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EP4404244
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EP About this file: EP4404244
| EP4404244 - METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND PEELING AND DISSOLVING COMPOSITION [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 20.06.2024 Database last updated on 02.11.2024 | |
| Former | The international publication has been made Status updated on 25.03.2023 | Most recent event Tooltip | 14.09.2024 | New entry: Renewal fee paid | Applicant(s) | For all designated states Nissan Chemical Corporation 5-1, Nihonbashi 2-chome Chuo-ku Tokyo 103-6119 / JP | [2024/30] | Inventor(s) | 01 /
YAGYU, Masafumi Toyama-shi, Toyama 939-2792 / JP | 02 /
OKUNO, Takahisa Toyama-shi, Toyama 939-2792 / JP | 03 /
SHINJO, Tetsuya Toyama-shi, Toyama 939-2792 / JP | [2024/30] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [2024/30] | Application number, filing date | 22869958.3 | 13.09.2022 | [2024/30] | WO2022JP34143 | Priority number, date | JP20210151098 | 16.09.2021 Original published format: JP 2021151098 | [2024/30] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2023042811 | Date: | 23.03.2023 | Language: | JA | [2023/12] | Type: | A1 Application with search report | No.: | EP4404244 | Date: | 24.07.2024 | Language: | EN | [2024/30] | Search report(s) | International search report - published on: | JP | 23.03.2023 | Classification | IPC: | H01L21/304, C09D9/04, C09J7/35, C09J183/05, C09J183/07, C11D7/26, C11D7/32, C11D7/50, H01L21/02 | [2024/30] | CPC: |
H01L21/02 (EP);
H01L21/02052 (KR);
C11D3/32 (EP,US);
C08J11/28 (US);
C09D9/04 (EP);
C09J183/04 (EP,KR,US);
C09J7/38 (US);
C11D3/2068 (EP,US);
C11D3/2093 (EP,US);
C11D3/30 (EP,US);
C11D3/43 (EP,US);
C11D7/26 (EP);
C11D7/32 (EP);
C11D7/3209 (EP,KR);
C11D7/50 (EP);
C11D7/5009 (KR);
C11D7/5013 (KR);
C11D7/5022 (KR);
H01L21/02057 (EP,US);
H01L21/304 (EP,US);
H01L21/31133 (EP);
H01L21/324 (KR);
H01L21/67098 (KR);
H01L21/6835 (EP,US);
C08J2383/04 (US);
C09J2301/502 (US);
C09J2483/00 (US);
C11D2111/22 (EP,US);
H01L2221/68318 (EP);
H01L2221/68327 (EP);
H01L2221/68381 (EP)
(-)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2024/30] | Extension states | BA | Not yet paid | ME | Not yet paid | Validation states | KH | Not yet paid | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | VERFAHREN ZUR REINIGUNG EINES HALBLEITERSUBSTRATS, VERFAHREN ZUR HERSTELLUNG EINES VERARBEITETEN HALBLEITERSUBSTRATS UND SCHÄL- UND AUFLÖSUNGSZUSAMMENSETZUNG | [2024/30] | English: | METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND PEELING AND DISSOLVING COMPOSITION | [2024/30] | French: | PROCÉDÉ DE NETTOYAGE D'UN SUBSTRAT SEMI-CONDUCTEUR, PROCÉDÉ DE FABRICATION D'UN SUBSTRAT SEMI-CONDUCTEUR TRAITÉ, ET COMPOSITION DE PELAGE ET DE DISSOLUTION | [2024/30] | Entry into regional phase | 15.04.2024 | Translation filed | 15.04.2024 | National basic fee paid | 15.04.2024 | Search fee paid | 15.04.2024 | Designation fee(s) paid | 15.04.2024 | Examination fee paid | Examination procedure | 15.04.2024 | Examination requested [2024/30] | 10.07.2024 | Amendment by applicant (claims and/or description) | Fees paid | Renewal fee | 13.09.2024 | Renewal fee patent year 03 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [A]JP2017011279 (TOKYO OHKA KOGYO CO LTD); | [Y]WO2020166702 (NISSAN CHEMICAL CORP [JP]); | [Y]WO2021100651 (NISSAN CHEMICAL CORP [JP]); | [YX]WO2021106460 (SHOWA DENKO KK [JP]) | by applicant | US6818608 | WO2014092022 | WO2020080060 |