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Extract from the Register of European Patents

EP About this file: EP0002406

EP0002406 - Ion source, in particular for an ion implantation device [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  14.09.2016
Database last updated on 24.08.2024
Most recent event   Tooltip14.09.2016No opposition filed within time limit 
Applicant(s)For all designated states
ANVAR Agence Nationale de Valorisation de la Recherche
13, rue Madeleine Michelis
F-92522 Neuilly-sur-Seine / FR
[1980/14]
Former [1980/14]For all designated states
ANVAR Agence Nationale de Valorisation de la Recherche
43, rue Caumartin
F-75436 Paris Cédex 09 / FR
Inventor(s)01 / Camplan, Jean
37, Boulevard Garibaldi
F-75015 Paris / FR
02 / Chaumont, Jacques
4, Square Arago
F-78330 Fontenay Le Fleury / FR
03 / Meunier, Robert
9, Chemin à Dieu
F-78830 Bonnelles / FR
[N/P]
Representative(s)Mongrédien, André, et al
c/o BREVATOME 25, rue de Ponthieu
F-75008 Paris / FR
[1982/28]
Application number, filing date78400190.117.11.1978
Priority number, dateFR1977003576028.11.1977         Original published format: FR 7735760
Filing languageFR
Procedural languageFR
PublicationType: A1 Application with search report 
No.:EP0002406
Date:13.06.1979
Language:FR
[N/P]
Type: B1 Patent specification 
No.:EP0002406
Date:14.07.1982
Language:FR
[1982/28]
Search report(s)(Supplementary) European search report - dispatched on:EP28.03.1979
ClassificationIPC:H01J37/08, H01J27/26
[1982/28]
CPC:
H01J37/3171 (EP,US); H01J27/02 (EP,US); H01J37/08 (EP,US)
Former IPC [1982/28]H01J37/08, H01J27/00
Designated contracting statesCH,   DE,   GB,   NL 
TitleGerman:Ionenquelle, insbesondere für eine Ionenimplantationseinrichtung
English:Ion source, in particular for an ion implantation device
French:Source d'ions notamment pour implanteur ionique
File destroyed:12.06.1999
Examination procedure14.11.1979Examination requested  [1980/04]
26.02.1980Despatch of a communication from the examining division (Time limit: {0})
05.02.1981Despatch of a communication from the examining division (Time limit: M06)
03.08.1981Reply to a communication from the examining division
30.09.1981Despatch of communication of intention to grant (Approval: )
27.11.1981Communication of intention to grant the patent
01.02.1982Fee for grant paid
01.02.1982Fee for publishing/printing paid
Opposition(s)14.04.1983No opposition filed within time limit [ N /P ]
Fees paidRenewal fee
03.11.1980Renewal fee patent year 03
11.11.1981Renewal fee patent year 04
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:SearchFR2063256  [ ] (INST ELEKTRONISCHE);
 FR2064480  [ ] (INST ELEKTRONISCHE);
 FR1487438  [ ] (GEN ELECTRIC);
 FR2082091  [ ] (THOMSON CSF);
 FR1420531  [ ] (ASS ELECT IND)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.