EP0026088 - Photoresist compositions [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 02.10.1984 Database last updated on 06.11.2024 | Most recent event Tooltip | 02.10.1984 | No opposition filed within time limit | published on 05.12.1984 [1984/49] | Applicant(s) | For all designated states JAPAN SYNTHETIC RUBBER CO., LTD. 11-24, Tsukiji-2-chome Chuo-ku Tokyo 104 / JP | [N/P] |
Former [1981/13] | For all designated states JAPAN SYNTHETIC RUBBER CO., LTD. 11-24, Tsukiji-2-chome Chuo-ku Tokyo 104 / JP | Inventor(s) | 01 /
Kamoshida, Yoichi 29, Aobadai-2-chome Midori-ku Yokohama / JP | 02 /
Yoshihara, Toshiaki 29, Aobadai-2-chome Midori-ku Yokohama / JP | 03 /
Harita, Yoshiyuki 9-6, Shirohatadai-1-chome Takatsu-ku Kawasaki-shi / JP | 04 /
Harada, Kunihiro 2657-6, Naruse Machida-shi / JP | [1981/13] | Representative(s) | Ruffles, Graham Keith, et al Marks & Clerk LLP 62-68 Hills Road Cambridge CB2 1LA / GB | [N/P] |
Former [1981/13] | Ruffles, Graham Keith, et al MARKS & CLERK, 57-60 Lincoln's Inn Fields London WC2A 3LS / GB | Application number, filing date | 80303280.4 | 18.09.1980 | [1981/13] | Priority number, date | JP19790120406 | 19.09.1979 Original published format: JP 12040679 | JP19790145051 | 09.11.1979 Original published format: JP 14505179 | JP19800056682 | 28.04.1980 Original published format: JP 5668280 | JP19800111386 | 13.08.1980 Original published format: JP 11138680 | [1981/13] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0026088 | Date: | 01.04.1981 | Language: | EN | [1981/13] | Type: | A3 Search report | No.: | EP0026088 | Date: | 08.07.1981 | Language: | EN | [1981/27] | Type: | B1 Patent specification | No.: | EP0026088 | Date: | 23.11.1983 | Language: | EN | [1983/47] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 04.05.1981 | Classification | IPC: | G03C1/71, G03C1/70, G03F7/10, // H01L21/312, H01L21/47 | [1981/27] | CPC: |
G03F7/091 (EP,US);
Y10S430/128 (EP,US);
Y10S522/901 (EP,US)
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Former IPC [1981/25] | G03C1/71, G03F7/26, G03C1/71, // H01L21/312, H01L21/47 | ||
Former IPC [1981/13] | G03F7/10, G03F7/26, G03C1/71, // H01L21/312, H01L21/47 | Designated contracting states | DE, FR, GB, NL [1981/13] | Title | German: | Photoresistzusammensetzungen | [1981/13] | English: | Photoresist compositions | [1981/13] | French: | Compositions de photorésist | [1981/13] | File destroyed: | 12.06.1999 | Examination procedure | 13.05.1981 | Examination requested [1981/29] | 17.03.1982 | Despatch of a communication from the examining division (Time limit: M04) | 12.06.1982 | Reply to a communication from the examining division | 20.08.1982 | Despatch of a communication from the examining division (Time limit: M02) | 14.10.1982 | Reply to a communication from the examining division | 07.02.1983 | Despatch of communication of intention to grant (Approval: ) | 04.05.1983 | Communication of intention to grant the patent | 28.07.1983 | Fee for grant paid | 28.07.1983 | Fee for publishing/printing paid | Opposition(s) | 24.08.1984 | No opposition filed within time limit [1984/49] | Fees paid | Renewal fee | 14.09.1982 | Renewal fee patent year 03 | 03.10.1983 | Renewal fee patent year 04 | Penalty fee | Additional fee for renewal fee | 01.10.1983 | 04   M06   Fee paid on   03.10.1983 |
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