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Extract from the Register of European Patents

EP About this file: EP0055619

EP0055619 - Method for regulating concentration and distribution of oxygen in Czochralski grown silicon [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  24.04.1986
Database last updated on 02.11.2024
Most recent event   Tooltip24.04.1986No opposition filed within time limitpublished on 11.06.1986 [1986/24]
Applicant(s)For all designated states
Monsanto Company
800 North Lindbergh Boulevard 40E
St. Louis, Missouri 63167 / US
[N/P]
Former [1982/27]For all designated states
MONSANTO COMPANY
800 North Lindbergh Boulevard
St. Louis, Missouri 63167 / US
Inventor(s)01 / Frederick, Roger Allen
12644 Northwinds
St. Louis Missouri 63141 / US
02 / Moody, Jerry Wofford
3317 West Adams
St. Charles Missouri 63301 / US
[1982/27]
Representative(s)Lunt, John Cooper R. 102(1), et al
Monsanto Europe S.A. Patent Department Avenue de Tervuren 270-272 Letter Box No 1
B-1150 Brussels / BE
[N/P]
Former [1982/27]Lunt, John Cooper, et al
Monsanto Europe S.A. Patent Department Avenue de Tervuren 270-272 Letter Box No 1
B-1150 Brussels / BE
Application number, filing date81306131.424.12.1981
[1982/27]
Priority number, dateUS1980022092429.12.1980         Original published format: US 220924
[1982/27]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0055619
Date:07.07.1982
Language:EN
[1982/27]
Type: B1 Patent specification 
No.:EP0055619
Date:29.05.1985
Language:EN
[1985/22]
Search report(s)(Supplementary) European search report - dispatched on:EP14.05.1982
ClassificationIPC:C30B15/30, C30B29/06
[1982/27]
CPC:
C30B29/06 (EP,KR); C30B15/00 (KR); C30B15/30 (EP);
C30B31/16 (KR)
Designated contracting statesDE,   FR,   GB,   IT,   NL [1982/27]
TitleGerman:Verfahren zur Regelung der Konzentration und Distribution von Sauerstoff in Silizium, gezüchtet nach der Czochralskimethode[1982/27]
English:Method for regulating concentration and distribution of oxygen in Czochralski grown silicon[1982/27]
French:Méthode pour régler la concentration et distribution en oxygène dans du silicium tiré selon la méthode Czochralski[1982/27]
Examination procedure22.11.1982Examination requested  [1983/06]
02.03.1984Despatch of a communication from the examining division (Time limit: M04)
22.06.1984Reply to a communication from the examining division
24.08.1984Despatch of communication of intention to grant (Approval: )
14.11.1984Communication of intention to grant the patent
19.12.1984Fee for grant paid
19.12.1984Fee for publishing/printing paid
Opposition(s)01.03.1986No opposition filed within time limit [1986/24]
Fees paidRenewal fee
17.11.1983Renewal fee patent year 03
02.11.1984Renewal fee patent year 04
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Documents cited:SearchFR2413124  [ ] (WACKER CHEMITRONIC [DE]);
 EP0042901  [ ] (IBM [US], et al);
 FR2328509  [ ] (IBM [US])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.