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Extract from the Register of European Patents

EP About this file: EP4331016

EP4331016 - SEMICONDUCTOR DEVICE INCLUDING A SUPERLATTICE PROVIDING METAL WORK FUNCTION TUNING AND ASSOCIATED METHODS [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  02.02.2024
Database last updated on 10.07.2024
FormerThe international publication has been made
Status updated on  26.11.2022
Formerunknown
Status updated on  21.06.2022
Most recent event   Tooltip08.06.2024Amendment by applicant 
Applicant(s)For all designated states
Atomera Incorporated
750 University Avenue, Suite 280
Los Gatos, CA 95032 / US
[2024/10]
Inventor(s)01 / MEARS, Robert, J.
Wellesley, MA 02482 / US
02 / TAKEUCHI, Hideki
San Jose, CA 95129 / US
 [2024/10]
Representative(s)Page White Farrer
Bedford House
21a John Street
London WC1N 2BF / GB
[2024/10]
Application number, filing date22729931.018.05.2022
[2024/10]
WO2022US29752
Priority number, dateUS202163189909P18.05.2021         Original published format: US 202163189909 P
US202163211174P16.06.2021         Original published format: US 202163211174 P
US202163212292P18.06.2021         Original published format: US 202163212292 P
[2024/10]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2022245889
Date:24.11.2022
Language:EN
[2022/47]
Type: A1 Application with search report 
No.:EP4331016
Date:06.03.2024
Language:EN
The application published by WIPO in one of the EPO official languages on 24.11.2022 takes the place of the publication of the European patent application.
[2024/10]
Search report(s)International search report - published on:EP24.11.2022
ClassificationIPC:H01L29/08, H01L29/15, H01L21/336, H01L29/775, H01L29/423, H01L21/02, B82Y10/00, H01L29/165
[2024/10]
CPC:
H01L29/152 (EP); H01L29/0665 (US); H01L21/823412 (US);
H01L21/823418 (US); H01L29/0847 (EP); H01L29/1054 (US);
H01L29/15 (US); H01L29/157 (US); H01L29/42392 (EP,US);
H01L29/66439 (EP); H01L29/66742 (US); H01L29/775 (EP);
H01L29/7842 (US); H01L29/78618 (US); H01L29/78696 (EP,US);
B82Y10/00 (EP); H01L21/0245 (EP); H01L21/02488 (EP);
H01L21/02499 (EP); H01L21/02507 (EP); H01L21/02532 (EP);
H01L29/165 (EP) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2024/10]
Extension statesBANot yet paid
MENot yet paid
Validation statesKHNot yet paid
MANot yet paid
MDNot yet paid
TNNot yet paid
TitleGerman:HALBLEITERBAUELEMENT MIT EINEM ÜBERGITTER ZUR BEREITSTELLUNG VON METALLARBEITSFUNKTIONSABSTIMMUNG UND ZUGEHÖRIGE VERFAHREN[2024/10]
English:SEMICONDUCTOR DEVICE INCLUDING A SUPERLATTICE PROVIDING METAL WORK FUNCTION TUNING AND ASSOCIATED METHODS[2024/10]
French:DISPOSITIF À SEMI-CONDUCTEUR COMPRENANT UN SUPER-RÉSEAU FOURNISSANT UN ACCORD DE FONCTION DE TRAVAIL MÉTALLIQUE ET PROCÉDÉS ASSOCIÉS[2024/10]
Entry into regional phase27.11.2023National basic fee paid 
27.11.2023Designation fee(s) paid 
27.11.2023Examination fee paid 
Examination procedure17.03.2023Request for preliminary examination filed
International Preliminary Examining Authority: EP
27.11.2023Examination requested  [2024/10]
27.11.2023Date on which the examining division has become responsible
07.06.2024Amendment by applicant (claims and/or description)
Fees paidRenewal fee
14.05.2024Renewal fee patent year 03
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[A]US2006292765  (BLANCHARD RICHARD A [US], et al) [A] 1-23* the whole document *;
 [Y]US2019279897  (STEPHENSON ROBERT JOHN [GB], et al) [Y] 1-23 * paragraph [0031] - paragraph [0048] * * paragraph [0055] - paragraph [0060] * * figures 1-3,5-8; claims 1,8 *;
 [A]US10593761  (TAKEUCHI HIDEKI [US], et al) [A] 1-23 * column 13, line 62 - column 14, line 27 * * figure 10 *;
 [Y]EP3648172  (MEDIATEK INC [TW]) [Y] 1-23 * paragraph [0045] * * paragraph [0060] - paragraph [0067] * * paragraph [0077] - paragraph [0082] * * figures 6,11A-12B *
by applicantUS4937204
 US5216262
 US5357119
 US5683934
 GB2347520
 US6376337
 US6472685
 US2003034529
 US2003057416
 US7105895
 US9899479
 US9941359
 US10109479
 US2021126018
 US2022005926
    - TSU, "Phenomena in silicon nanostructure devices", Applied Physics and Materials Science & Processing, (20000906), pages 391 - 402, XP002314003
    - LUO et al., "Chemical Design of Direct-Gap Light-Emitting Silicon", Physical Review Letters, (20020812), vol. 89, no. 7, doi:10.1103/PhysRevLett.89.076802, XP002314002

DOI:   http://dx.doi.org/10.1103/PhysRevLett.89.076802
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.