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EP0043863
European procedure
Extract from the Register of European Patents
EP About this file: EP0043863
| EP0043863 - Process for compensating the proximity effect in electron beam projection devices [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 22.03.1985 Database last updated on 03.09.2024 | Most recent event Tooltip | 14.08.2009 | Change - representative | published on 16.09.2009 [2009/38] | Applicant(s) | For:FR
GB
International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | For:DE
IBM DEUTSCHLAND GMBH Pascalstrasse 100 D-70569 Stuttgart / DE | [N/P] |
| Former [1982/03] | For:FR
GB
International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | ||
| For:DE
IBM DEUTSCHLAND GMBH Pascalstrasse 100 D-70569 Stuttgart / DE | Inventor(s) | 01 /
Bohlen, Harald Geleener Strasse 26 D-7030 Böblingen / DE | 02 /
Engelke, Helmut, Dr. Ahornweg 33 D-7031 Altdorf / DE | 03 /
Greschner, Johann, Dr. Zollernstrasse 14 D-7401 Pliezhausen / DE | 04 /
Nehmiz, Peter, Dr. Karl-Weller-Strasse 2 D-7000 Stuttgart 80 / DE | [1982/03] | Representative(s) | Teufel, Fritz IBM Deutschland Management & Business Support GmbH Patentwesen u. Urheberrecht 71137 Ehningen / DE | [N/P] |
| Former [2009/38] | Teufel, Fritz IBM Deutschland Management & Business Support GmbH Patentwesen u. Urheberrecht 71137 Ehningen / DE | ||
| Former [2008/37] | Teufel, Fritz IBM Deutschland GmbH Intellectual Property 70548 Stuttgart / DE | ||
| Former [1982/03] | Teufel, Fritz, Dipl.-Phys. IBM Deutschland Informationssysteme GmbH Patentwesen und Urheberrecht Pascalstrasse 100 W-7000 Stuttgart 80 / DE | Application number, filing date | 80103966.0 | 10.07.1980 | [1982/03] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0043863 | Date: | 20.01.1982 | Language: | DE | [1982/03] | Type: | B1 Patent specification | No.: | EP0043863 | Date: | 16.05.1984 | Language: | DE | [1984/20] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 29.04.1981 | Classification | IPC: | G03F7/20 | [1982/03] | CPC: |
B82Y10/00 (EP,US);
H01J37/3174 (EP,US);
B82Y40/00 (EP,US);
H01J2237/31769 (EP,US)
| Designated contracting states | DE, FR, GB [1982/03] | Title | German: | Verfahren zur Kompensation des Proximity Effekts bei Elektronenstrahl-Projektionsanlagen | [1982/03] | English: | Process for compensating the proximity effect in electron beam projection devices | [1982/03] | French: | Procédé pour la compensation de l'effet de proximité dans les dispositifs de projection de rayonnement électronique | [1982/03] | File destroyed: | 12.06.1999 | Examination procedure | 19.05.1981 | Examination requested [1982/03] | 08.02.1983 | Despatch of a communication from the examining division (Time limit: M04) | 01.06.1983 | Reply to a communication from the examining division | 29.07.1983 | Despatch of communication of intention to grant (Approval: ) | 21.10.1983 | Communication of intention to grant the patent | 06.12.1983 | Fee for grant paid | 06.12.1983 | Fee for publishing/printing paid | Opposition(s) | 19.02.1985 | No opposition filed within time limit [1985/21] | Fees paid | Renewal fee | 23.07.1982 | Renewal fee patent year 03 | 22.07.1983 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | Examination | EP0001042 | US4198569 | - EXTENDED ABSTRACTS, Band 80-1, Mai 1980, Zusammenfassung 260, Seiten 663-665 PRINCETON (US) N. SUGIYAMA et al.: "Advanced EB Proximity Effect Correction for Fine-Pattern Device Fabrication" |