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Extract from the Register of European Patents

EP About this file: EP3680275

EP3680275 - THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS [Right-click to bookmark this link]
StatusThe patent has been granted
Status updated on  02.02.2024
Database last updated on 02.11.2024
FormerGrant of patent is intended
Status updated on  08.10.2023
FormerRequest for examination was made
Status updated on  14.08.2020
FormerThe application has been published
Status updated on  12.06.2020
Most recent event   Tooltip01.11.2024Lapse of the patent in a contracting state
New state(s): PL, RO, SK		published on 04.12.2024 [2024/49]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
4-1, Marunouchi 1-chome
Chiyoda-ku
Tokyo 100-0005 / JP
[2022/07]
Former [2020/29]For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Ohtemachi 2-chome
Chiyoda-ku
Tokyo / JP
Inventor(s)01 / Yano, Toshiharu
c/o New Functional Materials Research Center
SHIN-ETSU CHEMICAL CO., LTD
28-1, Nishi-Fukushima, Kubiki-ki
Joetsu-shi Nigata / JP
02 / Mitsui, Ryo
c/o New Functional Materials Research Center
SHIN-ETSU CHEMICAL CO., LTD.
28-1, Nishi-Fukushima, Kubiki-ku
Joetsu-shi Nigata / JP
03 / Maeda, Kazunori
c/o New Functional Materials Research Center
SHIN-ETSU CHEMICAL CO., LTD.
28-1, Nishi-Fukushima, Kubiki-ku
Joetsu-shi Nigata / JP
04 / Ogihara, Tsutomu
c/o New Functional Materials Research Center
SHIN-ETSU CHEMICAL CO., LTD.
28-1, Nishi-Fukushima, Kubiki-ku
Joetsu-shi Nigata / JP
05 / Tachibana, Seiichiro
c/o New Functional Materials Research Center
Shin-Etsu Chemical Co., Ltd.
28-1, Nishi-Fukushima, Kubiki-ku
Joetsu-shi Nigata / JP
 [2020/29]
Representative(s)Wibbelmann, Jobst
Wuesthoff & Wuesthoff
Patentanwälte und Rechtsanwalt PartG mbB
Schweigerstrasse 2
81541 München / DE
[N/P]
Former [2020/29]Wibbelmann, Jobst
Wuesthoff & Wuesthoff
Patentanwälte PartG mbB
Schweigerstrasse 2
81541 München / DE
Application number, filing date20151022.909.01.2020
[2020/29]
Priority number, dateJP2019000176309.01.2019         Original published format: JP 2019001763
[2020/29]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3680275
Date:15.07.2020
Language:EN
[2020/29]
Type: B1 Patent specification 
No.:EP3680275
Date:06.03.2024
Language:EN
[2024/10]
Search report(s)(Supplementary) European search report - dispatched on:EP15.05.2020
ClassificationIPC:C08G77/00, C08L83/04, G03F7/11, H01L21/027
[2020/29]
CPC:
C08G77/80 (EP,CN,US); C07F7/0834 (KR); C08G77/18 (CN,US);
C08G77/04 (KR); C08G77/06 (CN); C08G77/08 (US);
C08G77/14 (CN); C08G77/24 (CN); C08G77/28 (US);
C08K5/37 (KR); C08L83/04 (EP); C08L83/06 (US);
G03F7/004 (CN); G03F7/0752 (EP,US); G03F7/0755 (KR);
G03F7/0757 (KR); G03F7/11 (CN); G03F7/426 (US);
H01L21/0271 (CN); H01L21/0337 (EP,KR,US); H01L21/3086 (KR) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2020/38]
