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Extract from the Register of European Patents

EP About this file: EP3686256

EP3686256 - COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  03.05.2024
Database last updated on 28.03.2026
FormerThe patent has been granted
Status updated on  26.05.2023
FormerGrant of patent is intended
Status updated on  14.02.2023
FormerExamination is in progress
Status updated on  04.09.2020
FormerRequest for examination was made
Status updated on  14.08.2020
FormerThe application has been published
Status updated on  26.06.2020
Most recent event   Tooltip26.12.2025Lapse of the patent in a contracting state
New state(s): TR		published on 28.01.2026  [2026/05]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
4-1, Marunouchi 1-chome
Chiyoda-ku
Tokyo 100-0005 / JP
[2022/07]
Former [2020/31]For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Ohtemachi 2-chome
Chiyoda-ku
Tokyo / JP
Inventor(s)01 / Ogihara, Tsutomu
c/o New Functional Materials Research Center
Shin-Etsu Chemical Co., Ltd.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
02 / Biyajima, Yusuke
c/o New Functional Materials Research Center
Shin-Etsu Chemical Co., Ltd.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
03 / Kanayama, Masahiro
c/o New Functional Materials Research Center
Shin-Etsu Chemical Co., Ltd.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
04 / Watanabe, Tsukasa
c/o New Functional Materials Research Center
Shin-Etsu Chemical Co., Ltd.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
05 / Ohashi, Masaki
c/o New Functional Materials Research Center
Shin-Etsu Chemical Co., Ltd.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
 [2023/26]
Former [2020/31]01 / Ogihara, Tsutomu
c/o New Functional Materials Research Center
SHIN-ETSU CHEMICAL CO., LTD.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
02 / Biyajima, Yusuke
c/o New Functional Materials Research Center
SHIN-ETSU CHEMICAL CO., LTD.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
03 / Kanayama, Masahiro
c/o New Functional Materials Research Center
SHIN-ETSU CHEMICAL CO., LTD.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
04 / Watanabe, Tsukasa
c/o New Functional Materials Research Center
SHIN-ETSU CHEMICAL CO., LTD.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
05 / Ohashi, Masaki
c/o New Functional Materials Research Center
SHIN-ETSU CHEMICAL CO., LTD.
28-1, Nishi-Fukushima, Kubiki-ku, Joetsu-shi
Niigata / JP
Representative(s)Wibbelmann, Jobst
Wuesthoff & Wuesthoff
Patentanwälte und Rechtsanwalt PartG mbB
Schweigerstrasse 2
81541 München / DE
[N/P]
Former [2020/31]Wibbelmann, Jobst
Wuesthoff & Wuesthoff
Patentanwälte PartG mbB
Schweigerstrasse 2
81541 München / DE
Application number, filing date20152718.120.01.2020
[2020/31]
Priority number, dateJP2019000881822.01.2019         Original published format: JP 2019008818
[2020/31]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3686256
Date:29.07.2020
Language:EN
[2020/31]
Type: B1 Patent specification 
No.:EP3686256
Date:28.06.2023
Language:EN
[2023/26]
Search report(s)(Supplementary) European search report - dispatched on:EP20.05.2020
ClassificationIPC:C09D183/06, C08K5/41, G03F7/075, H01L21/3213
[2020/31]
CPC:
C09D183/06 (EP); G03F7/0757 (CN,KR); G03F7/0752 (EP,US);
C08G77/08 (US); C08K5/36 (KR); C08L83/04 (KR);
G03F7/11 (CN,KR,US); G03F7/20 (KR); G03F7/2002 (US);
H10P50/242 (KR); H10P50/283 (KR); H10P50/73 (KR);
H10P76/405 (EP); H10P76/4085 (KR); C08G77/14 (EP) (-)
C-Set:
C09D183/06, C08K5/42 (EP)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2020/38]
Former [2020/31]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:ZUSAMMENSETZUNG ZUR BILDUNG EINES SILIZIUMHALTIGEN RESISTUNTERSCHICHTFILMS UND STRUKTURIERUNGSVERFAHREN[2020/31]
English:COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS[2020/31]
French:COMPOSITION POUR FORMER UN FILM DE SOUS-COUCHE RÉSISTANT CONTENANT DU SILICONE ET PROCÉDÉ DE FORMATION DE MOTIFS[2020/31]
Examination procedure06.08.2020Amendment by applicant (claims and/or description)
06.08.2020Examination requested  [2020/38]
06.08.2020Date on which the examining division has become responsible
04.09.2020Despatch of a communication from the examining division (Time limit: M04)
