EP4170904 - SCALABLE EOS AND AGING TOLERANT LEVEL SHIFTER FOR A HIGH VOLTAGE DESIGN FOR THIN GATE TECHNOLOGY [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 13.10.2023 Database last updated on 19.10.2024 | |
Former | The application has been published Status updated on 24.03.2023 | Most recent event Tooltip | 29.07.2024 | New entry: Renewal fee paid | Applicant(s) | For all designated states Intel Corporation 2200 Mission College Boulevard Santa Clara, CA 95054 / US | [2023/17] | Inventor(s) | 01 /
DUA, Raj 141012 Ludhiana Punjab / IN | 02 /
VENKATANARAYANAN, Hari Vijay 560066 Bengaluru / IN | [2023/17] | Representative(s) | HGF HGF Limited 1 City Walk Leeds LS11 9DX / GB | [2023/17] | Application number, filing date | 22191327.0 | 19.08.2022 | [2023/17] | Priority number, date | US202117482912 | 23.09.2021 Original published format: US202117482912 | [2023/17] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP4170904 | Date: | 26.04.2023 | Language: | EN | [2023/17] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 24.03.2023 | Classification | IPC: | H03K3/356 | [2023/17] | CPC: |
H03K3/356113 (EP);
H03K19/018507 (US)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2023/46] |
Former [2023/17] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Extension states | BA | Not yet paid | ME | Not yet paid | Validation states | KH | Not yet paid | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | SKALIERBARER EOS- UND ALTERUNGSTOLERANTER PEGELSCHIEBER FÜR EIN HOCHSPANNUNGSDESIGN FÜR DÜNNGATETECHNOLOGIE | [2023/17] | English: | SCALABLE EOS AND AGING TOLERANT LEVEL SHIFTER FOR A HIGH VOLTAGE DESIGN FOR THIN GATE TECHNOLOGY | [2023/17] | French: | EOAS ÉVOLUTIF ET DISPOSITIF DE DÉCALAGE DE NIVEAU TOLÉRANT AU VIEILLISSEMENT POUR UNE CONCEPTION HAUTE TENSION POUR UNE TECHNOLOGIE DE GRILLE MINCE | [2023/17] | Examination procedure | 09.10.2023 | Amendment by applicant (claims and/or description) | 09.10.2023 | Examination requested [2023/46] | 09.10.2023 | Date on which the examining division has become responsible | Fees paid | Renewal fee | 29.07.2024 | Renewal fee patent year 03 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [I]US2011254591 (MONGA SUSHRANT [IN]) [I] 1-15 * paragraph [0003] - paragraph [0124]; figures 1-10 *; | [XI]US2013141140 (KUMAR VINOD [IN]) [X] 1,12 * paragraph [0002] - paragraph [0036]; figures 1-9 * [I] 2-11,13-15; | [I]US2016164497 (AGARWAL NAVIN [IN], et al) [I] 1-15* paragraph [0002] - paragraph [0034]; figures 1-3B * |