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EP0060917
European procedure
Extract from the Register of European Patents
EP About this file: EP0060917
| EP0060917 - Load-lock vacuum chamber for etching silicon wafers [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 08.01.1988 Database last updated on 30.10.2024 | Most recent event Tooltip | 08.01.1988 | No opposition filed within time limit | published on 24.02.1988 [1988/08] | Applicant(s) | For all designated states THE PERKIN-ELMER CORPORATION 761 Main Avenue Norwalk Connecticut 06856-0181 / US | [N/P] |
| Former [1982/39] | For all designated states THE PERKIN-ELMER CORPORATION 761 Main Avenue Norwalk Connecticut 06856-0181 / US | Inventor(s) | 01 /
Kohman, Wayne E. 38 Bald Hill Road Wilton Connecticut 06897 / US | 02 /
Maleri, Joseph E. 204 Sunburst Road Bridgeport Connecticut 06606 / US | [1982/39] | Representative(s) | Grünecker Patent- und Rechtsanwälte PartG mbB Leopoldstrasse 4 80802 München / DE | [N/P] |
| Former [1982/39] | Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Maximilianstrasse 58 D-80538 München / DE | Application number, filing date | 81108149.6 | 09.10.1981 | [1982/39] | Priority number, date | US19800219060 | 22.12.1980 Original published format: US 219060 | [1982/39] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0060917 | Date: | 29.09.1982 | Language: | EN | [1982/39] | Type: | A3 Search report | No.: | EP0060917 | Date: | 06.04.1983 | Language: | EN | [1983/14] | Type: | B1 Patent specification | No.: | EP0060917 | Date: | 11.03.1987 | Language: | EN | [1987/11] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 03.02.1983 | Classification | IPC: | H01J37/18, H01J37/16, H01J37/305, H01L21/72 | [1982/39] | CPC: |
H01L21/67748 (EP,US);
H01J37/18 (EP,US);
H01J37/185 (EP,US)
| Designated contracting states | CH, DE, FR, GB, IT, LI, NL [1982/39] | Title | German: | Vakuumkammer zum Ätzen von Silicium mit Lade- und Dichtungssystem | [1982/39] | English: | Load-lock vacuum chamber for etching silicon wafers | [1982/39] | French: | Chambre à vide pour le décapage de silicium munie d'un système de chargement et de serrure | [1982/39] | Examination procedure | 05.10.1983 | Examination requested [1983/51] | 26.09.1984 | Despatch of a communication from the examining division (Time limit: M04) | 29.01.1985 | Reply to a communication from the examining division | 18.03.1985 | Despatch of a communication from the examining division (Time limit: M04) | 24.06.1985 | Reply to a communication from the examining division | 31.01.1986 | Despatch of communication of intention to grant (Approval: ) | 14.05.1986 | Communication of intention to grant the patent | 14.07.1986 | Fee for grant paid | 14.07.1986 | Fee for publishing/printing paid | Opposition(s) | 12.12.1987 | No opposition filed within time limit [1988/08] | Fees paid | Renewal fee | 21.09.1983 | Renewal fee patent year 03 | 15.09.1984 | Renewal fee patent year 04 | 30.10.1985 | Renewal fee patent year 05 | 30.10.1986 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US4208159 (NAKANE HISASHI [JP], et al); | [A]US4209357 (GORIN GEORGES J [US], et al); | [A]US4149923 (UEHARA AKIRA, et al); | [A]DE2703659 (TOKYO SHIBAURA ELECTRIC CO) |