EP4367557 - A POSITION MEASUREMENT SYSTEM, A POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS, AND A DEVICE MANUFACTURING METHOD [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 12.04.2024 Database last updated on 19.10.2024 | |
Former | The international publication has been made Status updated on 13.01.2023 | ||
Former | unknown Status updated on 05.08.2022 | Most recent event Tooltip | 13.09.2024 | Change: Validation states | published on 16.10.2024 [2024/42] | 13.09.2024 | Change - extension states | published on 16.10.2024 [2024/42] | Applicant(s) | For all designated states ASML Netherlands B.V. P.O. Box 324 5500 AH Veldhoven / NL | [2024/20] | Inventor(s) | 01 /
VAN DE KERKHOF, Marcus, Adrianus Veldhoven 5500 AH / NL | [2024/20] | Representative(s) | ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | [2024/20] | Application number, filing date | 22744418.9 | 30.06.2022 | [2024/20] | WO2022EP68214 | Priority number, date | EP20210184382 | 07.07.2021 Original published format: EP 21184382 | [2024/20] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2023280692 | Date: | 12.01.2023 | Language: | EN | [2023/02] | Type: | A1 Application with search report | No.: | EP4367557 | Date: | 15.05.2024 | Language: | EN | The application published by WIPO in one of the EPO official languages on 12.01.2023 takes the place of the publication of the European patent application. | [2024/20] | Search report(s) | International search report - published on: | EP | 12.01.2023 | Classification | IPC: | G03F7/20 | [2024/20] | CPC: |
G03F7/70775 (EP);
G03F7/70725 (EP)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2024/20] | Title | German: | POSITIONSMESSSYSTEM, POSITIONIERUNGSSYSTEM, LITHOGRAFISCHE VORRICHTUNG UND VORRICHTUNGSHERSTELLUNGSVERFAHREN | [2024/20] | English: | A POSITION MEASUREMENT SYSTEM, A POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS, AND A DEVICE MANUFACTURING METHOD | [2024/20] | French: | SYSTÈME DE MESURE DE POSITION, SYSTÈME DE POSITIONNEMENT, APPAREIL LITHOGRAPHIQUE ET PROCÉDÉ DE FABRICATION DE DISPOSITIF | [2024/20] | Entry into regional phase | 01.12.2023 | National basic fee paid | 01.12.2023 | Designation fee(s) paid | 01.12.2023 | Examination fee paid | Examination procedure | 01.12.2023 | Examination requested [2024/20] | 01.12.2023 | Date on which the examining division has become responsible | 03.09.2024 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the Extended European Search Report/Written Opinion of the International Searching Authority/International Preliminary Examination Report/Supplementary international search report not received in time | Fees paid | Renewal fee | 31.03.2024 | Renewal fee patent year 03 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [XY]US2013293962 (SCHNIER DIETMAR [DE]) [X] 1,2,6-13 * paragraph [0047] - paragraph [0073] * * figures 1-4,9,11 * [Y] 3-5; | [YA]WO2017001124 (ASML NETHERLANDS BV [NL]) [Y] 3-5 * page 9, line 6 - page 12, line 16 * * figure 4 *[A] 1,13 | by applicant | US6020964 | US6952253 | US2007058173 |