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Extract from the Register of European Patents

EP About this file: EP0022687

EP0022687 - Integrated monolithic circuit equivalent to a transistor associated with three antisaturation diodes, and method for making it [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  05.06.1984
Database last updated on 31.08.2024
Most recent event   Tooltip05.06.1984No opposition filed within time limitpublished on 08.08.1984 [1984/32]
Applicant(s)For all designated states
THOMSON-CSF
173, Boulevard Haussmann
F-75008 Paris / FR
[1982/21]
Former [1981/03]For all designated states
THOMSON-CSF
173, Boulevard Haussmann
F-75008 Paris / FR
Inventor(s)01 / Quoirin, Jean-Baptiste
"THOMSON-CSF" SCPI 173, bld Haussmann
F-75360 Paris Cedex 08 / FR
[1981/03]
Representative(s)de Beaumont, Michel, et al
Thomson-CSF Propriété Intellectuelle
92045 Paris La Défense Cédex 67 / FR
[N/P]
Former [1981/03]de Beaumont, Michel, et al
THOMSON-CSF SCPI
F-92045 PARIS LA DEFENSE CEDEX 67 / FR
Application number, filing date80400834.010.06.1980
[1981/03]
Priority number, dateFR1979001499612.06.1979         Original published format: FR 7914996
[1981/03]
Filing languageFR
Procedural languageFR
PublicationType: A1 Application with search report 
No.:EP0022687
Date:21.01.1981
Language:FR
[1981/03]
Type: B1 Patent specification 
No.:EP0022687
Date:20.07.1983
Language:FR
[1983/29]
Search report(s)(Supplementary) European search report - dispatched on:EP08.10.1980
ClassificationIPC:H01L27/06, H01L27/08
[1981/03]
CPC:
H01L27/0825 (EP,US); H01L27/0248 (EP,US); H01L27/0761 (EP,US)
Designated contracting statesDE,   GB,   IT,   NL [1981/03]
TitleGerman:An einen Transistor mit drei Anti-Sättigungsdioden äquivalente integrierte monolithische Schaltung und Verfahren zu deren Herstellung[1981/03]
English:Integrated monolithic circuit equivalent to a transistor associated with three antisaturation diodes, and method for making it[1981/03]
French:Circuit intégré monolithique équivalent à un transistor associé à trois diodes anti-saturation et son procédé de fabrication[1981/03]
Examination procedure02.02.1981Examination requested  [1981/16]
09.06.1982Despatch of a communication from the examining division (Time limit: M04)
24.06.1982Reply to a communication from the examining division
18.10.1982Despatch of communication of intention to grant (Approval: )
18.01.1983Communication of intention to grant the patent
26.03.1983Fee for grant paid
26.03.1983Fee for publishing/printing paid
Opposition(s)25.04.1984No opposition filed within time limit [1984/32]
Fees paidRenewal fee
26.05.1982Renewal fee patent year 03
26.05.1983Renewal fee patent year 04
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Documents cited:SearchUS4138690  [ ] (NAWA KEIJI, et al);
 FR2282721  [ ] (RCA CORP [US]);
 FR2101228  [ ] (IBM);
 US4072981  [ ] (BLACK CHRISTOPHER T, et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.