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Extract from the Register of European Patents

EP About this file: EP4255665

EP4255665 - SYSTEM AND METHOD FOR RADIUS OF CURVATURE MODIFICATION OF OPTICAL PLATES AND LENSES BY IRRADIATION WITH OPTICAL ENERGY [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  08.09.2023
Database last updated on 18.11.2024
FormerThe international publication has been made
Status updated on  14.06.2022
Most recent event   Tooltip28.10.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
Lawrence Livermore National Security, LLC
7000 East Avenue
Livermore, CA 94550 / US
[2023/41]
Inventor(s)01 / BROWAR, Allison Eileen Marie
Livermore, California 94550 / US
02 / GUSS, Gabriel Mark
Livermore, California 94550 / US
03 / MATTHEWS, Manyalibo Joseph
Livermore, California 94550 / US
04 / RAY, Nathan James
Livermore, California 94550 / US
05 / SHEN, Nan
Livermore, California 94550 / US
 [2023/41]
Representative(s)Wunderlich & Heim Patentanwälte PartG mbB
Irmgardstraße 3
81479 München / DE
[N/P]
Former [2023/41]Wunderlich & Heim Patentanwälte Partnerschaftsgesellschaft mbB
Irmgardstraße 3
81479 München / DE
Application number, filing date21901240.827.10.2021
[2023/41]
WO2021US56849
Priority number, dateUS20201711251904.12.2020         Original published format: US202017112519
[2023/41]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2022119665
Date:09.06.2022
Language:EN
[2022/23]
Type: A1 Application with search report 
No.:EP4255665
Date:11.10.2023
Language:EN
The application published by WIPO in one of the EPO official languages on 09.06.2022 takes the place of the publication of the European patent application.
[2023/41]
Search report(s)International search report - published on:KR09.06.2022
(Supplementary) European search report - dispatched on:EP27.05.2024
ClassificationIPC:B23K26/34, G02F1/11, B23K26/08, B23K26/062, B23K26/06, G02B26/08, G02B27/09, B23K26/00, B23K26/03, B23K26/082, B23K26/12, B23K26/352, B23K26/354, B23K26/60, B23K26/70, B23K103/00, G02B26/10, B23K31/00
[2024/26]
CPC:
G02F1/11 (EP,US); B23K26/53 (US); B23K26/032 (EP,US);
B23K26/062 (EP); B23K26/0626 (US); B23K26/082 (EP,US);
B23K26/127 (US); B23K26/34 (EP); B23K26/704 (US);
B23K26/705 (EP,US); B23K31/003 (EP); G02B26/0816 (EP,US);
G02B26/105 (EP); H01S3/2232 (US); B23K2103/54 (EP);
G02F1/29 (EP) (-)
Former IPC [2023/41]B23K26/08, B23K26/062, B23K26/06, G02B26/08, G02B27/09
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/41]
TitleGerman:SYSTEM UND VERFAHREN ZUR MODIFIZIERUNG DES KRÜMMUNGSRADIUS VON OPTISCHEN PLATTEN UND LINSEN DURCH BESTRAHLUNG MIT OPTISCHER ENERGIE[2023/41]
English:SYSTEM AND METHOD FOR RADIUS OF CURVATURE MODIFICATION OF OPTICAL PLATES AND LENSES BY IRRADIATION WITH OPTICAL ENERGY[2023/41]
French:SYSTÈME ET PROCÉDÉ DE MODIFICATION DE RAYON DE COURBURE DE PLAQUES ET DE LENTILLES OPTIQUES PAR EXPOSITION À DE L'ÉNERGIE OPTIQUE[2023/41]
Entry into regional phase06.06.2023National basic fee paid 
06.06.2023Search fee paid 
06.06.2023Designation fee(s) paid 
06.06.2023Examination fee paid 
Examination procedure06.06.2023Amendment by applicant (claims and/or description)
06.06.2023Examination requested  [2023/41]
Fees paidRenewal fee
27.10.2023Renewal fee patent year 03
28.10.2024Renewal fee patent year 04
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]US2004037011  (INOUE MASARU [JP], et al);
 [X]US2005173389  (TAM ANDREW C [US], et al);
 [X]CN103639590  (UNIV JIANGSU);
 [A]US2017182590  (GOYA SANEYUKI [JP], et al);
 [A]CN107914084  (HUIZHOU QIBEI TECH CO LTD);
 [A]KR20190115977  (EO TECHNICS CO LTD [KR]);
 [A]US2019329350  (UNRATH MARK A [US], et al);
 [A]WO2020159666  (ELECTRO SCIENT IND INC [US]);
 [A]WO2020202976  (TOKYO ELECTRON LTD [JP]);
International search[A]US6410884  (HACKEL LLOYD [US], et al);
 [XY]US2004050831  (TAM ANDREW CHING [US], et al);
 [A]US2008093349  (BRULAND KELLY [US], et al);
 [Y]US2010301024  (UNRATH MARK A [US]);
 [Y]WO2020159666  (ELECTRO SCIENT IND INC [US])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.