EP4225969 - METHOD FOR EMISSIVITY-CORRECTED PYROMETRY [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 14.07.2023 Database last updated on 31.08.2024 | |
Former | The international publication has been made Status updated on 16.04.2022 | ||
Former | unknown Status updated on 22.10.2021 | Most recent event Tooltip | 15.12.2023 | Change: Validation states | published on 17.01.2024 [2024/03] | 15.12.2023 | Change - extension states | published on 17.01.2024 [2024/03] | Applicant(s) | For all designated states Aixtron SE Dornkaulstrasse 2 52134 Herzogenrath / DE | [2023/33] | Inventor(s) | 01 /
ROJEK, Karsten 41061 Mönchengladbach / DE | 02 /
HEYDHAUSEN, Dirk 52080 Aachen / DE | [2023/33] | Representative(s) | Grundmann, Dirk, et al Rieder & Partner mbB Patentanwälte - Rechtsanwalt Yale-Allee 26 42329 Wuppertal / DE | [2023/33] | Application number, filing date | 21787373.6 | 05.10.2021 | [2023/33] | WO2021EP77333 | Priority number, date | DE202010126597 | 09.10.2020 Original published format: DE102020126597 | [2023/33] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | WO2022073951 | Date: | 14.04.2022 | Language: | DE | [2022/15] | Type: | A1 Application with search report | No.: | EP4225969 | Date: | 16.08.2023 | Language: | DE | The application published by WIPO in one of the EPO official languages on 14.04.2022 takes the place of the publication of the European patent application. | [2023/33] | Search report(s) | International search report - published on: | EP | 14.04.2022 | Classification | IPC: | C23C16/458, G01J5/00, H01L21/67, H01L21/687 | [2023/33] | CPC: |
G01J5/0003 (EP,KR);
C23C16/52 (EP,KR,US);
C23C16/303 (KR);
C23C16/34 (KR);
C23C16/4584 (EP,KR);
C23C16/46 (US);
G01J5/0007 (EP,KR,US);
H01L21/67103 (EP,KR);
H01L21/67248 (EP,KR);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2023/33] | Title | German: | VERFAHREN ZUR EMISSIVITÄTSKORRIGIERTEN PYROMETRIE | [2023/33] | English: | METHOD FOR EMISSIVITY-CORRECTED PYROMETRY | [2023/33] | French: | PROCÉDÉ DE PYROMÉTRIE À ÉMISSIVITÉ CORRIGÉE | [2023/33] | Entry into regional phase | 05.05.2023 | National basic fee paid | 05.05.2023 | Designation fee(s) paid | 05.05.2023 | Examination fee paid | Examination procedure | 05.05.2023 | Examination requested [2023/33] | 05.05.2023 | Date on which the examining division has become responsible | 03.11.2023 | Amendment by applicant (claims and/or description) | Fees paid | Renewal fee | 24.10.2023 | Renewal fee patent year 03 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [XAI]US6349270 (GURARY ALEXANDER [US], et al) [X] 1,3,4,14,15 * figures 1-3 * [A] 5-8,10,13 [I] 2,9,11,12; | [AD]US6398406 (BREILAND WILLIAM G [US], et al) [AD] 1-15 * the whole document *; | [XI]JP2018166204 (NUFLARE TECHNOLOGY INC) [X] 1,3,4,14,15 * paragraphs [0045] , [0 48] , [0 50] , [0 63] , [0065] , [0068] , [0 92] * [I] 2,9,11,12; | [XI] - YAN DONG ET AL, "In-Situ Temperature Monitoring and Deposition Induced Errors Calibration in Metal-Organic Chemical Vapor Deposition", 2013 THIRD INTERNATIONAL CONFERENCE ON INSTRUMENTATION, MEASUREMENT, COMPUTER, COMMUNICATION AND CONTROL, IEEE, (20130921), doi:10.1109/IMCCC.2013.199, pages 897 - 900, XP032609647 [X] 1,3,4,14,15 * S. 898, rechte Spalte, Abs. 6 - S.899, linke Spalte, Absätze überhalb von "Experimental Verification" * [I] 2,9,11,12 DOI: http://dx.doi.org/10.1109/IMCCC.2013.199 | [A] - Gurary Alex ET AL, "Application of Emissivity Compensated Pyrometry for Temperature Measurement and Control During Compound Semiconductors Manufacturing", AIP Conference Proceedings, doi:10.1063/1.1627233, (20031023), URL: https://aip.scitation.org/doi/pdf/10.1063/1.1627233, (20220107), XP055876770 [A] 1-15 * Kapitel: Emissivity compensated pyrometry: error analysis, S. 844-846;; figure 1 * DOI: http://dx.doi.org/10.1063/1.1627233 | [A] - BREILAND W G, "Reflectance-Correcting Pyrometry in Thin Film Deposition Applications", vol. 2003-1868, (20030601), pages 1 - 85, SAND REPORT - SAND 2003-1868, SANDIA NATIONAL LIBRARIES, US, URL: http://prod.sandia.gov/techlib/access-control.cgi/2003/031868.pdf, XP007923097 [A] 1-15 * the whole document * | [A] - BRUNNER F ET AL, "Advancedcontrol for III-nitride RF power device epitaxy", SEMICONDUCTOR SCIENCE TECHNOLOGY, IOP PUBLISHING LTD, GB, vol. 33, no. 4, doi:10.1088/1361-6641/AAB410, ISSN 0268-1242, (20180326), page 45014, (20180326), XP020325440 [A] 1-15 * figure 3 * DOI: http://dx.doi.org/10.1088/1361-6641/aab410 | by applicant | US6398406 | DE102018106481 |