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EP4276532
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EP About this file: EP4276532
| EP4276532 - REFLECTIVE PHOTOMASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 22.12.2023 Database last updated on 24.08.2024 | |
| Former | The application has been published Status updated on 13.10.2023 | Most recent event Tooltip | 22.12.2023 | The date on which the examining division becomes responsible, has been established | 22.12.2023 | Request for examination filed | published on 24.01.2024 [2024/04] | 22.12.2023 | Change - designated states | published on 24.01.2024 [2024/04] | Applicant(s) | For all designated states Shin-Etsu Chemical Co., Ltd. 4-1, Marunouchi 1-chome Chiyoda-ku Tokyo / JP | [2023/46] | Inventor(s) | 01 /
SAKURAI, Keisuke Joetsu-shi / JP | 02 /
MIMURA, Shohei Joetsu-shi / JP | 03 /
ISHII, Takeshi Joetsu-shi / JP | [2023/46] | Representative(s) | Mewburn Ellis LLP Aurora Building Counterslip Bristol BS1 6BX / GB | [2023/46] | Application number, filing date | 23171223.3 | 03.05.2023 | [2023/46] | Priority number, date | JP20220079563 | 13.05.2022 Original published format: JP 2022079563 | [2023/46] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP4276532 | Date: | 15.11.2023 | Language: | EN | [2023/46] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 05.10.2023 | Classification | IPC: | G03F1/24 | [2023/46] | CPC: |
G03F1/24 (EP,CN,KR);
G03F1/26 (US);
G03F1/48 (CN);
G03F1/80 (KR)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, ME, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2024/04] |
| Former [2023/46] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, ME, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Extension states | BA | Not yet paid | Validation states | KH | Not yet paid | MA | Not yet paid | MD | Not yet paid | TN | Not yet paid | Title | German: | REFLEKTIERENDER FOTOMASKENROHLING UND VERFAHREN ZUR HERSTELLUNG EINER REFLEKTIERENDEN FOTOMASKE | [2023/46] | English: | REFLECTIVE PHOTOMASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK | [2023/46] | French: | ÉBAUCHE DE PHOTOMASQUE RÉFLÉCHISSANT ET PROCÉDÉ DE FABRICATION DE PHOTOMASQUE RÉFLÉCHISSANT | [2023/46] | Examination procedure | 19.12.2023 | Examination requested [2024/04] | 19.12.2023 | Date on which the examining division has become responsible |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]JP2010080659 (TOPPAN PRINTING CO LTD); | [A]JP2017223905 (TOPPAN PRINTING CO LTD); | [A]US2018267398 (IRIE SHIGEO [JP], et al); | [A]US2021333717 (HSIEH WEI-CHE [TW], et al) | by applicant | WO2012105508 |