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EP4363629
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EP About this file: EP4363629
| EP4363629 - CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 05.04.2024 Database last updated on 16.11.2024 | |
| Former | The international publication has been made Status updated on 06.01.2023 | Most recent event Tooltip | 30.08.2024 | Change: Validation states | published on 02.10.2024 [2024/40] | 30.08.2024 | Change - extension states | published on 02.10.2024 [2024/40] | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue Santa Clara, California 95054 / US | [2024/19] | Inventor(s) | 01 /
RAMALINGAM, Jothilingam Santa Clara, California 95054 / US | 02 /
CAO, Yong Santa Clara, California 95054 / US | 03 /
LAVITSKY, Ilya Santa Clara, California 95054 / US | 04 /
MILLER, Keith A. Santa Clara, California 95054 / US | 05 /
GUNG, Tza-Jing Santa Clara, California 95054 / US | 06 /
TANG, Xianmin Santa Clara, California 95054 / US | 07 /
LAVAN, Shane Santa Clara, California 95054 / US | 08 /
SCHMIEDING, Randy D. Santa Clara, California 95054 / US | 09 /
FORSTER, John C. Santa Clara, California 95054 / US | 10 /
SAVANDAIAH, Kirankumar Neelasandra Bangalore, Karnataka 560072 / IN | [2024/19] | Representative(s) | Zimmermann & Partner Patentanwälte mbB Postfach 330 920 80069 München / DE | [2024/19] | Application number, filing date | 22834031.1 | 28.06.2022 | [2024/19] | WO2022US35236 | Priority number, date | US202117362925 | 29.06.2021 Original published format: US202117362925 | [2024/19] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2023278388 | Date: | 05.01.2023 | Language: | EN | [2023/01] | Type: | A1 Application with search report | No.: | EP4363629 | Date: | 08.05.2024 | Language: | EN | The application published by WIPO in one of the EPO official languages on 05.01.2023 takes the place of the publication of the European patent application. | [2024/19] | Search report(s) | International search report - published on: | KR | 05.01.2023 | Classification | IPC: | C23C14/56, C23C14/34, C23C14/50, C23C14/22, H01J37/34, H01J37/32 | [2024/19] | CPC: |
H01J37/3435 (EP,KR,US);
C23C14/564 (EP,KR,US);
H01J37/3488 (EP,KR,US);
C23C14/34 (EP,KR);
C23C14/50 (EP,KR);
C23C14/54 (KR,US);
H01J37/32091 (EP,KR,US);
H01J37/32357 (EP,KR,US);
H01J37/32862 (US);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2024/19] | Title | German: | SIN-REINIGUNG MIT CCP-PLASMA ODER RPS-REINIGUNG | [2024/19] | English: | CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN | [2024/19] | French: | NETTOYAGE DE SIN AVEC DU PLASMA À COUPLAGE CAPACITIF OU NETTOYAGE PAR SOURCE DE PLASMA À DISTANCE | [2024/19] | Entry into regional phase | 23.01.2024 | National basic fee paid | 23.01.2024 | Search fee paid | 23.01.2024 | Designation fee(s) paid | 23.01.2024 | Examination fee paid | Examination procedure | 23.01.2024 | Examination requested [2024/19] | 19.07.2024 | Amendment by applicant (claims and/or description) | Fees paid | Renewal fee | 23.01.2024 | Renewal fee patent year 03 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [Y]US7041200 (LE HIEN-MINH HUU [US], et al); | [Y]US2007017798 (INAGAWA MAKOTO [US]); | [YA]US2008178801 (PAVLOFF CRISTOPHER MARK [US], et al); | [A]US2014366912 (GREEN RICHARD J [US], et al); | [A]US2020395198 (ALLEN ADOLPH M [US], et al) |