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Extract from the Register of European Patents

EP About this file: EP4145221

EP4145221 - REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  03.02.2023
Database last updated on 13.07.2024
FormerThe international publication has been made
Status updated on  05.11.2021
Most recent event   Tooltip05.06.2024Supplementary search reportpublished on 03.07.2024  [2024/27]
Applicant(s)For all designated states
Toppan Photomask Co., Ltd.
3-19-26, Shibaura
Minato-ku
Tokyo 108-0023 / JP
[2023/10]
Inventor(s)01 / NAKANO, Hideaki
Tokyo 110-0016 / JP
02 / GODA, Ayumi
Tokyo 110-0016 / JP
03 / ICHIKAWA, Kenjiro
Tokyo 110-0016 / JP
 [2023/10]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2023/10]
Application number, filing date21795894.128.04.2021
[2023/10]
WO2021JP17057
Priority number, dateJP2020008052030.04.2020         Original published format: JP 2020080520
[2023/10]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2021221124
Date:04.11.2021
Language:JA
[2021/44]
Type: A1 Application with search report 
No.:EP4145221
Date:08.03.2023
Language:EN
[2023/10]
Search report(s)International search report - published on:JP04.11.2021
(Supplementary) European search report - dispatched on:EP04.06.2024
ClassificationIPC:G03F1/24, G03F1/54
[2023/10]
CPC:
G03F1/54 (EP,KR,US); G03F1/24 (EP,KR,US)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/10]
TitleGerman:REFLEKTIERENDER FOTOMASKENROHLING UND REFLEKTIERENDE FOTOMASKE[2023/10]
English:REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK[2023/10]
French:ÉBAUCHE DE PHOTOMASQUE RÉFLÉCHISSANT ET PHOTOMASQUE RÉFLÉCHISSANT[2023/10]
Entry into regional phase21.10.2022Translation filed 
21.10.2022National basic fee paid 
21.10.2022Search fee paid 
21.10.2022Designation fee(s) paid 
21.10.2022Examination fee paid 
Examination procedure21.10.2022Examination requested  [2023/10]
Fees paidRenewal fee
30.03.2023Renewal fee patent year 03
13.03.2024Renewal fee patent year 04
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]JP2019138971  (TOPPAN PRINTING CO LTD)
International search[A]JP2006190900  (TOPPAN PRINTING CO LTD);
 [A]JP2008041740  (TOPPAN PRINTING CO LTD);
 [A]JP2009519593  ;
 [A]JP2010103463  (TOPPAN PRINTING CO LTD);
 [A]JP2019139085  (TOPPAN PRINTING CO LTD)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.