EP4027373 - SOURCE/DRAIN ELECTRODE FOR ORGANIC SEMICONDUCTOR DEVICE, ORGANIC SEMICONDUCTOR DEVICE USING SAME, AND PRODUCTION METHOD FOR SOURCE/DRAIN ELECTRODE AND SEMICONDUCTOR DEVICE [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 10.06.2022 Database last updated on 24.08.2024 | |
Former | The international publication has been made Status updated on 12.03.2021 | Most recent event Tooltip | 02.04.2024 | New entry: Renewal fee paid | Applicant(s) | For all designated states The University of Tokyo 3-1 Hongo 7-chome Bunkyo-ku Tokyo 113-8654 / JP | [2022/28] | Inventor(s) | 01 /
TAKEYA, Junichi c/o The University of Tokyo, 3-1, Hongo 7-chome Bunkyo-ku Tokyo 113-8654 / JP | 02 /
WATANABE, Shunichiro c/o The University of Tokyo, 3-1, Hongo 7-chome Bunkyo-ku Tokyo 113-8654 / JP | 03 /
MAKITA, Tatsuyuki c/o The University of Tokyo, 3-1, Hongo 7-chome Bunkyo-ku Tokyo 113-8654 / JP | [2022/28] | Representative(s) | Mewburn Ellis LLP Aurora Building Counterslip Bristol BS1 6BX / GB | [2022/28] | Application number, filing date | 20861639.1 | 18.06.2020 | [2022/28] | WO2020JP23900 | Priority number, date | JP20190160732 | 03.09.2019 Original published format: JP 2019160732 | [2022/28] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2021044705 | Date: | 11.03.2021 | Language: | JA | [2021/10] | Type: | A1 Application with search report | No.: | EP4027373 | Date: | 13.07.2022 | Language: | EN | [2022/28] | Search report(s) | International search report - published on: | JP | 11.03.2021 | (Supplementary) European search report - dispatched on: | EP | 31.08.2023 | Classification | IPC: | H01L21/28, H10K71/60, H10K71/80, H10K19/10, H10K10/46, // H10K85/60 | [2023/40] | CPC: |
H10K19/10 (EP);
H10K10/82 (EP,CN,KR);
H10K10/466 (CN,US);
H10K10/84 (CN,US);
H10K10/471 (US);
H10K10/476 (CN);
H10K10/88 (EP,US);
H10K71/60 (EP,KR,US);
H10K71/611 (US);
H10K71/80 (EP,US);
H10K85/141 (US);
H10K85/6576 (EP,US);
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Former IPC [2022/28] | H01L21/336, H01L29/786, H01L21/28, H01L51/05, H01L51/30 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2022/28] | Title | German: | SOURCE-DRAIN-ELEKTRODE FÜR ORGANISCHES HALBLEITERBAUELEMENT, ORGANISCHES HALBLEITERBAUELEMENT DAMIT UND HERSTELLUNGSVERFAHREN FÜR SOURCE-DRAIN-ELEKTRODE UND HALBLEITERBAUELEMENT | [2022/28] | English: | SOURCE/DRAIN ELECTRODE FOR ORGANIC SEMICONDUCTOR DEVICE, ORGANIC SEMICONDUCTOR DEVICE USING SAME, AND PRODUCTION METHOD FOR SOURCE/DRAIN ELECTRODE AND SEMICONDUCTOR DEVICE | [2022/28] | French: | ÉLECTRODE DE SOURCE/DRAIN POUR DISPOSITIF À SEMI-CONDUCTEUR ORGANIQUE, DISPOSITIF À SEMI-CONDUCTEUR ORGANIQUE L'UTILISANT, ET PROCÉDÉ DE PRODUCTION POUR ÉLECTRODE DE SOURCE/DRAIN ET DISPOSITIF À SEMI-CONDUCTEUR | [2022/28] | Entry into regional phase | 14.03.2022 | Translation filed | 14.03.2022 | National basic fee paid | 14.03.2022 | Search fee paid | 14.03.2022 | Designation fee(s) paid | 14.03.2022 | Examination fee paid | Examination procedure | 14.03.2022 | Examination requested [2022/28] | 24.03.2024 | Date on which the examining division has become responsible | 27.03.2024 | Amendment by applicant (claims and/or description) | Fees paid | Renewal fee | 14.03.2022 | Renewal fee patent year 03 | 31.03.2023 | Renewal fee patent year 04 | 31.03.2024 | Renewal fee patent year 05 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]US2005186699 (KAWASE TAKEO [JP], et al); | [Y]JP2009130327 (SEIKO EPSON CORP); | [Y]US2017047558 (LEE HYUNKOO [KR], et al); | International search | [A]JP2006073794 (VICTOR COMPANY OF JAPAN); | [A]JP2007115805 (SONY CORP); | [A]JP2007115944 (VICTOR COMPANY OF JAPAN); | [XYA]US2011117695 (CHENG JUNG-WEI JOHN [TW], et al); | [Y]JP2014502047 ; | [Y]JP2014216477 (DENSO CORP); | [Y]WO2015163207 (SUMITOMO CHEMICAL CO [JP]); | [XYA]WO2016031762 (NIKON CORP [JP]); | [A]JP2016051758 (UNIV TOKYO, et al); | [Y]JP2017157752 (DENSO CORP); | [A]JP2018037486 (DAINIPPON INK & CHEMICALS) |