Extract from the Register of European Patents

EP About this file: EP3767683

EP3767683 - HIGH ELECTRON MOBILITY TRANSISTOR (HEMT) AND FORMING METHOD THEREOF [Right-click to bookmark this link]
StatusExamination is in progress
Status updated on  02.12.2022
Database last updated on 10.03.2026
FormerRequest for examination was made
Status updated on  23.07.2021
FormerThe application has been published
Status updated on  18.12.2020
Most recent event   Tooltip16.04.2025New entry: Renewal fee paid 
Applicant(s)For all designated states
United Microelectronics Corp.
No.3, Li-Hsin Road 2
Science-Based Industrial Park
Hsin-Chu City 300 / TW
[2024/43]
Former [2021/03]For all designated states
United Microelectronics Corp.
No. 3, Lin-Hsin Rd. 2
Science-Based Industrial Park
Hsin-Chu City 300 / TW
Inventor(s)01 / LEE, Kuo-Hsing
5F.-2, No.16, Ln. 120, Ziyou St., Zhudong Township
310 Hsinchu County / TW
02 / SHENG, Yi-Chung
6F., No.92, Dongxing Rd.
701 Tainan City / TW
03 / HSUEH, Sheng-Yuan
No.273, Wencheng 1st Rd.
70465 Tainan City / TW
04 / KANG, Chih-Kai
No.18, Daxin Rd., Xinhua Dist.
71247 Tainan City / TW
05 / HUANG, Guan-Kai
No.17, Aly. 27, Ln. 53, Sec. 2, Zhonghua N. Rd.
North Dist.
704 Tainan City / TW
06 / WU, Chien-Liang
No. 15, Ziqiang Rd. Xinwei Vil., Yanpu Township
907 Pingtung County / TW
 [2021/03]
Representative(s)Isarpatent
Patent- und Rechtsanwälte Barth
Charles Hassa Peckmann & Partner mbB
Friedrichstrasse 31
80801 München / DE
[N/P]
Former [2021/03]Isarpatent
Patent- und Rechtsanwälte Behnisch Barth Charles
Hassa Peckmann & Partner mbB
Friedrichstrasse 31
80801 München / DE
Application number, filing date20168434.707.04.2020
[2021/03]
Priority number, dateCN20191064909818.07.2019         Original published format: CN201910649098
[2021/03]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3767683
Date:20.01.2021
Language:EN
[2021/03]
Search report(s)(Supplementary) European search report - dispatched on:EP22.09.2020
ClassificationIPC:H01L29/778, H01L21/337, H01L21/336, H01L29/06, H01L29/40, // H01L29/10, H01L29/207, H01L29/423, H01L29/417, H01L29/20
[2021/03]
CPC:
H10D30/4755 (EP,CN,US); H10D30/015 (EP,CN,US); H10D62/106 (EP);
H10D64/111 (EP); H10D64/411 (CN); H10D62/343 (EP);
H10D62/8503 (EP,CN); H10D62/854 (EP); H10D64/256 (EP,CN);
H10D64/513 (EP) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2021/34]
Former [2021/03]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:TRANSISTOR MIT HOHER ELEKTRONENBEWEGLICHKEIT UND SEIN HERSTELLUNGSVERFAHREN[2021/03]
English:HIGH ELECTRON MOBILITY TRANSISTOR (HEMT) AND FORMING METHOD THEREOF[2021/03]
French:TRANSISTOR À HAUTE MOBILITÉ ÉLECTRONIQUE ET SON PROCÉDÉ DE FABRICATION[2021/03]
Examination procedure19.07.2021Amendment by applicant (claims and/or description)
19.07.2021Examination requested  [2021/34]
19.07.2021Date on which the examining division has become responsible
02.12.2022Despatch of a communication from the examining division (Time limit: M04)
10.02.2023Reply to a communication from the examining division
Fees paidRenewal fee
21.03.2022Renewal fee patent year 03
21.03.2023Renewal fee patent year 04
21.03.2024Renewal fee patent year 05
15.04.2025Renewal fee patent year 06
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Documents cited:Search[XI] US2013193485  (AKIYAMA SHINICHI et al.) [X] 1-3,6-15 * e.g. figure 15 and associated text * * figures 8B-C, E, 14D-E, G-H *[I] 4,5
 [XI]   SHENG JIANG ET AL: "All-GaN-Integrated Cascode Heterojunction Field Effect Transistors", IEEE TRANSACTIONS ON POWER ELECTRONICS, vol. 32, no. 11, November 2017 (2017-11-01), USA, pages 8743 - 8750, XP055691900, ISSN: 0885-8993, DOI: 10.1109/TPEL.2016.2643499 [X] 1,2,4-7,9-11,13,14 * figure 2(a) * * part II.A *[I] 3,8,12,15

DOI:   http://dx.doi.org/10.1109/TPEL.2016.2643499
ExaminationUS2016336313
 US2009032820
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