EP4145221 - REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 03.02.2023 Database last updated on 13.07.2024 | |
Former | The international publication has been made Status updated on 05.11.2021 | Most recent event Tooltip | 05.06.2024 | Supplementary search report | published on 03.07.2024 [2024/27] | Applicant(s) | For all designated states Toppan Photomask Co., Ltd. 3-19-26, Shibaura Minato-ku Tokyo 108-0023 / JP | [2023/10] | Inventor(s) | 01 /
NAKANO, Hideaki Tokyo 110-0016 / JP | 02 /
GODA, Ayumi Tokyo 110-0016 / JP | 03 /
ICHIKAWA, Kenjiro Tokyo 110-0016 / JP | [2023/10] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [2023/10] | Application number, filing date | 21795894.1 | 28.04.2021 | [2023/10] | WO2021JP17057 | Priority number, date | JP20200080520 | 30.04.2020 Original published format: JP 2020080520 | [2023/10] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2021221124 | Date: | 04.11.2021 | Language: | JA | [2021/44] | Type: | A1 Application with search report | No.: | EP4145221 | Date: | 08.03.2023 | Language: | EN | [2023/10] | Search report(s) | International search report - published on: | JP | 04.11.2021 | (Supplementary) European search report - dispatched on: | EP | 04.06.2024 | Classification | IPC: | G03F1/24, G03F1/54 | [2023/10] | CPC: |
G03F1/54 (EP,KR,US);
G03F1/24 (EP,KR,US)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2023/10] | Title | German: | REFLEKTIERENDER FOTOMASKENROHLING UND REFLEKTIERENDE FOTOMASKE | [2023/10] | English: | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | [2023/10] | French: | ÉBAUCHE DE PHOTOMASQUE RÉFLÉCHISSANT ET PHOTOMASQUE RÉFLÉCHISSANT | [2023/10] | Entry into regional phase | 21.10.2022 | Translation filed | 21.10.2022 | National basic fee paid | 21.10.2022 | Search fee paid | 21.10.2022 | Designation fee(s) paid | 21.10.2022 | Examination fee paid | Examination procedure | 21.10.2022 | Examination requested [2023/10] | Fees paid | Renewal fee | 30.03.2023 | Renewal fee patent year 03 | 13.03.2024 | Renewal fee patent year 04 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]JP2019138971 (TOPPAN PRINTING CO LTD) | International search | [A]JP2006190900 (TOPPAN PRINTING CO LTD); | [A]JP2008041740 (TOPPAN PRINTING CO LTD); | [A]JP2009519593 ; | [A]JP2010103463 (TOPPAN PRINTING CO LTD); | [A]JP2019139085 (TOPPAN PRINTING CO LTD) |