EP4120395 - NEGATIVE-ELECTRODE ACTIVE SUBSTANCE, MIXED NEGATIVE-ELECTRODE ACTIVE SUBSTANCE MATERIAL, AND METHOD FOR MANUFACTURING NEGATIVE-ELECTRODE ACTIVE SUBSTANCE [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 02.08.2024 Database last updated on 24.08.2024 | |
Former | The patent has been granted Status updated on 25.08.2023 | ||
Former | Grant of patent is intended Status updated on 11.05.2023 | ||
Former | Request for examination was made Status updated on 17.03.2023 | ||
Former | The application has been published Status updated on 16.12.2022 | Most recent event Tooltip | 02.08.2024 | No opposition filed within time limit | published on 04.09.2024 [2024/36] | Applicant(s) | For all designated states Shin-Etsu Chemical Co., Ltd. 4-1, Marunouchi 1-chome Chiyoda-ku Tokyo 100-0005 / JP | [2023/03] | Inventor(s) | 01 /
Hirose, Takakazu Gunma, 379-0224 / JP | 02 /
Matsuno, Takumi Gunma, 379-0224 / JP | 03 /
Sakai, Reiko Gunma, 379-0224 / JP | [2023/03] | Representative(s) | Sonnenhauser, Thomas Martin Wuesthoff & Wuesthoff Patentanwälte und Rechtsanwalt PartG mbB Schweigerstraße 2 81541 München / DE | [N/P] |
Former [2023/03] | Sonnenhauser, Thomas Martin Wuesthoff & Wuesthoff Patentanwälte PartG mbB Schweigerstraße 2 81541 München / DE | Application number, filing date | 22190989.8 | 30.03.2017 | [2023/03] | Priority number, date | JP20160117002 | 13.06.2016 Original published format: JP 2016117002 | [2023/03] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP4120395 | Date: | 18.01.2023 | Language: | EN | [2023/03] | Type: | B1 Patent specification | No.: | EP4120395 | Date: | 27.09.2023 | Language: | EN | [2023/39] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 19.12.2022 | Classification | IPC: | H01M4/48, H01M4/36, H01M4/58, H01M4/136, H01M4/131, H01M4/485, H01M10/0525 | [2023/03] | CPC: |
H01M4/131 (EP,US);
H01M4/366 (EP,KR,US);
C01B25/36 (KR);
C01B33/32 (KR);
H01M10/052 (KR);
H01M4/364 (KR);
H01M4/483 (KR);
H01M4/485 (EP,US);
H01M4/587 (KR);
H01M4/62 (KR);
H01M4/625 (US);
C01P2004/80 (KR);
C01P2006/40 (KR);
H01M10/0525 (EP,US);
H01M2004/027 (US);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2023/16] |
Former [2023/03] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Title | German: | NEGATIVELEKTRODENAKTIVSUBSTANZ, GEMISCHTES NEGATIVELEKTRODENAKTIVSUBSTANZMATERIAL UND VERFAHREN ZUR HERSTELLUNG EINER NEGATIVELEKTRODENAKTIVSUBSTANZ | [2023/03] | English: | NEGATIVE-ELECTRODE ACTIVE SUBSTANCE, MIXED NEGATIVE-ELECTRODE ACTIVE SUBSTANCE MATERIAL, AND METHOD FOR MANUFACTURING NEGATIVE-ELECTRODE ACTIVE SUBSTANCE | [2023/03] | French: | SUBSTANCE ACTIVE D'ÉLECTRODE NÉGATIVE, MATÉRIAU DE SUBSTANCE ACTIVE D'ÉLECTRODE NÉGATIVE MIXTE ET PROCÉDÉ DE FABRICATION DE SUBSTANCE ACTIVE D'ÉLECTRODE NÉGATIVE | [2023/03] | Examination procedure | 13.03.2023 | Amendment by applicant (claims and/or description) | 13.03.2023 | Examination requested [2023/16] | 13.03.2023 | Date on which the examining division has become responsible | 12.05.2023 | Communication of intention to grant the patent | 16.08.2023 | Fee for grant paid | 16.08.2023 | Fee for publishing/printing paid | 16.08.2023 | Receipt of the translation of the claim(s) | Parent application(s) Tooltip | EP17812983.9 / EP3471178 | Opposition(s) | 28.06.2024 | No opposition filed within time limit [2024/36] | Fees paid | Renewal fee | 18.08.2022 | Renewal fee patent year 03 | 18.08.2022 | Renewal fee patent year 04 | 18.08.2022 | Renewal fee patent year 05 | 18.08.2022 | Renewal fee patent year 06 | 14.02.2023 | Renewal fee patent year 07 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | AT | 27.09.2023 | CZ | 27.09.2023 | DK | 27.09.2023 | EE | 27.09.2023 | ES | 27.09.2023 | FI | 27.09.2023 | HR | 27.09.2023 | IT | 27.09.2023 | LT | 27.09.2023 | LV | 27.09.2023 | NL | 27.09.2023 | PL | 27.09.2023 | RO | 27.09.2023 | RS | 27.09.2023 | SE | 27.09.2023 | SK | 27.09.2023 | SM | 27.09.2023 | NO | 27.12.2023 | GR | 28.12.2023 | IS | 27.01.2024 | PT | 29.01.2024 | [2024/33] |
Former [2024/27] | AT | 27.09.2023 | |
CZ | 27.09.2023 | ||
EE | 27.09.2023 | ||
ES | 27.09.2023 | ||
FI | 27.09.2023 | ||
HR | 27.09.2023 | ||
IT | 27.09.2023 | ||
LT | 27.09.2023 | ||
LV | 27.09.2023 | ||
NL | 27.09.2023 | ||
PL | 27.09.2023 | ||
RO | 27.09.2023 | ||
RS | 27.09.2023 | ||
SE | 27.09.2023 | ||
SK | 27.09.2023 | ||
SM | 27.09.2023 | ||
NO | 27.12.2023 | ||
GR | 28.12.2023 | ||
IS | 27.01.2024 | ||
PT | 29.01.2024 | ||
Former [2024/23] | AT | 27.09.2023 | |
CZ | 27.09.2023 | ||
EE | 27.09.2023 | ||
ES | 27.09.2023 | ||
FI | 27.09.2023 | ||
HR | 27.09.2023 | ||
LT | 27.09.2023 | ||
LV | 27.09.2023 | ||
NL | 27.09.2023 | ||
RO | 27.09.2023 | ||
RS | 27.09.2023 | ||
SE | 27.09.2023 | ||
SK | 27.09.2023 | ||
SM | 27.09.2023 | ||
NO | 27.12.2023 | ||
GR | 28.12.2023 | ||
IS | 27.01.2024 | ||
PT | 29.01.2024 | ||
Former [2024/20] | FI | 27.09.2023 | |
HR | 27.09.2023 | ||
LT | 27.09.2023 | ||
LV | 27.09.2023 | ||
NL | 27.09.2023 | ||
RS | 27.09.2023 | ||
SE | 27.09.2023 | ||
SM | 27.09.2023 | ||
NO | 27.12.2023 | ||
GR | 28.12.2023 | ||
IS | 27.01.2024 | ||
Former [2024/14] | FI | 27.09.2023 | |
HR | 27.09.2023 | ||
LT | 27.09.2023 | ||
LV | 27.09.2023 | ||
NL | 27.09.2023 | ||
RS | 27.09.2023 | ||
SE | 27.09.2023 | ||
NO | 27.12.2023 | ||
GR | 28.12.2023 | ||
Former [2024/10] | FI | 27.09.2023 | |
HR | 27.09.2023 | ||
LT | 27.09.2023 | ||
LV | 27.09.2023 | ||
RS | 27.09.2023 | ||
SE | 27.09.2023 | ||
NO | 27.12.2023 | ||
GR | 28.12.2023 | ||
Former [2024/09] | FI | 27.09.2023 | |
LT | 27.09.2023 | ||
SE | 27.09.2023 | ||
NO | 27.12.2023 | ||
GR | 28.12.2023 | ||
Former [2024/08] | LT | 27.09.2023 | |
NO | 27.12.2023 | ||
GR | 28.12.2023 | Documents cited: | Search | [A]EP2372816 (SHINETSU CHEMICAL CO [JP]) [A] 1-15 * examples 1, 5 *; | [A]JP2014103019 (SHINETSU CHEMICAL CO) [A] 1-15 * paragraph [0049]; example 1 *; | [A]CN105322158 (CHINESE ACAD INST CHEMISTRY) [A] 1-15* example 5 * | by applicant | JP2997741B | JP2001185127 | JP2002042806 | JP2006114454 | JP2006164954 | JP2007234255 | JP2008177346 | JP2008251369 | JP2008282819 | JP2009070825 | JP2009205950 | JP2009212074 |