EP4255665 - SYSTEM AND METHOD FOR RADIUS OF CURVATURE MODIFICATION OF OPTICAL PLATES AND LENSES BY IRRADIATION WITH OPTICAL ENERGY [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 08.09.2023 Database last updated on 18.11.2024 | |
Former | The international publication has been made Status updated on 14.06.2022 | Most recent event Tooltip | 28.10.2024 | New entry: Renewal fee paid | Applicant(s) | For all designated states Lawrence Livermore National Security, LLC 7000 East Avenue Livermore, CA 94550 / US | [2023/41] | Inventor(s) | 01 /
BROWAR, Allison Eileen Marie Livermore, California 94550 / US | 02 /
GUSS, Gabriel Mark Livermore, California 94550 / US | 03 /
MATTHEWS, Manyalibo Joseph Livermore, California 94550 / US | 04 /
RAY, Nathan James Livermore, California 94550 / US | 05 /
SHEN, Nan Livermore, California 94550 / US | [2023/41] | Representative(s) | Wunderlich & Heim Patentanwälte PartG mbB Irmgardstraße 3 81479 München / DE | [N/P] |
Former [2023/41] | Wunderlich & Heim Patentanwälte Partnerschaftsgesellschaft mbB Irmgardstraße 3 81479 München / DE | Application number, filing date | 21901240.8 | 27.10.2021 | [2023/41] | WO2021US56849 | Priority number, date | US202017112519 | 04.12.2020 Original published format: US202017112519 | [2023/41] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2022119665 | Date: | 09.06.2022 | Language: | EN | [2022/23] | Type: | A1 Application with search report | No.: | EP4255665 | Date: | 11.10.2023 | Language: | EN | The application published by WIPO in one of the EPO official languages on 09.06.2022 takes the place of the publication of the European patent application. | [2023/41] | Search report(s) | International search report - published on: | KR | 09.06.2022 | (Supplementary) European search report - dispatched on: | EP | 27.05.2024 | Classification | IPC: | B23K26/34, G02F1/11, B23K26/08, B23K26/062, B23K26/06, G02B26/08, G02B27/09, B23K26/00, B23K26/03, B23K26/082, B23K26/12, B23K26/352, B23K26/354, B23K26/60, B23K26/70, B23K103/00, G02B26/10, B23K31/00 | [2024/26] | CPC: |
G02F1/11 (EP,US);
B23K26/53 (US);
B23K26/032 (EP,US);
B23K26/062 (EP);
B23K26/0626 (US);
B23K26/082 (EP,US);
B23K26/127 (US);
B23K26/34 (EP);
B23K26/704 (US);
B23K26/705 (EP,US);
B23K31/003 (EP);
G02B26/0816 (EP,US);
G02B26/105 (EP);
H01S3/2232 (US);
B23K2103/54 (EP);
G02F1/29 (EP)
(-)
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Former IPC [2023/41] | B23K26/08, B23K26/062, B23K26/06, G02B26/08, G02B27/09 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2023/41] | Title | German: | SYSTEM UND VERFAHREN ZUR MODIFIZIERUNG DES KRÜMMUNGSRADIUS VON OPTISCHEN PLATTEN UND LINSEN DURCH BESTRAHLUNG MIT OPTISCHER ENERGIE | [2023/41] | English: | SYSTEM AND METHOD FOR RADIUS OF CURVATURE MODIFICATION OF OPTICAL PLATES AND LENSES BY IRRADIATION WITH OPTICAL ENERGY | [2023/41] | French: | SYSTÈME ET PROCÉDÉ DE MODIFICATION DE RAYON DE COURBURE DE PLAQUES ET DE LENTILLES OPTIQUES PAR EXPOSITION À DE L'ÉNERGIE OPTIQUE | [2023/41] | Entry into regional phase | 06.06.2023 | National basic fee paid | 06.06.2023 | Search fee paid | 06.06.2023 | Designation fee(s) paid | 06.06.2023 | Examination fee paid | Examination procedure | 06.06.2023 | Amendment by applicant (claims and/or description) | 06.06.2023 | Examination requested [2023/41] | Fees paid | Renewal fee | 27.10.2023 | Renewal fee patent year 03 | 28.10.2024 | Renewal fee patent year 04 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US2004037011 (INOUE MASARU [JP], et al); | [X]US2005173389 (TAM ANDREW C [US], et al); | [X]CN103639590 (UNIV JIANGSU); | [A]US2017182590 (GOYA SANEYUKI [JP], et al); | [A]CN107914084 (HUIZHOU QIBEI TECH CO LTD); | [A]KR20190115977 (EO TECHNICS CO LTD [KR]); | [A]US2019329350 (UNRATH MARK A [US], et al); | [A]WO2020159666 (ELECTRO SCIENT IND INC [US]); | [A]WO2020202976 (TOKYO ELECTRON LTD [JP]); | International search | [A]US6410884 (HACKEL LLOYD [US], et al); | [XY]US2004050831 (TAM ANDREW CHING [US], et al); | [A]US2008093349 (BRULAND KELLY [US], et al); | [Y]US2010301024 (UNRATH MARK A [US]); | [Y]WO2020159666 (ELECTRO SCIENT IND INC [US]) |