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Extract from the Register of European Patents

EP About this file: EP4066059

EP4066059 - CHEMICALLY AMPLIFIED PHOTORESIST [Right-click to bookmark this link]
StatusThe patent has been granted
Status updated on  26.01.2024
Database last updated on 02.09.2024
FormerGrant of patent is intended
Status updated on  13.09.2023
FormerRequest for examination was made
Status updated on  01.08.2023
FormerGrant of patent is intended
Status updated on  11.07.2023
FormerRequest for examination was made
Status updated on  02.09.2022
FormerThe international publication has been made
Status updated on  04.06.2021
Formerunknown
Status updated on  02.12.2020
Most recent event   Tooltip08.08.2024Lapse of the patent in a contracting state
New state(s): SE		published on 11.09.2024 [2024/37]
Applicant(s)For all designated states
Merck Patent GmbH
Frankfurter Strasse 250
64293 Darmstadt / DE
[2022/40]
Inventor(s)01 / KUDO, Takanori
70 Meister Avenue
Branchburg, New Jersey 08876 / US
02 / YANG, Fan
70 Meister Avenue
Branchburg, New Jersey 08876 / US
 [2022/40]
Representative(s)Rippel, Hans Christoph
Patentanwälte
Isenbruck Bösl Hörschler PartG mbB
Eastsite One
Seckenheimer Landstrasse 4
68163 Mannheim / DE
[2022/40]
Application number, filing date20811609.523.11.2020
[2022/40]
WO2020EP83048
Priority number, dateUS201962939741P25.11.2019         Original published format: US 201962939741 P
[2022/40]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2021105054
Date:03.06.2021
Language:EN
[2021/22]
Type: A1 Application with search report 
No.:EP4066059
Date:05.10.2022
Language:EN
The application published by WIPO in one of the EPO official languages on 03.06.2021 takes the place of the publication of the European patent application.
[2022/40]
Type: B1 Patent specification 
No.:EP4066059
Date:28.02.2024
Language:EN
[2024/09]
Search report(s)International search report - published on:EP03.06.2021
ClassificationIPC:G03F7/022, G03F7/023, G03F7/039
[2022/40]
CPC:
G03F7/0226 (EP,KR); G03F7/022 (EP,KR); G03F7/0392 (EP,US);
G03F7/0045 (US); G03F7/0233 (EP,US); G03F7/0236 (EP,KR);
H01L21/0274 (KR) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2022/40]
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:CHEMISCH VERSTÄRKTER FOTOLACK[2022/40]
English:CHEMICALLY AMPLIFIED PHOTORESIST[2022/40]
French:RÉSINE PHOTOSENSIBLE AMPLIFIÉE CHIMIQUEMENT[2022/40]
Entry into regional phase22.06.2022National basic fee paid 
22.06.2022Designation fee(s) paid 
22.06.2022Examination fee paid 
Examination procedure22.06.2022Examination requested  [2022/40]
22.06.2022Date on which the examining division has become responsible
18.10.2022Amendment by applicant (claims and/or description)
12.07.2023Communication of intention to grant the patent
31.07.2023Disapproval of the communication of intention to grant the patent by the applicant or resumption of examination proceedings by the EPO
14.09.2023Communication of intention to grant the patent
22.01.2024Fee for grant paid
22.01.2024Fee for publishing/printing paid
22.01.2024Receipt of the translation of the claim(s)
Fees paidRenewal fee
13.10.2022Renewal fee patent year 03
29.09.2023Renewal fee patent year 04
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipBG28.02.2024
ES28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
LV28.02.2024
NL28.02.2024
PL28.02.2024
SE28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
PT28.06.2024
[2024/37]
Former [2024/36]BG28.02.2024
ES28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
LV28.02.2024
NL28.02.2024
PL28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
PT28.06.2024
Former [2024/35]BG28.02.2024
ES28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
NL28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
Former [2024/34]BG28.02.2024
FI28.02.2024
HR28.02.2024
LT28.02.2024
NL28.02.2024
NO28.05.2024
RS28.05.2024
GR29.05.2024
IS28.06.2024
Former [2024/33]LT28.02.2024
NO28.05.2024
IS28.06.2024
Former [2024/32]IS28.06.2024
Cited inInternational search[A]EP0962825  (KANSAI RESEARCH INST KRI [JP]) [A] 1-23* paragraphs [0001] , [0 20] - [0040] - [0 49] - [0051] - [0 57]; examples 1-12; claims 1-3, 7 *;
 [A]US2003134223  (KATANO AKIRA [JP], et al) [A] 1-23 * paragraphs [0002] , [0 20] - [0030] - [ 140]; examples 1-5; claims 1-7 *;
 [A]US2005244740  (MARUYAMA KENJI [JP], et al) [A] 1-23 * paragraphs [0001] , [0 12] - [0026]; examples 1-8; claims 1-22 *;
 [A]US2009081589  (TOUKHY MEDHAT A [US], et al) [A] 1-23 * Resist Examples 1 to 9; paragraphs [0001] , [00 6] , [00 7] , [0 95] - [0097]; examples 1-7; claims 1-19 *;
 [A]US2013330669  (KAWAMURA MAKI [JP], et al) [A] 1-23 * Synthesis Example 3; paragraphs [0209] , [ 213] - [0223]; examples 8, 12, 15; claims 1-14 *;
 [A]WO2018029142  (AZ ELECTRONIC MAT LUXEMBOURG SARL [LU]) [A] 1-23 * formulations 1, 1a, 2; paragraphs [0001] , [0 12] - [0017] - [ 116] - [0151]; examples 1-8; claims 1-21; table 1 *
by applicantUS5069997
 US2002001769
 JP2008046594
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.