Extract from the Register of European Patents

EP About this file: EP4152410

EP4152410 - GATE DIELECTRIC FOR THIN FILM OXIDE TRANSISTORS [Right-click to bookmark this link]
StatusExamination is in progress
Status updated on  23.01.2025
Database last updated on 14.03.2026
FormerRequest for examination was made
Status updated on  22.09.2023
FormerThe application has been published
Status updated on  17.02.2023
Most recent event   Tooltip27.06.2025New entry: Renewal fee paid 
Applicant(s)For all designated states
INTEL Corporation
2200 Mission College Blvd.
Santa Clara, CA 95054 / US
[2023/12]
Inventor(s)01 / Connor, Christopher
Hillsboro, 97124 / US
02 / O`Donnell, James
Forest Grove, 97116 / US
03 / Madisetti, Shailesh Kumar
Hillsboro, 97124 / US
 [2023/12]
Representative(s)Goddar, Heinz J.
Boehmert & Boehmert
Anwaltspartnerschaft mbB
Pettenkoferstrasse 22
80336 München / DE
[2023/12]
Application number, filing date22184022.611.07.2022
[2023/12]
Priority number, dateUS20211747616515.09.2021         Original published format: US202117476165
[2023/12]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP4152410
Date:22.03.2023
Language:EN
[2023/12]
Search report(s)(Supplementary) European search report - dispatched on:EP21.12.2022
ClassificationIPC:H01L29/786, H01L29/51
[2023/12]
CPC:
H10D30/6756 (EP); H10D30/6755 (US); H10D30/6757 (US);
H10D64/691 (EP); H10D99/00 (US); H10D30/0278 (US);
H10D30/6728 (US); H10D84/01 (US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2023/43]
Former [2023/12]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:GATE-DIELEKTRIKUM FÜR DÜNNFILMOXIDTRANSISTOREN[2023/12]
English:GATE DIELECTRIC FOR THIN FILM OXIDE TRANSISTORS[2023/12]
French:DIÉLECTRIQUE DE GRILLE POUR TRANSISTORS À OXYDE À COUCHE MINCE[2023/12]
Examination procedure19.09.2023Amendment by applicant (claims and/or description)
19.09.2023Examination requested  [2023/43]
19.09.2023Date on which the examining division has become responsible
22.01.2025Despatch of a communication from the examining division (Time limit: M04)
20.05.2025Reply to a communication from the examining division
Fees paidRenewal fee
26.06.2024Renewal fee patent year 03
27.06.2025Renewal fee patent year 04
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Documents cited:Search[XYI] CN113299759  (TAIWAN SEMICONDUCTOR MFG CO LTD et al.) [X] 1-4,11 * figures 1-4, 6, 7 *[Y] 12-15 [I] 5-10
 [Y] US2016204129  (HOENTSCHEL JAN et al.) [Y] 12-15 * figure 2f * * paragraph [0032] - paragraph [0034] *
 [XAI] CN113380899  (TAIWAN SEMICONDUCTOR MFG CO LTD et al.) [X] 1-4,6,11 * figures 1-6 *[A] 12-15 [I] 5,7-10
 [XAI] US2020098926  (SHARMA ABHISHEK A et al.) [X] 1,2,6-8 * figures 4,5 * * paragraph [0032] *[A] 12-15 [I] 3-5,9-11
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