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Extract from the Register of European Patents

EP About this file: EP0114109

EP0114109 - Semiconductor laser device and method for manufacturing the same [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  28.05.1992
Database last updated on 31.08.2024
Most recent event   Tooltip28.05.1992No opposition filed within time limitpublished on 15.07.1992 [1992/29]
Applicant(s)For all designated states
Kabushiki Kaisha Toshiba
72, Horikawa-cho, Saiwai-ku Kawasaki-shi
Kanagawa-ken 210-8572 / JP
[N/P]
Former [1984/30]For all designated states
KABUSHIKI KAISHA TOSHIBA
72, Horikawa-cho, Saiwai-ku
Kawasaki-shi, Kanagawa-ken 210, Tokyo / JP
Inventor(s)01 / Okajima, Masaki
3-8-501, Fujimidai-Danchi
Kunitachi-shi Tokyo / JP
02 / Motegi, Nawoto
1642-231, Nagae Hayama-cho
Miura-gun Kanagawa-ken / KP
03 / Muto, Yuhei
828-78, Shimokurata-cho Totsuka-ku
Yokohama-shi / JP
[1984/30]
Representative(s)Freed, Arthur Woolf, et al
Marks & Clerk Incorporating Edward Evans Barker 90 Long Acre
London WC2E 9RA / GB
[N/P]
Former [1984/30]Freed, Arthur Woolf, et al
MARKS & CLERK, 57-60 Lincoln's Inn Fields
London WC2A 3LS / GB
Application number, filing date84300214.813.01.1984
[1984/30]
Priority number, dateJP1983000445714.01.1983         Original published format: JP 445783
[1984/30]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0114109
Date:25.07.1984
Language:EN
[1984/30]
Type: A3 Search report 
No.:EP0114109
Date:06.05.1987
Language:EN
[1987/19]
Type: B1 Patent specification 
No.:EP0114109
Date:24.07.1991
Language:EN
[1991/30]
Search report(s)(Supplementary) European search report - dispatched on:EP17.03.1987
ClassificationIPC:H01S3/19
[1984/30]
CPC:
H01S5/20 (EP,US); H01S5/2231 (EP,US); H01S5/2059 (EP,US)
Designated contracting statesDE,   FR,   GB,   NL [1984/30]
TitleGerman:Halbleiterlaser-Vorrichtung und Verfahren zu deren Herstellung[1984/30]
English:Semiconductor laser device and method for manufacturing the same[1984/30]
French:Dispositif laser à semi-conducteur et son procédé de fabrication[1984/30]
Examination procedure25.01.1984Examination requested  [1984/30]
23.08.1989Despatch of a communication from the examining division (Time limit: M06)
26.02.1990Reply to a communication from the examining division
01.08.1990Despatch of a communication from the examining division (Time limit: M01)
24.08.1990Reply to a communication from the examining division
05.10.1990Despatch of communication of intention to grant (Approval: Yes)
15.01.1991Communication of intention to grant the patent
12.04.1991Fee for grant paid
12.04.1991Fee for publishing/printing paid
Opposition(s)25.04.1992No opposition filed within time limit [1992/29]
Fees paidRenewal fee
13.01.1986Renewal fee patent year 03
14.01.1987Renewal fee patent year 04
19.01.1988Renewal fee patent year 05
13.01.1989Renewal fee patent year 06
17.01.1990Renewal fee patent year 07
17.12.1990Renewal fee patent year 08
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Lapses during opposition  TooltipNL24.07.1991
[1992/09]
Documents cited:Search[A]JP5791581  ;
 [A]JP5669885  ;
 [X]EP0069563  (HITACHI LTD [JP]);
 [A]US4366568  (SHIMIZU HIROKAZU, et al);
 [A]EP0002827  (WESTERN ELECTRIC CO [US]);
 [E]JPS5980984  (HITACHI LTD)
 [A]  - PATENTS ABSTRACTS OF JAPAN, vol. 6, no. 176 (E-130)[1054], 10th September 1982; & JP-A-57 91581 (SHARP K.K.) 07.06.1982, & JP5791581 A 00000000
 [A]  - PATENTS ABSTRACTS OF JAPAN, vol. 5, no. 133 (E-71)[805], 25th August 1981; & JP-A-56 69885 (TOKYO SHIBAURA DENKI K.K.) 11-06-1981, & JP5669885 A 00000000
 [AD]  - IEEE JOURNAL OF QUANTUM ELECTRONICS, vol. QE-11, no. 7, July 1975, pages 432-435, New York, US; T.P. LEE et al.: "AlxGa1-xAs double-heterostructure rib-waveguide injection laser"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.