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Extract from the Register of European Patents

EP About this file: EP4187591

EP4187591 - BASEPLATE AND METHOD FOR MANUFACTURING A BASEPLATE FOR A POWER MODULE AND SEMICONDUCTOR DEVICE [Right-click to bookmark this link]
StatusGrant of patent is intended
Status updated on  12.09.2024
Database last updated on 02.11.2024
FormerExamination is in progress
Status updated on  01.12.2023
FormerRequest for examination was made
Status updated on  15.09.2023
FormerThe application has been published
Status updated on  28.04.2023
Most recent event   Tooltip12.09.2024New entry: Communication of intention to grant a patent 
Applicant(s)For all designated states
Hitachi Energy Ltd
Brown-Boveri-Strasse 5
8050 Zürich / CH
[2023/50]
Former [2023/22]For all designated states
Hitachi Energy Switzerland AG
Bruggerstrasse 72
5400 Baden / CH
Inventor(s)01 / FISCHER, Fabian
5400 Baden / CH
02 / BEYER, Harald
5600 Lenzburg / CH
03 / SANTOLARIA, Lluis
4600 Olten / CH
04 / MALEKI, Milad
5417 Untersiggenthal / CH
05 / GUILLON, David
8857 Vorderthal / CH
 [2023/22]
Representative(s)Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH
Schloßschmidstraße 5
80639 München / DE
[2023/22]
Application number, filing date21210720.526.11.2021
[2023/22]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP4187591
Date:31.05.2023
Language:EN
[2023/22]
Search report(s)(Supplementary) European search report - dispatched on:EP30.05.2022
ClassificationIPC:H01L23/367, H01L23/473, F28F3/04, F28F13/18
[2023/22]
CPC:
H01L23/367 (EP); F28F13/185 (EP); F28F3/048 (EP);
H01L23/473 (EP); F28D2021/0029 (EP); F28F2215/10 (EP)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/42]
Former [2023/22]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:GRUNDPLATTE UND VERFAHREN ZUR HERSTELLUNG EINER GRUNDPLATTE FÜR EIN LEISTUNGSMODUL UND HALBLEITERBAUELEMENT[2023/22]
English:BASEPLATE AND METHOD FOR MANUFACTURING A BASEPLATE FOR A POWER MODULE AND SEMICONDUCTOR DEVICE[2023/22]
French:PLAQUE DE BASE ET PROCÉDÉ DE FABRICATION D'UNE PLAQUE DE BASE POUR UN MODULE DE PUISSANCE ET DISPOSITIF SEMI-CONDUCTEUR[2023/22]
Examination procedure07.09.2023Amendment by applicant (claims and/or description)
07.09.2023Examination requested  [2023/42]
07.09.2023Date on which the examining division has become responsible
05.12.2023Despatch of a communication from the examining division (Time limit: M04)
26.02.2024Reply to a communication from the examining division
09.04.2024Despatch of a communication from the examining division (Time limit: M04)
14.06.2024Reply to a communication from the examining division
13.09.2024Communication of intention to grant the patent
Fees paidRenewal fee
24.11.2023Renewal fee patent year 03
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Documents cited:Search[Y]US6729383  (CANNELL MICHAEL J [US], et al);
 [Y]US2005092007  (GUTFELD ROBERT J V [US], et al);
 [Y]US2007069373  (ROTH ARTI P [US]);
 [Y]WO2013184210  (MASSACHUSETTS INST TECHNOLOGY [US]);
 [Y]WO2014064450  (OXFORD NANOSYSTEMS [GB]);
 [Y]US2015008574  (GOHARA HIROMICHI [JP], et al);
 [XY]WO2020196331  (HITACHI CHEMICAL CO LTD [JP])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.