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Extract from the Register of European Patents

EP About this file: EP3865566

EP3865566 - SUBCULTURE STAGE CALCULATION DEVICE, SUBCULTURE STAGE CALCULATION METHOD, AND PROGRAM [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  16.07.2021
Database last updated on 13.11.2024
FormerThe international publication has been made
Status updated on  18.04.2020
Most recent event   Tooltip19.10.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
NIKON CORPORATION
15-3, Konan 2-chome
Minato-ku
Tokyo 108-6290 / JP
For all designated states
Kyoto University
36-1, Yoshida-honmachi
Sakyo-ku
Kyoto-shi, Kyoto 606-8501 / JP
[2021/33]
Inventor(s)01 / DAN Tomoro
c/o NIKON CORPORATION, 15-3, Konan 2-chome,
Minato-ku
Tokyo 108-6290 / JP
02 / KII Hiroaki
c/o NIKON CORPORATION, 15-3, Konan 2-chome,
Minato-ku
Tokyo 108-6290 / JP
03 / UOZUMI Takayuki
c/o NIKON CORPORATION, 15-3, Konan 2-chome,
Minato-ku
Tokyo 108-6290 / JP
04 / SATO Yoshiko
c/o Kyoto University, 36-1, Yoshida-honmachi,
Sakyo-ku
Kyoto-shi, Kyoto 606-8501 / JP
05 / YOSHIDA Shinsuke
c/o Kyoto University, 36-1, Yoshida-honmachi,
Sakyo-ku
Kyoto-shi, Kyoto 606-8501 / JP
 [2021/33]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2021/33]
Application number, filing date19872004.702.10.2019
[2021/33]
WO2019JP38926
Priority number, dateJP2018019387512.10.2018         Original published format: JP 2018193875
[2021/33]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2020075591
Date:16.04.2020
Language:JA
[2020/16]
Type: A1 Application with search report 
No.:EP3865566
Date:18.08.2021
Language:EN
[2021/33]
Search report(s)International search report - published on:JP16.04.2020
(Supplementary) European search report - dispatched on:EP30.06.2022
ClassificationIPC:C12M1/34, G06T7/00, G06V20/69
[2022/31]
CPC:
C12M41/36 (EP,US); C12M41/46 (US); C12M41/48 (EP,US);
C12N5/0696 (US); G06V20/69 (EP); C12M31/10 (US);
C12M33/00 (US) (-)
Former IPC [2021/33]C12M1/34
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2021/33]
TitleGerman:VORRICHTUNG ZUR BERECHNUNG EINER UNTERKULTURSTUFE UND VERFAHREN ZUR BERECHNUNG EINER UNTERKULTURSTUFE SOWIE PROGRAMM[2021/33]
English:SUBCULTURE STAGE CALCULATION DEVICE, SUBCULTURE STAGE CALCULATION METHOD, AND PROGRAM[2021/33]
French:DISPOSITIF DE CALCUL D'ÉTAGE DE SOUS-CULTURE, PROCÉDÉ DE CALCUL D'ÉTAGE DE SOUS-CULTURE, ET PROGRAMME[2021/33]
Entry into regional phase11.05.2021Translation filed 
11.05.2021National basic fee paid 
11.05.2021Search fee paid 
11.05.2021Designation fee(s) paid 
11.05.2021Examination fee paid 
Examination procedure11.05.2021Examination requested  [2021/33]
20.10.2022Amendment by applicant (claims and/or description)
Fees paidRenewal fee
18.10.2021Renewal fee patent year 03
18.10.2022Renewal fee patent year 04
16.10.2023Renewal fee patent year 05
18.10.2024Renewal fee patent year 06
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]US2012122143  (MIMURA MASAFUMI [JP], et al);
 [A]WO2012115153  (NIKON CORP [JP], et al);
 [A]US2012315620  (WATAKABE KEIZO [JP], et al);
 [A]US2013130228  (WATAKABE KEIZO [JP], et al);
 [Y]WO2014017480  (TOKYO ELECTRON LTD [JP], et al);
 [A]US2016370569  (MATSUMOTO TSUYOSHI [JP]);
 [A]WO2017164332  (JAPAN SCIENCE & TECH AGENCY [JP])
International search[A]WO2011010449  (UNIV KYOTO [JP], et al);
 [A]WO2011043077  (KAWASAKI HEAVY IND LTD [JP], et al);
 [A]WO2012115153  (NIKON CORP [JP], et al);
 [A]WO2015025508  (FUJIFILM CORP [JP])
by applicantWO2016013394
 JP2018193875
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.