17.12.2020Reply to a communication from the examining division
15.02.2023Communication of intention to grant the patent
22.05.2023Fee for grant paid
22.05.2023Fee for publishing/printing paid
22.05.2023Receipt of the translation of the claim(s)
Opposition(s)02.04.2024No opposition filed within time limit [2024/23]
Fees paidRenewal fee
25.01.2022Renewal fee patent year 03
25.01.2023Renewal fee patent year 04
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipCY20.01.2020
HU20.01.2020
AT28.06.2023
BG28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
MC28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
TR28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
GB20.01.2024
IE20.01.2024
LU20.01.2024
BE31.01.2024
CH31.01.2024
FR31.01.2024
[2026/05]
Former [2025/41]CY20.01.2020
HU20.01.2020
AT28.06.2023
BG28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
MC28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
GB20.01.2024
IE20.01.2024
LU20.01.2024
BE31.01.2024
CH31.01.2024
FR31.01.2024
Former [2025/37]CY20.01.2020
AT28.06.2023
BG28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
MC28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
GB20.01.2024
IE20.01.2024
LU20.01.2024
BE31.01.2024
CH31.01.2024
FR31.01.2024
Former [2025/10]AT28.06.2023
BG28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
MC28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
GB20.01.2024
IE20.01.2024
LU20.01.2024
BE31.01.2024
CH31.01.2024
FR31.01.2024
Former [2024/51]AT28.06.2023
BG28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
MC28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
GB20.01.2024
LU20.01.2024
BE31.01.2024
CH31.01.2024
FR31.01.2024
Former [2024/48]AT28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
MC28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
GB20.01.2024
LU20.01.2024
BE31.01.2024
CH31.01.2024
FR31.01.2024
Former [2024/47]AT28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
MC28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
GB20.01.2024
LU20.01.2024
BE31.01.2024
FR31.01.2024
Former [2024/43]AT28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
MC28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
LU20.01.2024
Former [2024/40]AT28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
MC28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
Former [2024/36]AT28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SI28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
Former [2024/26]AT28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
IT28.06.2023
LT28.06.2023
LV28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
Former [2024/22]AT28.06.2023
CZ28.06.2023
DK28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
LT28.06.2023
LV28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
Former [2024/10]AT28.06.2023
CZ28.06.2023
EE28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
LT28.06.2023
LV28.06.2023
NL28.06.2023
PL28.06.2023
RO28.06.2023
RS28.06.2023
SE28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
PT30.10.2023
Former [2024/09]AT28.06.2023
CZ28.06.2023
ES28.06.2023
FI28.06.2023
HR28.06.2023
LT28.06.2023
LV28.06.2023
NL28.06.2023
RS28.06.2023
SE28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
IS28.10.2023
Former [2024/08]FI28.06.2023
HR28.06.2023
LT28.06.2023
LV28.06.2023
NL28.06.2023
RS28.06.2023
SE28.06.2023
SK28.06.2023
SM28.06.2023
NO28.09.2023
GR29.09.2023
Former [2024/03]FI28.06.2023
HR28.06.2023
LT28.06.2023
LV28.06.2023
NL28.06.2023
RS28.06.2023
SE28.06.2023
NO28.09.2023
GR29.09.2023
Former [2024/01]HR28.06.2023
LT28.06.2023
LV28.06.2023
NL28.06.2023
RS28.06.2023
SE28.06.2023
NO28.09.2023
GR29.09.2023
Former [2023/52]HR28.06.2023
NL28.06.2023
RS28.06.2023
SE28.06.2023
NO28.09.2023
GR29.09.2023
Former [2023/51]HR28.06.2023
RS28.06.2023
SE28.06.2023
NO28.09.2023
GR29.09.2023
Former [2023/50]SE28.06.2023
NO28.09.2023
GR29.09.2023
Former [2023/48]SE28.06.2023
NO28.09.2023
Documents cited:Search[A] US2017154766  (OGIHARA TSUTOMU et al.)
 [AD] US2011008735  (OHSAWA YOUICHI et al.)
ExaminationEP3680275
by applicantJP2011016746
 JP2013167669
 JP2013224279
 JP2012053253
 JP2009126940
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.