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EP4102321
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EP About this file: EP4102321
| EP4102321 - SYSTEMS AND METHODS FOR CONCEPT INTERVALS CLUSTERING FOR DEFECT VISIBILITY REGRESSION [Right-click to bookmark this link] | Status | Examination is in progress Status updated on 07.06.2024 Database last updated on 12.11.2024 | |
| Former | Request for examination was made Status updated on 13.01.2023 | ||
| Former | The application has been published Status updated on 11.11.2022 | Most recent event Tooltip | 24.09.2024 | New entry: Reply to examination report | Applicant(s) | For all designated states Samsung Display Co., Ltd. 1, Samsung-ro Giheung-gu Yongin-si, Gyeonggi-do 17113 / KR | [2022/50] | Inventor(s) | 01 /
LEE, Janghwan Pleasanton, 94588 / US | [2022/50] | Representative(s) | Marks & Clerk LLP 15 Fetter Lane London EC4A 1BW / GB | [2022/50] | Application number, filing date | 22168227.1 | 13.04.2022 | [2022/50] | Priority number, date | US202163209268P | 10.06.2021 Original published format: US 202163209268 P | US202117401216 | 12.08.2021 Original published format: US202117401216 | [2022/50] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP4102321 | Date: | 14.12.2022 | Language: | EN | [2022/50] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 07.10.2022 | Classification | IPC: | G05B19/418, G06N20/20, G05B13/04, G05B13/02 | [2022/50] | CPC: |
G05B19/41875 (EP);
G06Q10/06375 (KR);
G06Q10/04 (CN);
G06Q10/06395 (KR,US);
G05B13/0265 (EP);
G05B13/04 (EP);
G06N20/00 (CN,KR,US);
G06N20/20 (EP);
G06Q10/0633 (KR);
G06Q10/10 (KR);
G06Q50/04 (CN,KR,US);
G06T7/0004 (US);
G05B2219/32194 (EP);
G06N20/10 (EP);
G06T2207/20081 (US);
G06T2207/30108 (US)
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| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2023/07] |
| Former [2022/50] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Extension states | BA | Not yet paid | ME | Not yet paid | Validation states | KH | Not yet paid | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | SYSTEME UND VERFAHREN ZUM CLUSTERING VON KONZEPTINTERVALLEN ZUR REGRESSION DER FEHLERSICHTBARKEIT | [2022/50] | English: | SYSTEMS AND METHODS FOR CONCEPT INTERVALS CLUSTERING FOR DEFECT VISIBILITY REGRESSION | [2022/50] | French: | SYSTÈMES ET PROCÉDÉS DE REGROUPEMENT D'INTERVALLES CONCEPTUELS POUR LA RÉGRESSION DE VISIBILITÉ DES DÉFAUTS | [2022/50] | Examination procedure | 11.01.2023 | Amendment by applicant (claims and/or description) | 11.01.2023 | Examination requested [2023/07] | 11.01.2023 | Date on which the examining division has become responsible | 06.06.2024 | Despatch of a communication from the examining division (Time limit: M04) | 24.09.2024 | Reply to a communication from the examining division | Fees paid | Renewal fee | 13.03.2024 | Renewal fee patent year 03 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]WO2019187297 (MITSUBISHI ELECTRIC CORP [JP]); |