blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP4367557

EP4367557 - A POSITION MEASUREMENT SYSTEM, A POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS, AND A DEVICE MANUFACTURING METHOD [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  12.04.2024
Database last updated on 19.10.2024
FormerThe international publication has been made
Status updated on  13.01.2023
Formerunknown
Status updated on  05.08.2022
Most recent event   Tooltip13.09.2024Change: Validation statespublished on 16.10.2024  [2024/42]
13.09.2024Change - extension statespublished on 16.10.2024  [2024/42]
Applicant(s)For all designated states
ASML Netherlands B.V.
P.O. Box 324
5500 AH Veldhoven / NL
[2024/20]
Inventor(s)01 / VAN DE KERKHOF, Marcus, Adrianus
Veldhoven 5500 AH / NL
 [2024/20]
Representative(s)ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
[2024/20]
Application number, filing date22744418.930.06.2022
[2024/20]
WO2022EP68214
Priority number, dateEP2021018438207.07.2021         Original published format: EP 21184382
[2024/20]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2023280692
Date:12.01.2023
Language:EN
[2023/02]
Type: A1 Application with search report 
No.:EP4367557
Date:15.05.2024
Language:EN
The application published by WIPO in one of the EPO official languages on 12.01.2023 takes the place of the publication of the European patent application.
[2024/20]
Search report(s)International search report - published on:EP12.01.2023
ClassificationIPC:G03F7/20
[2024/20]
CPC:
G03F7/70775 (EP); G03F7/70725 (EP)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2024/20]
TitleGerman:POSITIONSMESSSYSTEM, POSITIONIERUNGSSYSTEM, LITHOGRAFISCHE VORRICHTUNG UND VORRICHTUNGSHERSTELLUNGSVERFAHREN[2024/20]
English:A POSITION MEASUREMENT SYSTEM, A POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS, AND A DEVICE MANUFACTURING METHOD[2024/20]
French:SYSTÈME DE MESURE DE POSITION, SYSTÈME DE POSITIONNEMENT, APPAREIL LITHOGRAPHIQUE ET PROCÉDÉ DE FABRICATION DE DISPOSITIF[2024/20]
Entry into regional phase01.12.2023National basic fee paid 
01.12.2023Designation fee(s) paid 
01.12.2023Examination fee paid 
Examination procedure01.12.2023Examination requested  [2024/20]
01.12.2023Date on which the examining division has become responsible
03.09.2024Despatch of communication that the application is deemed to be withdrawn, reason: reply to the Extended European Search Report/Written Opinion of the International Searching Authority/International Preliminary Examination Report/Supplementary international search report not received in time
Fees paidRenewal fee
31.03.2024Renewal fee patent year 03
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[XY]US2013293962  (SCHNIER DIETMAR [DE]) [X] 1,2,6-13 * paragraph [0047] - paragraph [0073] * * figures 1-4,9,11 * [Y] 3-5;
 [YA]WO2017001124  (ASML NETHERLANDS BV [NL]) [Y] 3-5 * page 9, line 6 - page 12, line 16 * * figure 4 *[A] 1,13
by applicantUS6020964
 US6952253
 US2007058173
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.