| EP4403362 - FABRICATION SYSTEM [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 20.06.2024 Database last updated on 11.04.2026 | |
| Former | The international publication has been made Status updated on 25.03.2023 | Most recent event Tooltip | 21.01.2026 | The date on which the examining division becomes responsible, has been established | 21.01.2026 | Amendment by applicant | Applicant(s) | For all designated states NIKON CORPORATION 15-3, Konan 2-chome Minato-ku Tokyo 108-6290 / JP | [2024/30] | Inventor(s) | 01 /
FUNATSU, Takayuki Tokyo 108-6290 / JP | 02 /
TANAKA, Koji Tokyo 108-6290 / JP | 03 /
UENO, Kazuki Tokyo 108-6290 / JP | [2024/30] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [2024/30] | Application number, filing date | 21957522.2 | 16.09.2021 | [2024/30] | WO2021JP34121 | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2023042341 | Date: | 23.03.2023 | Language: | JA | [2023/12] | Type: | A1 Application with search report | No.: | EP4403362 | Date: | 24.07.2024 | Language: | EN | [2024/30] | Search report(s) | International search report - published on: | JP | 23.03.2023 | (Supplementary) European search report - dispatched on: | EP | 16.07.2025 | Classification | IPC: | B22F10/25, B33Y10/00, B33Y30/00, B33Y50/02, B29C64/277, B22F10/38, B22F12/45, B22F12/49, B22F10/366, B22F10/368, B23K26/082, B23K26/342, B29C64/268, B29C64/393, B29C64/135, B29C64/153, // B22F12/43, B22F12/53 | [2025/33] | CPC: |
B33Y10/00 (EP);
B23K26/342 (EP,US);
B22F10/25 (EP);
B22F10/366 (EP);
B22F10/368 (EP);
B22F12/45 (EP);
B22F12/49 (EP);
B23K26/0643 (US);
B23K26/082 (EP);
B29C64/135 (EP);
B29C64/153 (EP);
B29C64/268 (EP);
B29C64/277 (EP);
B29C64/393 (EP);
B33Y30/00 (EP);
|
| Former IPC [2024/30] | B33Y10/00, B33Y30/00, B29C64/277, B22F10/25, B22F10/38, B22F12/45, B22F12/49 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2024/30] | Title | German: | HERSTELLUNGSSYSTEM | [2024/30] | English: | FABRICATION SYSTEM | [2024/30] | French: | SYSTÈME DE FABRICATION | [2024/30] | Entry into regional phase | 10.04.2024 | Translation filed | 10.04.2024 | National basic fee paid | 10.04.2024 | Search fee paid | 10.04.2024 | Designation fee(s) paid | 10.04.2024 | Examination fee paid | Examination procedure | 10.04.2024 | Examination requested [2024/30] | 19.01.2026 | Amendment by applicant (claims and/or description) | 19.01.2026 | Date on which the examining division has become responsible | Fees paid | Renewal fee | 10.04.2024 | Renewal fee patent year 03 | 13.08.2024 | Renewal fee patent year 04 | 13.08.2025 | Renewal fee patent year 05 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XYIA] EP3725453 (NIKON CORP et al.) [X] 1-4,6-8,25 * paragraph [0037] * * paragraph [0092] * * paragraph [0148] - paragraph [0151] * * paragraph [0196] - paragraph [0200] * * paragraph [0208] - paragraph [0212] * * paragraph [0223] * * paragraph [0225] * * claims 1,11,14,46,48,52 * * figures 1,53,55 *[Y] 5 [I] 15-18 [A] 9,19-24 | [Y] WO2021150691 (IPG PHOTONICS CORP et al.) [Y] 5 * claim 1 * * figures 1,4 * | [A] US2018333807 (HASEGAWA KAZUO et al.) [A] 1-15 * paragraph [0080] * * paragraph [0088] * * claims 1,8 * * figure 6 * | International search | [YX] JP2020531321 (ゼネラル・エレクトリック・カンパニイ) [Y] 43-68, 113 [X] 1-42, 69-97, 109-112, 114 | [YX] JP2019507236 (ヴェロ・スリー・ディー・インコーポレイテッド) [Y] 43-68, 113 [X] 1-42, 69-97, 109-112, 114 | [YX] JP2020084195 (JTEKT CORP et al.) [Y] 43-68, 98-108, 113 [X] 89-97 | [Y] JP2019143224 (JTEKT CORP et al.) [Y] 43-68, 98-108, 113 * paragraph [0018] * | [Y] JP2021066930 (UNIV TOKYO et al.) [Y] 43-68, 98-108, 113 * paragraph [0027] * | by applicant | US2019168499 |