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EP4506758
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EP About this file: EP4506758
| EP4506758 - PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE WHICH USE ELECTRON LAYER HAVING ELECTROSTATIC TRAP IN VACUUM SYSTEM [Right-click to bookmark this link] | Status | Request for examination was made Status updated on 10.01.2025 Database last updated on 18.03.2026 | |
| Former | The international publication has been made Status updated on 14.10.2023 | Most recent event Tooltip | 18.03.2026 | New entry: Renewal fee paid | Applicant(s) | For all designated states Derkwoo Semitech Co., Ltd. 7F, 7, Seolleung-ro 94-gil Gangnam-gu Seoul 06161 / KR | [2025/07] | Inventor(s) | 01 /
KIM, Ki Bum Seoul 06082 / KR | [2025/07] | Representative(s) | Vossius & Partner Patentanwälte Rechtsanwälte mbB Siebertstrasse 3 81675 München / DE | [2025/07] | Application number, filing date | 23785024.3 | 06.04.2023 | [2025/07] | WO2023KR04668 | Priority number, date | KR20220042856 | 06.04.2022 Original published format: KR 20220042856 | [2025/07] | Filing language | KO | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2023195800 | Date: | 12.10.2023 | Language: | KO | [2023/41] | Type: | A1 Application with search report | No.: | EP4506758 | Date: | 12.02.2025 | Language: | EN | [2025/07] | Search report(s) | International search report - published on: | KR | 12.10.2023 | (Supplementary) European search report - dispatched on: | EP | 06.08.2025 | Classification | IPC: | G03F7/20, G03F7/00 | [2025/36] | CPC: |
G03F7/70916 (EP,KR);
G03F7/2004 (KR);
G03F7/70841 (EP)
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| Former IPC [2025/07] | G03F7/20 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, ME, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2025/07] | Title | German: | PARTIKELTRANSFERBLOCKIERUNGSVORRICHTUNG UND LITHOGRAFIEVORRICHTUNG MIT ELEKTRONENSCHICHT MIT ELEKTROSTATISCHER FALLE IN EINEM VAKUUMSYSTEM | [2025/07] | English: | PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE WHICH USE ELECTRON LAYER HAVING ELECTROSTATIC TRAP IN VACUUM SYSTEM | [2025/07] | French: | DISPOSITIF DE BLOCAGE DE TRANSFERT DE PARTICULES ET DISPOSITIF DE LITHOGRAPHIE UTILISANT UNE COUCHE D'ÉLECTRONS AYANT UN PIÈGE ÉLECTROSTATIQUE DANS UN SYSTÈME SOUS VIDE | [2025/07] | Entry into regional phase | 03.09.2024 | Translation filed | 03.09.2024 | National basic fee paid | 03.09.2024 | Search fee paid | 03.09.2024 | Designation fee(s) paid | 03.09.2024 | Examination fee paid | Examination procedure | 03.09.2024 | Examination requested [2025/07] | 26.02.2026 | Date on which the examining division has become responsible | Fees paid | Renewal fee | 24.04.2025 | Renewal fee patent year 03 | 17.03.2026 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X] US2006138350 (BANINE VADIM YEVGENYEVICH et al.) [X] | International search | [X] KR20180067175 (SAMSUNG ELECTRONICS CO LTD et al.) [X] 1-13 * See paragraphs [0025]-[0136] and figures 1-15. * | [A] KR20070007848 (INTEL CORP et al.) [A] 1-13 * See paragraphs [0003]-[0014] and figures 1-2. * | [A] KR20020016564 (ASML NETHERLANDS BV et al.) [A] 1-13 * See entire document. * | [A] JP2004332115 (COMMISSARIAT ENERGIE ATOMIQUE et al.) [A] 1-13 * See entire document. * | [A] KR20090052274 (CANON KK et al.) [A] 1-13 * See entire document. * |