-
EP0023261
European procedure
Extract from the Register of European Patents
EP About this file: EP0023261
| EP0023261 - Compensated magnetic deflection coil for electron beam lithography systems [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 14.08.1984 Database last updated on 06.07.2024 | Most recent event Tooltip | 14.08.1984 | No opposition filed within time limit | published on 17.10.1984 [1984/42] | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
| Former [1981/05] | For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
Pfeiffer, Hans Christian 25 Ketcham Road Ridgefield, CO 06877 / US | 02 /
Sturans, Maris Andris Cedar Hill Road, Rd No.1 Box 227 Bedford, NY 10506 / US | [1981/05] | Representative(s) | Schröder, Otto Heinrich Albrecht IBM Corporation Säumerstrasse 4 8803 Rüschlikon / CH | [N/P] |
| Former [1983/36] | Schröder, Otto H., Dr. Ing. IBM Corporation Säumerstrasse 4 CH-8803 Rüschlikon / CH | ||
| Former [1981/05] | Böhmer, Hans Erich, Dipl.-Ing. Schönaicher Strasse 220 D-7030 Böblingen / DE | Application number, filing date | 80103386.1 | 18.06.1980 | [1981/05] | Priority number, date | US19790061726 | 30.07.1979 Original published format: US 61726 | [1981/05] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0023261 | Date: | 04.02.1981 | Language: | DE | [1981/05] | Type: | B1 Patent specification | No.: | EP0023261 | Date: | 12.10.1983 | Language: | DE | [1983/41] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 16.10.1980 | Classification | IPC: | H01J37/09, H01J37/147 | [1981/05] | CPC: |
H01J37/09 (EP,US);
H01J37/1475 (EP,US)
| Designated contracting states | DE, FR, GB [1981/05] | Title | German: | Kompensierte magnetische Ablenkspule für Elektronenstrahl-Lithographiesysteme | [1981/05] | English: | Compensated magnetic deflection coil for electron beam lithography systems | [1981/05] | French: | Bobine compensée de déflexion magnétique pour des systèmes de lithographie par faisceau électronique | [1981/05] | File destroyed: | 12.06.1999 | Examination procedure | 31.03.1981 | Examination requested [1981/23] | 04.09.1981 | Despatch of a communication from the examining division (Time limit: M04) | 04.12.1981 | Reply to a communication from the examining division | 05.03.1982 | Despatch of a communication from the examining division (Time limit: M02) | 20.04.1982 | Reply to a communication from the examining division | 20.12.1982 | Despatch of communication of intention to grant (Approval: ) | 22.03.1983 | Communication of intention to grant the patent | 30.03.1983 | Fee for grant paid | 30.03.1983 | Fee for publishing/printing paid | Opposition(s) | 13.07.1984 | No opposition filed within time limit [1984/42] | Fees paid | Renewal fee | 23.06.1982 | Renewal fee patent year 03 | 21.06.1983 | Renewal fee patent year 04 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | US3911321 [ ] (WARDLY GEORGE A); | US4125772 [ ] (HOLMES DUANE C); | US3984687 [ ] (LOEFFLER KARL H, et al); | US3173116 [ ] (SCHNEIDER WILBUR G) |