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Extract from the Register of European Patents

EP About this file: EP4225969

EP4225969 - METHOD FOR EMISSIVITY-CORRECTED PYROMETRY [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  14.07.2023
Database last updated on 31.08.2024
FormerThe international publication has been made
Status updated on  16.04.2022
Formerunknown
Status updated on  22.10.2021
Most recent event   Tooltip15.12.2023Change: Validation statespublished on 17.01.2024  [2024/03]
15.12.2023Change - extension statespublished on 17.01.2024  [2024/03]
Applicant(s)For all designated states
Aixtron SE
Dornkaulstrasse 2
52134 Herzogenrath / DE
[2023/33]
Inventor(s)01 / ROJEK, Karsten
41061 Mönchengladbach / DE
02 / HEYDHAUSEN, Dirk
52080 Aachen / DE
 [2023/33]
Representative(s)Grundmann, Dirk, et al
Rieder & Partner mbB
Patentanwälte - Rechtsanwalt
Yale-Allee 26
42329 Wuppertal / DE
[2023/33]
Application number, filing date21787373.605.10.2021
[2023/33]
WO2021EP77333
Priority number, dateDE20201012659709.10.2020         Original published format: DE102020126597
[2023/33]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO2022073951
Date:14.04.2022
Language:DE
[2022/15]
Type: A1 Application with search report 
No.:EP4225969
Date:16.08.2023
Language:DE
The application published by WIPO in one of the EPO official languages on 14.04.2022 takes the place of the publication of the European patent application.
[2023/33]
Search report(s)International search report - published on:EP14.04.2022
ClassificationIPC:C23C16/458, G01J5/00, H01L21/67, H01L21/687
[2023/33]
CPC:
G01J5/0003 (EP,KR); C23C16/52 (EP,KR,US); C23C16/303 (KR);
C23C16/34 (KR); C23C16/4584 (EP,KR); C23C16/46 (US);
G01J5/0007 (EP,KR,US); H01L21/67103 (EP,KR); H01L21/67248 (EP,KR);
H01L21/68764 (EP,KR); H01L21/68771 (EP,KR); G01J2005/0074 (EP,KR) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/33]
TitleGerman:VERFAHREN ZUR EMISSIVITÄTSKORRIGIERTEN PYROMETRIE[2023/33]
English:METHOD FOR EMISSIVITY-CORRECTED PYROMETRY[2023/33]
French:PROCÉDÉ DE PYROMÉTRIE À ÉMISSIVITÉ CORRIGÉE[2023/33]
Entry into regional phase05.05.2023National basic fee paid 
05.05.2023Designation fee(s) paid 
05.05.2023Examination fee paid 
Examination procedure05.05.2023Examination requested  [2023/33]
05.05.2023Date on which the examining division has become responsible
03.11.2023Amendment by applicant (claims and/or description)
Fees paidRenewal fee
24.10.2023Renewal fee patent year 03
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[XAI]US6349270  (GURARY ALEXANDER [US], et al) [X] 1,3,4,14,15 * figures 1-3 * [A] 5-8,10,13 [I] 2,9,11,12;
 [AD]US6398406  (BREILAND WILLIAM G [US], et al) [AD] 1-15 * the whole document *;
 [XI]JP2018166204  (NUFLARE TECHNOLOGY INC) [X] 1,3,4,14,15 * paragraphs [0045] , [0 48] , [0 50] , [0 63] , [0065] , [0068] , [0 92] * [I] 2,9,11,12;
 [XI]  - YAN DONG ET AL, "In-Situ Temperature Monitoring and Deposition Induced Errors Calibration in Metal-Organic Chemical Vapor Deposition", 2013 THIRD INTERNATIONAL CONFERENCE ON INSTRUMENTATION, MEASUREMENT, COMPUTER, COMMUNICATION AND CONTROL, IEEE, (20130921), doi:10.1109/IMCCC.2013.199, pages 897 - 900, XP032609647 [X] 1,3,4,14,15 * S. 898, rechte Spalte, Abs. 6 - S.899, linke Spalte, Absätze überhalb von "Experimental Verification" * [I] 2,9,11,12

DOI:   http://dx.doi.org/10.1109/IMCCC.2013.199
 [A]  - Gurary Alex ET AL, "Application of Emissivity Compensated Pyrometry for Temperature Measurement and Control During Compound Semiconductors Manufacturing", AIP Conference Proceedings, doi:10.1063/1.1627233, (20031023), URL: https://aip.scitation.org/doi/pdf/10.1063/1.1627233, (20220107), XP055876770 [A] 1-15 * Kapitel: Emissivity compensated pyrometry: error analysis, S. 844-846;; figure 1 *

DOI:   http://dx.doi.org/10.1063/1.1627233
 [A]  - BREILAND W G, "Reflectance-Correcting Pyrometry in Thin Film Deposition Applications", vol. 2003-1868, (20030601), pages 1 - 85, SAND REPORT - SAND 2003-1868, SANDIA NATIONAL LIBRARIES, US, URL: http://prod.sandia.gov/techlib/access-control.cgi/2003/031868.pdf, XP007923097 [A] 1-15 * the whole document *
 [A]  - BRUNNER F ET AL, "Advancedcontrol for III-nitride RF power device epitaxy", SEMICONDUCTOR SCIENCE TECHNOLOGY, IOP PUBLISHING LTD, GB, vol. 33, no. 4, doi:10.1088/1361-6641/AAB410, ISSN 0268-1242, (20180326), page 45014, (20180326), XP020325440 [A] 1-15 * figure 3 *

DOI:   http://dx.doi.org/10.1088/1361-6641/aab410
by applicantUS6398406
 DE102018106481
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.