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Extract from the Register of European Patents

EP About this file: EP0026088

EP0026088 - Photoresist compositions [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  02.10.1984
Database last updated on 06.11.2024
Most recent event   Tooltip02.10.1984No opposition filed within time limitpublished on 05.12.1984 [1984/49]
Applicant(s)For all designated states
JAPAN SYNTHETIC RUBBER CO., LTD.
11-24, Tsukiji-2-chome Chuo-ku
Tokyo 104 / JP
[N/P]
Former [1981/13]For all designated states
JAPAN SYNTHETIC RUBBER CO., LTD.
11-24, Tsukiji-2-chome Chuo-ku
Tokyo 104 / JP
Inventor(s)01 / Kamoshida, Yoichi
29, Aobadai-2-chome Midori-ku
Yokohama / JP
02 / Yoshihara, Toshiaki
29, Aobadai-2-chome Midori-ku
Yokohama / JP
03 / Harita, Yoshiyuki
9-6, Shirohatadai-1-chome
Takatsu-ku Kawasaki-shi / JP
04 / Harada, Kunihiro
2657-6, Naruse
Machida-shi / JP
[1981/13]
Representative(s)Ruffles, Graham Keith, et al
Marks & Clerk LLP 62-68 Hills Road Cambridge
CB2 1LA / GB
[N/P]
Former [1981/13]Ruffles, Graham Keith, et al
MARKS & CLERK, 57-60 Lincoln's Inn Fields
London WC2A 3LS / GB
Application number, filing date80303280.418.09.1980
[1981/13]
Priority number, dateJP1979012040619.09.1979         Original published format: JP 12040679
JP1979014505109.11.1979         Original published format: JP 14505179
JP1980005668228.04.1980         Original published format: JP 5668280
JP1980011138613.08.1980         Original published format: JP 11138680
[1981/13]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0026088
Date:01.04.1981
Language:EN
[1981/13]
Type: A3 Search report 
No.:EP0026088
Date:08.07.1981
Language:EN
[1981/27]
Type: B1 Patent specification 
No.:EP0026088
Date:23.11.1983
Language:EN
[1983/47]
Search report(s)(Supplementary) European search report - dispatched on:EP04.05.1981
ClassificationIPC:G03C1/71, G03C1/70, G03F7/10, // H01L21/312, H01L21/47
[1981/27]
CPC:
G03F7/091 (EP,US); Y10S430/128 (EP,US); Y10S522/901 (EP,US)
Former IPC [1981/25]G03C1/71, G03F7/26, G03C1/71, // H01L21/312, H01L21/47
Former IPC [1981/13]G03F7/10, G03F7/26, G03C1/71, // H01L21/312, H01L21/47
Designated contracting statesDE,   FR,   GB,   NL [1981/13]
TitleGerman:Photoresistzusammensetzungen[1981/13]
English:Photoresist compositions[1981/13]
French:Compositions de photorésist[1981/13]
File destroyed:12.06.1999
Examination procedure13.05.1981Examination requested  [1981/29]
17.03.1982Despatch of a communication from the examining division (Time limit: M04)
12.06.1982Reply to a communication from the examining division
20.08.1982Despatch of a communication from the examining division (Time limit: M02)
14.10.1982Reply to a communication from the examining division
07.02.1983Despatch of communication of intention to grant (Approval: )
04.05.1983Communication of intention to grant the patent
28.07.1983Fee for grant paid
28.07.1983Fee for publishing/printing paid
Opposition(s)24.08.1984No opposition filed within time limit [1984/49]
Fees paidRenewal fee
14.09.1982Renewal fee patent year 03
03.10.1983Renewal fee patent year 04
Penalty fee
Additional fee for renewal fee
01.10.198304   M06   Fee paid on   03.10.1983
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