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Extract from the Register of European Patents

EP About this file: EP3768039

EP3768039 - KEY GENERATION METHOD, MASTER ENODEB, SECONDARY ENODEB AND USER EQUIPMENT [Right-click to bookmark this link]
StatusThe patent has been granted
Status updated on  26.01.2024
Database last updated on 15.11.2024
FormerGrant of patent is intended
Status updated on  25.09.2023
FormerRequest for examination was made
Status updated on  04.08.2023
FormerGrant of patent is intended
Status updated on  26.03.2023
FormerRequest for examination was made
Status updated on  21.05.2021
FormerThe application has been published
Status updated on  18.12.2020
Most recent event   Tooltip01.11.2024Lapse of the patent in a contracting state
New state(s): RO, SK
published on 04.12.2024 [2024/49]
Applicant(s)For all designated states
HUAWEI TECHNOLOGIES CO., LTD.
Huawei Administration Building
Bantian, Longgang District
Shenzhen, Guangdong 518129 / CN
[2021/03]
Inventor(s)01 / GAN, Lu
Huawei Administration Building
Bantian
Longgang District
Shenzhen, Guangdong 518129, P.R. / CN
02 / WU, Rong
Huawei Administration Building
Bantian
Longgang District
Shenzhen, Guangdong 518129, P.R. / CN
03 / HE, Chengdong
Huawei Administration Building
Bantian
Longgang District
Shenzhen, Guangdong 518129, P.R. / CN
 [2021/03]
Representative(s)Gill Jennings & Every LLP
The Broadgate Tower
20 Primrose Street
London EC2A 2ES / GB
[2021/03]
Application number, filing date20179098.716.03.2015
[2021/03]
Priority number, dateCN20141010065118.03.2014         Original published format: CN201410100651
[2021/03]
Filing languageZH
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3768039
Date:20.01.2021
Language:EN
[2021/03]
Type: B1 Patent specification 
No.:EP3768039
Date:28.02.2024
Language:EN
[2024/09]
Search report(s)(Supplementary) European search report - dispatched on:EP22.12.2020
ClassificationIPC:H04W84/04, H04W12/00, H04W36/00, H04W76/11, H04W12/04, H04W12/033, H04W12/041
[2023/14]
CPC:
H04W76/11 (EP,US); H04W12/04 (CN); H04W12/041 (EP,US);
H04L63/061 (US); H04L63/123 (US); H04L9/0869 (US);
H04W12/033 (EP); H04L2463/061 (EP,US); H04W12/106 (EP);
H04W84/045 (EP) (-)
Former IPC [2021/03]H04W84/04, H04W12/04, H04W76/11, H04W36/00, H04W12/00
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2021/25]
Former [2021/03]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:SCHLÜSSELERZEUGUNGSVERFAHREN, MASTER-ENODEB, SEKUNDÄR-ENODEB UND BENUTZERVORRICHTUNG[2021/03]
English:KEY GENERATION METHOD, MASTER ENODEB, SECONDARY ENODEB AND USER EQUIPMENT[2021/03]
French:PROCÉDÉ DE GÉNÉRATION DE CLÉ, ENODEB MAÎTRE, ENODEB SECONDAIRE ET ÉQUIPEMENT D'UTILISATEUR[2021/03]
Examination procedure18.05.2021Amendment by applicant (claims and/or description)
18.05.2021Examination requested  [2021/25]
18.05.2021Date on which the examining division has become responsible
27.03.2023Communication of intention to grant the patent
03.08.2023Disapproval of the communication of intention to grant the patent by the applicant or resumption of examination proceedings by the EPO
26.09.2023Communication of intention to grant the patent
24.01.2024Fee for grant paid
24.01.2024Fee for publishing/printing paid
24.01.2024Receipt of the translation of the claim(s)
Parent application(s)   TooltipEP15765368.4  / EP3163923
Fees paidRenewal fee
09.06.2020Renewal fee patent year 03
09.06.2020Renewal fee patent year 04
09.06.2020Renewal fee patent year 05
09.06.2020Renewal fee patent year 06
31.03.2021Renewal fee patent year 07
28.03.2022Renewal fee patent year 08
31.03.2023Renewal fee patent year 09
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Lapses during opposition  TooltipAT28.02.2024
BG28.02.2024
CZ28.02.2024
DK28.02.2024
EE28.02.2024
ES28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
LV28.02.2024
NL28.02.2024
PL28.02.2024
RO28.02.2024
SE28.02.2024
SK28.02.2024
SM28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
PT28.06.2024
[2024/49]
Former [2024/48]AT28.02.2024
BG28.02.2024
CZ28.02.2024
DK28.02.2024
EE28.02.2024
ES28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
LV28.02.2024
NL28.02.2024
PL28.02.2024
SE28.02.2024
SM28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
PT28.06.2024
Former [2024/47]BG28.02.2024
DK28.02.2024
ES28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
LV28.02.2024
NL28.02.2024
PL28.02.2024
SE28.02.2024
SM28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
PT28.06.2024
Former [2024/37]BG28.02.2024
ES28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
LV28.02.2024
NL28.02.2024
PL28.02.2024
SE28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
PT28.06.2024
Former [2024/36]BG28.02.2024
ES28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
LV28.02.2024
NL28.02.2024
PL28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
PT28.06.2024
Former [2024/35]BG28.02.2024
ES28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
NL28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
Former [2024/34]BG28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
NL28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
Former [2024/33]LT28.02.2024
NO28.05.2024
IS28.06.2024
Former [2024/32]IS28.06.2024
Documents cited:Search[A]CN102740289  (CHINA ACADEMY OF TELECOMM TECH) [A] 1-20 * abstract * * paragraph [0048] - paragraph [0065] * * paragraph [0133] - paragraph [0135] *;
 [A]WO2013064041  (HUAWEI TECH CO LTD [CN]) [A] 1-20 * abstract * * paragraph [0006] - paragraph [0015] *;
 [A]  - Menezes, Vanstone, Oorschot, Handbook of Applied Cryptography, USA, CRC Press LLC, (1997), pages 543 - 590, XP001525013 [A] 1-20 * page 568 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.