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Extract from the Register of European Patents

EP About this file: EP0085761

EP0085761 - A positive resist composition [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  23.06.1987
Database last updated on 03.10.2024
Most recent event   Tooltip23.06.1987No opposition filed within time limitpublished on 12.08.1987 [1987/33]
Applicant(s)For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, NY 10504 / US
[N/P]
Former [1983/33]For all designated states
International Business Machines Corporation
Old Orchard Road
Armonk, N.Y. 10504 / US
Inventor(s)01 / Clecak, Nicholas Jeffries
863 Hampswood Way
San Jose California 95120 / US
02 / McKean, Dennis Richard
6780 Mason Way
San Jose California 95129 / US
03 / Miller, Robert Dennis
6614 Tam O'Santer Drive
San Jose California 95120 / US
04 / Tompkins, Terry Cady
11625 Por Avenue
Los Altos California 94022 / US
05 / Twieg, Robert James
1027 Lincoln Court
San Jose California 95125 / US
06 / Willson, Carlton Grant
896 Harding Avenue
San Jose California 95126 / US
[1983/33]
Representative(s)Hobbs, Francis John
IBM United Kingdom Limited Intellectual Property Department Hursley Park Winchester
Hampshire SO21 2JN / GB
[N/P]
Former [1983/36]Hobbs, Francis John
IBM United Kingdom Limited Intellectual Property Department Hursley Park
Winchester Hampshire SO21 2JN / GB
Former [1983/33]Chaudhry, Mohammad Saeed
IBM United Kingdom Patent Operations Hursley Park
Winchester Hants, S021 2JN / GB
Application number, filing date82110822.223.11.1982
[1983/33]
Priority number, dateUS1982034765810.02.1982         Original published format: US 347658
[1983/33]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0085761
Date:17.08.1983
Language:EN
[1983/33]
Type: B1 Patent specification 
No.:EP0085761
Date:20.08.1986
Language:EN
[1986/34]
Search report(s)(Supplementary) European search report - dispatched on:EP09.06.1983
ClassificationIPC:G03F7/08
[1983/33]
CPC:
G03F7/022 (EP,US)
Designated contracting statesDE,   FR,   GB [1983/33]
TitleGerman:Positiv arbeitende Photoresistmasse[1983/33]
English:A positive resist composition[1983/33]
French:Composition photorésistante positive[1983/33]
Examination procedure15.12.1983Examination requested  [1984/08]
04.10.1985Despatch of communication of intention to grant (Approval: )
05.02.1986Communication of intention to grant the patent
18.02.1986Fee for grant paid
18.02.1986Fee for publishing/printing paid
Opposition(s)21.05.1987No opposition filed within time limit [1987/33]
Fees paidRenewal fee
23.11.1984Renewal fee patent year 03
26.11.1985Renewal fee patent year 04
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Documents cited:Search   [ ] - No relevant documents have been disclosed
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