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Extract from the Register of European Patents

EP About this file: EP0067688

EP0067688 - Integrated semiconductor device including a Bias voltage generator [Right-click to bookmark this link]
Former [1982/51]Bias voltage generators
[1987/06]
StatusNo opposition filed within time limit
Status updated on  08.12.1987
Database last updated on 17.07.2024
Most recent event   Tooltip08.12.1987No opposition filed within time limitpublished on 27.01.1988 [1988/04]
Applicant(s)For all designated states
FUJITSU LIMITED
1015, Kamikodanaka, Nakahara-ku Kawasaki-shi
Kanagawa 211 / JP
[N/P]
Former [1982/51]For all designated states
FUJITSU LIMITED
1015, Kamikodanaka, Nakahara-ku
Kawasaki-shi, Kanagawa 211 / JP
Inventor(s)01 / Takemae, Yoshihiro
1-20-5-9-301, Utsukushigaoka
Midori-ku Yokohama-shi Kanagawa 227 / JP
02 / Nakano, Tomio
1-11-2-12-404, Shirahatadai Takatsu-ku
Kawasaki-shi Kanagawa 213 / JP
03 / Nakano, Masao
473-4, Hisasue Takatsu-ku
Kawasaki-shi Kanagawa 213 / JP
04 / Tsuge, Norishisa
6-14, Zaimokuza 5-chome
Kamakura-shi Kanagawa 248 / JP
05 / Ohira, Tsuyoshi
Fujitsu Dai 2 Eda-ryo 440-1, Eda-cho
Midori-ku Yokohama-shi Kanagawa 227 / JP
[1982/51]
Representative(s)Fane, Christopher Robin King, et al
Haseltine Lake & Co., Imperial House, 15-19 Kingsway
London WC2B 6UD / GB
[N/P]
Former [1982/51]Fane, Christopher Robin King, et al
HASELTINE LAKE & CO. Hazlitt House 28 Southampton Buildings Chancery Lane
London, WC2A 1AT / GB
Application number, filing date82303044.011.06.1982
[1982/51]
Priority number, dateJP1981008946012.06.1981         Original published format: JP 8946081
[1982/51]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0067688
Date:22.12.1982
Language:EN
[1982/51]
Type: B1 Patent specification 
No.:EP0067688
Date:04.02.1987
Language:EN
[1987/06]
Search report(s)(Supplementary) European search report - dispatched on:EP27.10.1982
ClassificationIPC:G05F3/20
[1982/51]
CPC:
G05F3/205 (EP,US)
Designated contracting statesDE,   FR,   GB,   NL [1982/51]
TitleGerman:Integrierte Halbleiterschaltung mit Vorspannungserzeuger[1987/06]
English:Integrated semiconductor device including a Bias voltage generator[1987/06]
French:Circuit semiconducteur intégré comprenant un générateur de tension de polarisation[1987/06]
Former [1982/51]Vorspannungserzeuger
Former [1982/51]Bias voltage generators
Former [1982/51]Générateurs de tension de polarisation
Examination procedure20.04.1983Examination requested  [1983/26]
24.08.1984Despatch of a communication from the examining division (Time limit: M08)
24.04.1985Reply to a communication from the examining division
18.09.1985Despatch of a communication from the examining division (Time limit: M04)
21.01.1986Reply to a communication from the examining division
21.04.1986Despatch of communication of intention to grant (Approval: )
08.08.1986Communication of intention to grant the patent
08.09.1986Fee for grant paid
08.09.1986Fee for publishing/printing paid
Opposition(s)05.11.1987No opposition filed within time limit [1988/04]
Fees paidRenewal fee
05.06.1984Renewal fee patent year 03
06.06.1985Renewal fee patent year 04
03.06.1986Renewal fee patent year 05
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]GB2028553  (ROCKWELL INTERNATIONAL CORP);
 [A]DE2003060  (HITACHI LTD)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.