT. SHOKIH. HADAN. HISHINUMAH. SUGAHARAH. KINOSHITA, J. Vac. Sci. Technol. B, (20050000), vol. 23, page 247 | - PARK et al., APL Photonics, (20170000), vol. 2, page 041302 |