| EP3994731 - METHOD OF FORMING SPLIT-GATE FLASH MEMORY CELL WITH SPACER DEFINED FLOATING GATE AND DISCRETELY FORMED POLYSILICON GATES [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 22.11.2024 Database last updated on 18.03.2026 | |
| Former | The patent has been granted Status updated on 15.12.2023 | ||
| Former | Grant of patent is intended Status updated on 24.09.2023 | ||
| Former | Examination is in progress Status updated on 23.12.2022 | ||
| Former | Request for examination was made Status updated on 08.04.2022 | ||
| Former | The international publication has been made Status updated on 15.01.2021 | ||
| Former | unknown Status updated on 18.04.2020 | Most recent event Tooltip | 26.12.2025 | Lapse of the patent in a contracting state New state(s): TR | published on 28.01.2026 [2026/05] | Applicant(s) | For all designated states Silicon Storage Technology Inc. 450 Holger Way San Jose CA 95134 / US | [2022/19] | Inventor(s) | 01 /
WANG, Chunming Room 402, No. 16, Lane 238 Huoxiang Road Shanghai 201203 / CN | 02 /
LIU, Xian 1236 Sargent Dr. Sunnyvale, California 94087 / US | 03 /
DO, Nhan 20451 Walnut Avenue Saratoga, California 95070 / US | 04 /
XING, Leo No. 18 Lane 2277 Zuchongzhi Road Shanghai 201210 / CN | 05 /
LIU, Guo Yong No. 18 Lane 2277 Zuchongzhi Road Shanghai 201210 / CN | 06 /
DIAO, Melvin No. 18 Lane 2277 Zuchongzhi Road Shanghai 201210 / CN | [2022/19] | Representative(s) | Betten & Resch Patent- und Rechtsanwälte PartGmbB Maximiliansplatz 14 80333 München / DE | [2022/19] | Application number, filing date | 20717381.6 | 06.03.2020 | [2022/19] | WO2020US21454 | Priority number, date | CN201910598339 | 04.07.2019 Original published format: CN201910598339 | US202016796412 | 20.02.2020 Original published format: US202016796412 | [2022/19] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2021002892 | Date: | 07.01.2021 | Language: | EN | [2021/01] | Type: | A1 Application with search report | No.: | EP3994731 | Date: | 11.05.2022 | Language: | EN | The application published by WIPO in one of the EPO official languages on 07.01.2021 takes the place of the publication of the European patent application. | [2022/19] | Type: | B1 Patent specification | No.: | EP3994731 | Date: | 17.01.2024 | Language: | EN | [2024/03] | Search report(s) | International search report - published on: | EP | 07.01.2021 | Classification | IPC: | H01L29/423, H01L29/66, H01L29/788, H10B41/30 | [2023/42] | CPC: |
H10D30/6892 (EP,CN,KR);
H10B41/30 (EP,CN,KR,US);
H10D30/0411 (EP,CN,KR);
H10D64/035 (US);
H10D30/685 (EP,CN,KR);
H10P50/71 (US);
H10P52/403 (US)
(-)
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| Former IPC [2022/19] | H01L29/423, H01L27/11521, H01L29/66, H01L29/788 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2022/19] | Extension states | BA | Not yet paid | ME | Not yet paid | Validation states | KH | Not yet paid | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | VERFAHREN ZUR HERSTELLUNG EINER SPLIT-GATE-FLASH-SPEICHERZELLE MIT EINEM DURCH EINEN ABSTANDSHALTER DEFINIERTEN SCHWEBENDEN GATE UND DISKRET GEFORMTEN POLYSILIZIUM-GATES | [2022/19] | English: | METHOD OF FORMING SPLIT-GATE FLASH MEMORY CELL WITH SPACER DEFINED FLOATING GATE AND DISCRETELY FORMED POLYSILICON GATES | [2022/19] | French: | PROCÉDÉ DE FORMATION D'UNE CELLULE DE MÉMOIRE FLASH À GRILLE DIVISÉE AVEC GRILLE FLOTTANTE DÉFINIE PAR ESPACEUR ET GRILLES DE POLYSILICIUM FORMÉES DE MANIÈRE DISCRÈTE | [2022/19] | Entry into regional phase | 03.02.2022 | National basic fee paid | 03.02.2022 | Designation fee(s) paid | 03.02.2022 | Examination fee paid | Examination procedure | 03.02.2022 | Examination requested [2022/19] | 03.02.2022 | Date on which the examining division has become responsible | 12.08.2022 | Amendment by applicant (claims and/or description) | 03.01.2023 | Despatch of a communication from the examining division (Time limit: M06) | 03.07.2023 | Reply to a communication from the examining division | 25.09.2023 | Communication of intention to grant the patent | 07.12.2023 | Fee for grant paid | 07.12.2023 | Fee for publishing/printing paid | 07.12.2023 | Receipt of the translation of the claim(s) | Opposition(s) | 18.10.2024 | No opposition filed within time limit [2024/52] | Fees paid | Renewal fee | 23.03.2022 | Renewal fee patent year 03 | 21.03.2023 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | CY | 06.03.2020 | HU | 06.03.2020 | AT | 17.01.2024 | BG | 17.01.2024 | CZ | 17.01.2024 | DK | 17.01.2024 | EE | 17.01.2024 | ES | 17.01.2024 | FI | 17.01.2024 | HR | 17.01.2024 | IT | 17.01.2024 | LT | 17.01.2024 | LV | 17.01.2024 | MC | 17.01.2024 | PL | 17.01.2024 | RO | 17.01.2024 | SE | 17.01.2024 | SI | 17.01.2024 | SK | 17.01.2024 | SM | 17.01.2024 | TR | 17.01.2024 | IE | 06.03.2024 | LU | 06.03.2024 | BE | 31.03.2024 | CH | 31.03.2024 | GB | 17.04.2024 | NO | 17.04.2024 | RS | 17.04.2024 | GR | 18.04.2024 | IS | 17.05.2024 | PT | 17.05.2024 | [2026/05] |
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| Former [2024/32] | IS | 17.05.2024 | Cited in | International search | [XI] US9190532 (WANG CHUNMING et al.) | [XI] US2008099789 (KOTOV ALEXANDER et al.) [X] 1-6,8 * paragraphs [0015] - [0021]; figures 2-9 *[I] 9,11,12 | [XI] US2016336415 (WU CHANG-MING et al.) [X] 1,7 * paragraphs [0028] - [0037]; figures 2A-2K *[I] 10 | [A] WO2017184315 (SILICON STORAGE TECH INC et al.) [A] 1 * paragraphs [0059] - [0077]; figures 10-20 * | by applicant | US7315056 |