| EP4415028 - FILM FORMING APPARATUS AND METHOD FOR FORMING CRYSTALLINE SEMICONDUCTOR FILM USING SAME [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 12.07.2024 Database last updated on 28.03.2026 | |
| Former | The international publication has been made Status updated on 14.04.2023 | Most recent event Tooltip | 21.01.2026 | Supplementary search report | published on 18.02.2026 [2026/08] | Applicant(s) | For all designated states SHIN-ETSU CHEMICAL CO., LTD. 4-1, Marunouchi 1 chome Chiyoda-ku Tokyo 1000005 / JP | For all designated states Shin-Etsu Engineering Co., Ltd. 9 Kanda-nishiki-cho 2-chome Chiyoda-ku Tokyo 101-0054 / JP | [N/P] |
| Former [2024/33] | For all designated states SHIN-ETSU CHEMICAL CO., LTD. 4-1, Marunouchi 1 chome Chiyoda-ku Tokyo 1000005 / JP | ||
| For all designated states Shin-etsu Engineering Co., Ltd. 9 Kanda Nishikicho 2-chome Chiyoda-ku Tokyo 101-0054 / JP | Inventor(s) | 01 /
HASHIGAMI, Hiroshi Annaka-shi, Gunma 379-0195 / JP | 02 /
KOJIMA, Muneyuki Annaka-shi, Gunma 379-0127 / JP | [2024/33] | Representative(s) | Mooser, Sebastian Thomas Wuesthoff & Wuesthoff Patentanwälte und Rechtsanwalt PartG mbB Schweigerstraße 2 81541 München / DE | [2024/33] | Application number, filing date | 22878146.4 | 29.06.2022 | [2024/33] | WO2022JP25860 | Priority number, date | JP20210165618 | 07.10.2021 Original published format: JP 2021165618 | [2024/33] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2023058273 | Date: | 13.04.2023 | Language: | JA | [2023/15] | Type: | A1 Application with search report | No.: | EP4415028 | Date: | 14.08.2024 | Language: | EN | [2024/33] | Search report(s) | International search report - published on: | JP | 13.04.2023 | (Supplementary) European search report - dispatched on: | EP | 20.01.2026 | Classification | IPC: | H01L21/365, H01L21/368 | [2024/33] | CPC: |
H10P14/24 (EP,US);
H10P14/60 (EP,KR);
C23C16/40 (EP,US);
C23C16/4412 (EP,US);
C23C16/4486 (EP,US);
C23C16/45512 (US);
C23C16/4583 (EP,US);
C23C16/46 (EP,US);
H10P14/265 (EP);
H10P14/3411 (EP);
H10P14/3434 (EP,US);
H10P72/0402 (KR);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2024/33] | Title | German: | FILMBILDUNGSVORRICHTUNG UND VERFAHREN ZUR BILDUNG EINES KRISTALLINEN HALBLEITERFILMS DAMIT | [2024/33] | English: | FILM FORMING APPARATUS AND METHOD FOR FORMING CRYSTALLINE SEMICONDUCTOR FILM USING SAME | [2024/33] | French: | APPAREIL DE FORMATION DE FILM ET PROCÉDÉ DE FORMATION DE FILM SEMI-CONDUCTEUR CRISTALLIN FAISANT INTERVENIR CET APPAREIL | [2024/33] | Entry into regional phase | 27.03.2024 | Translation filed | 27.03.2024 | National basic fee paid | 27.03.2024 | Search fee paid | 27.03.2024 | Designation fee(s) paid | 27.03.2024 | Examination fee paid | Examination procedure | 27.03.2024 | Examination requested [2024/33] | 13.11.2024 | Amendment by applicant (claims and/or description) | Fees paid | Renewal fee | 27.03.2024 | Renewal fee patent year 03 | 20.05.2025 | Renewal fee patent year 04 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XIY] JP6925548 (信越化学工業株式会社) [X] 1,7,9 * paragraphs [0049] , [0073] , [0 53] - [0063]; figure 1 *[I] 10 [Y] 2-6,8 | [Y] JP2004158554 (RORZE CORP et al.) [Y] 2,4-5 * paragraphs [0009] , [0010] , [0017] - [0019]; figure 3 * | [Y] JP2021136445 (SHINETSU CHEMICAL CO et al.) [Y] 3 * paragraph [0048]; claim 1 * | [Y] JPH07245265 (FUJITSU LTD et al.) [Y] 6 * paragraph [0028]; figure 2 * | [Y] JP2020174153 (SHINETSU CHEMICAL CO et al.) [Y] 8 * paragraphs [0049] , [0050] * | International search | [YX] JP6925548 (信越化学工業株式会社) [Y] 2-6, 8, 10 * paragraphs [0034]-[0059], fig. 1 *[X] 1, 7, 9 | [Y] JP2004158554 (RORZE CORP et al.) [Y] 2-5 * paragraphs [0009]-[0019], fig. 3 * | [Y] JPH07245265 (FUJITSU LTD et al.) [Y] 6 * paragraphs [0013]-[0015], fig. 1 * | [Y] JP2020174153 (SHINETSU CHEMICAL CO et al.) [Y] 8 * paragraph [0070] * | [Y] JP2012119591 (FUJI ELECTRIC CO LTD et al.) [Y] 10 * paragraph [0168] * | by applicant | JP2013028480 | JP2020107636 | JP2020188170 |