Former [2020/29]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:WÄRMEHÄRTBARE, SILIZIUMHALTIGE VERBINDUNG, ZUSAMMENSETZUNG ZUR BILDUNG EINES SILIZIUMHALTIGEN FILMS UND STRUKTURIERUNGSVERFAHREN[2020/29]
English:THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS[2020/29]
French:COMPOSÉ CONTENANT DU SILICONE THERMODURCISSABLE, COMPOSITION POUR FORMER UN FILM CONTENANT DU SILICONE ET PROCÉDÉ DE FORMATION DE MOTIFS[2020/29]
Examination procedure07.08.2020Amendment by applicant (claims and/or description)
07.08.2020Examination requested  [2020/38]
07.08.2020Date on which the examining division has become responsible
09.10.2023Communication of intention to grant the patent
22.01.2024Fee for grant paid
22.01.2024Fee for publishing/printing paid
22.01.2024Receipt of the translation of the claim(s)
Fees paidRenewal fee
25.01.2022Renewal fee patent year 03
25.01.2023Renewal fee patent year 04
25.01.2024Renewal fee patent year 05
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT06.03.2024
BG06.03.2024
CZ06.03.2024
EE06.03.2024
ES06.03.2024
FI06.03.2024
HR06.03.2024
LT06.03.2024
LV06.03.2024
NL06.03.2024
PL06.03.2024
RO06.03.2024
SE06.03.2024
SK06.03.2024
SM06.03.2024
NO06.06.2024
RS06.06.2024
GR07.06.2024
IS06.07.2024
PT08.07.2024
[2024/49]
Former [2024/48]AT06.03.2024
BG06.03.2024
CZ06.03.2024
EE06.03.2024
ES06.03.2024
FI06.03.2024
HR06.03.2024
LT06.03.2024
LV06.03.2024
NL06.03.2024
SE06.03.2024
SM06.03.2024
NO06.06.2024
RS06.06.2024
GR07.06.2024
IS06.07.2024
PT08.07.2024
Former [2024/47]BG06.03.2024
ES06.03.2024
FI06.03.2024
HR06.03.2024
LT06.03.2024
LV06.03.2024
NL06.03.2024
SE06.03.2024
SM06.03.2024
NO06.06.2024
RS06.06.2024
GR07.06.2024
IS06.07.2024
PT08.07.2024
Former [2024/46]BG06.03.2024
ES06.03.2024
FI06.03.2024
HR06.03.2024
LT06.03.2024
LV06.03.2024
NL06.03.2024
SE06.03.2024
NO06.06.2024
RS06.06.2024
GR07.06.2024
IS06.07.2024
Former [2024/41]BG06.03.2024
ES06.03.2024
FI06.03.2024
HR06.03.2024
LT06.03.2024
LV06.03.2024
NL06.03.2024
SE06.03.2024
NO06.06.2024
RS06.06.2024
GR07.06.2024
Former [2024/37]BG06.03.2024
ES06.03.2024
FI06.03.2024
HR06.03.2024
LT06.03.2024
LV06.03.2024
SE06.03.2024
NO06.06.2024
RS06.06.2024
GR07.06.2024
Former [2024/36]BG06.03.2024
ES06.03.2024
FI06.03.2024
HR06.03.2024
LT06.03.2024
LV06.03.2024
NO06.06.2024
RS06.06.2024
GR07.06.2024
Former [2024/35]BG06.03.2024
ES06.03.2024
FI06.03.2024
HR06.03.2024
LT06.03.2024
NO06.06.2024
RS06.06.2024
GR07.06.2024
Former [2024/34]BG06.03.2024
FI06.03.2024
HR06.03.2024
LT06.03.2024
NO06.06.2024
RS06.06.2024
GR07.06.2024
Former [2024/33]LT06.03.2024
NO06.06.2024
Documents cited:Search[A]EP2518562  (SHINETSU CHEMICAL CO [JP]) [A] 1-10 * tables 1-1 ** compounds 11,16 *
by applicantJP2008033174
 JP2009126940
 JP2010085893
 JP2010085912
 JP2012053253
 JP2013167669
 JP2013224279
 JP2015028145
 JP2016074774
 JP2016177262
    - Proc. SPIE, (20050000), vol. 5754, page 1508
    - J. Vac. Sci. Technol., (19991100), vol. B17, no. 6
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.