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EP0000702
European procedure
Extract from the Register of European Patents
EP About this file: EP0000702
| EP0000702 - Process for forming a flow-resistant resist mask of radioation-sensitive material [Right-click to bookmark this link] | |||
| Former [1981/40] | Process for forming a flow-resistant resist mask | ||
| [1981/40] | Status | No opposition filed within time limit Status updated on 14.09.2016 Database last updated on 24.08.2024 | Most recent event Tooltip | 14.09.2016 | No opposition filed within time limit | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] | Inventor(s) | 01 /
Chiu, George Tein-Chu 48 Brandy Lane Wappingers Falls NY 13590 / US | 02 /
Fredericks, Edward Carmine Frances Drive Box 215 Hopewell Junction NY 12533 / US | [N/P] | Representative(s) | Kreidler, Eva-Maria Schönaicher Strasse 220 D-7030 Böblingen / DE | [N/P] |
| Former [1981/40] | Kreidler, Eva-Maria, Dr. rer. nat. Schönaicher Strasse 220 D-7030 Böblingen / DE | Application number, filing date | 78100337.1 | 10.07.1978 | Priority number, date | US19770822468 | 08.08.1977 Original published format: US 822468 | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0000702 | Date: | 21.02.1979 | Language: | DE | [N/P] | Type: | B1 Patent specification | No.: | EP0000702 | Date: | 07.10.1981 | Language: | DE | [1981/40] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 07.12.1978 | Classification | IPC: | G03F7/26, // H01L21/312 | [1981/40] | CPC: |
G03F7/40 (EP,US)
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| Former IPC [1981/40] | G03F7/02 | Designated contracting states | DE, FR, GB | Title | German: | Verfahren zur Herstellung einer fliessbeständigen Resistmaske aus strahlungsempfindlichem Resistmaterial | [1981/40] | English: | Process for forming a flow-resistant resist mask of radioation-sensitive material | [1981/40] | French: | Procédé de préparation d'un masque de photorésist résistant à l'écoulement en matériau sensible à une radiation | [1981/40] |
| Former [1981/40] | Verfahren zur Herstellung einer fliessbeständigen Resistmaske | ||
| Former [1981/40] | Process for forming a flow-resistant resist mask | ||
| Former [1981/40] | Procédé de préparation d'un masque de photorésist résistant à l'écoulement | File destroyed: | 12.06.1999 | Examination procedure | 25.07.1979 | Examination requested | 03.04.1980 | Despatch of a communication from the examining division (Time limit: M06) | 29.08.1980 | Reply to a communication from the examining division | 19.01.1981 | Despatch of communication of intention to grant (Approval: ) | 27.04.1981 | Communication of intention to grant the patent | 12.05.1981 | Fee for grant paid | 12.05.1981 | Fee for publishing/printing paid | Opposition(s) | 07.07.1982 | No opposition filed within time limit [ N /P ] | Fees paid | Renewal fee | 18.07.1980 | Renewal fee patent year 03 | 21.07.1981 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]SU451978 | [A] - IBM TECHNICAL DISCLOSURE BULLETIN, Band 18, Nr. 5, Oktober 1975, Armonk, New YorkB. BERGIN et al.: "Single layer optical lift-off process" | [A] - CHEMICAL ABSTRACTS, Band 82, 1975, Columbus, Ohio (USA) A.I. PARAMONOV et al.: "Positive photoresist", Seite 486Zusammenfassung Nr. 163064f; & SU-A-451 978 |