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Extract from the Register of European Patents

EP About this file: EP4189486

EP4189486 - METHOD FOR USING COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, LITHOGRAPHY COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, AND METHOD FOR MANUFACTURING RESIST PATTERN [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  05.05.2023
Database last updated on 02.11.2024
FormerThe international publication has been made
Status updated on  04.02.2022
Formerunknown
Status updated on  11.08.2021
Most recent event   Tooltip12.06.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
Merck Patent GmbH
Frankfurter Strasse 250
64293 Darmstadt / DE
[2023/23]
Inventor(s)01 / KUBO, Masahiko
Kakegawa-shi Shizuoka, 437--1412 / JP
 [2023/23]
Representative(s)Merck Patent Association
Merck Patent GmbH
64271 Darmstadt / DE
[N/P]
Application number, filing date21749180.226.07.2021
[2023/23]
WO2021EP70776
Priority number, dateJP2020012824129.07.2020         Original published format: JP 2020128241
[2023/23]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2022023230
Date:03.02.2022
Language:EN
[2022/05]
Type: A1 Application with search report 
No.:EP4189486
Date:07.06.2023
Language:EN
The application published by WIPO in one of the EPO official languages on 03.02.2022 takes the place of the publication of the European patent application.
[2023/23]
Search report(s)International search report - published on:EP03.02.2022
ClassificationIPC:G03F7/004, G03F7/038, G03F7/039
[2023/23]
CPC:
G03F7/0045 (EP,KR,US); G03F7/038 (KR); G03F7/0382 (EP,KR);
G03F7/0392 (EP); G03F7/0397 (EP); H01L21/0274 (KR,US);
H01L21/311 (KR); H01L21/7688 (US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/23]
TitleGerman:VERFAHREN ZUR VERWENDUNG EINER ZUSAMMENSETZUNG MIT CARBONSÄUREESTER, LITHOGRAFIEZUSAMMENSETZUNG MIT CARBONSÄUREESTER UND VERFAHREN ZUR HERSTELLUNG EINER RESISTSTRUKTUR[2023/23]
English:METHOD FOR USING COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, LITHOGRAPHY COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, AND METHOD FOR MANUFACTURING RESIST PATTERN[2023/23]
French:PROCÉDÉ D'UTILISATION D'UNE COMPOSITION COMPRENANT UN ESTER D'ACIDE CARBOXYLIQUE, COMPOSITION DE LITHOGRAPHIE COMPRENANT UN ESTER D'ACIDE CARBOXYLIQUE, ET PROCÉDÉ DE FABRICATION D'UN MOTIF DE RÉSERVE[2023/23]
Entry into regional phase26.01.2023National basic fee paid 
26.01.2023Designation fee(s) paid 
26.01.2023Examination fee paid 
Examination procedure26.01.2023Examination requested  [2023/23]
26.01.2023Date on which the examining division has become responsible
23.08.2023Amendment by applicant (claims and/or description)
Fees paidRenewal fee
14.06.2023Renewal fee patent year 03
12.06.2024Renewal fee patent year 04
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Cited inInternational search[XI]US5034305  (NGUYEN-KIM SON [DE], et al) [X] 1-12,14,16 * column 1, lines 4-13; examples 1-4; claims 1-13 * * column 2, line 5 - column 10, line 16 * [I] 13;
 [XI]EP1130469  (LUCENT TECHNOLOGIES INC [US]) [X] 1-4,6-12,14,16 * samples 9-14, 16 of table 1; paragraphs [0002] , [0 16] , [0 26] , [0 61] - [0066] - [0 79] - [0083]; examples 5, 7; claims 1-4, 6, 8-13, 15-19; table 1 * [I] 13;
 [X]US2015364332  (NAKAGAWA HISASHI [JP], et al) [X] 1-4,6-11,16 * paragraphs [0005] , [ 122] - [0129] - [ 139] , [ 183] , [ 187] - [0191] - [ 196] , [ 199] - [0213] - [ 232]; claims 1, 12, 16 * * synthesis example 4; paragraphs [0006] , [ 173] , [ 182]; example 4; tables 1, 2 *;
 [A]US2017184961  (NAKAGAWA HISASHI [JP], et al) [A] 1-16* paragraphs [0007] , [ 165] - [0232]; examples 1-10; claims 1-9; tables 1,2 *
by applicantUS3474054
 US4200729
 US4251665
 US5187019
 JPH11125907
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.