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Extract from the Register of European Patents

EP About this file: EP0119719

EP0119719 - Radiation sensitive polymer composition [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  21.03.1988
Database last updated on 13.07.2024
Most recent event   Tooltip31.07.2009Change - representativepublished on 02.09.2009  [2009/36]
Applicant(s)For all designated states
TORAY INDUSTRIES, INC.
2, Nihonbashi-Muromachi 2-chome Chuo-ku
Tokyo 103 / JP
[N/P]
Former [1984/39]For all designated states
TORAY INDUSTRIES, INC.
2, Nihonbashi-Muromachi 2-chome Chuo-ku
Tokyo 103 / JP
Inventor(s)01 / Ohbayashi, Gentaro
2328-16, Noji-cho
Kusatsu-shi Shiga-ken / JP
02 / Umemoto, Susumu
39, Higashi Kibogaoka Asahi-ku
Yokohama-shi Kanagawa-ken / JP
03 / Hiramoto, Hiroo
14-12, Kitaoji 3-chome
Otsu-shi Shiga-ken / JP
[1984/39]
Representative(s)Coleiro, Raymond, et al
Mewburn Ellis LLP
33 Gutter Lane
London EC2V 8AS / GB
[N/P]
Former [2009/36]Coleiro, Raymond, et al
Mewburn Ellis LLP 33 Gutter Lane
London EC2V 8AS / GB
Former [1984/39]Coleiro, Raymond, et al
MEWBURN ELLIS York House 23 Kingsway
London WC2B 6HP / GB
Application number, filing date84300837.609.02.1984
[1984/39]
Priority number, dateJP1983003490703.03.1983         Original published format: JP 3490783
JP1983015029619.08.1983         Original published format: JP 15029683
[1984/39]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0119719
Date:26.09.1984
Language:EN
[1984/39]
Type: B1 Patent specification 
No.:EP0119719
Date:06.05.1987
Language:EN
[1987/19]
Search report(s)(Supplementary) European search report - dispatched on:EP20.07.1984
ClassificationIPC:G03C1/68, G03F7/10
[1984/39]
CPC:
G03F7/0387 (EP,US); C08L77/00 (EP,US); G03F7/037 (EP,US);
Y10S430/107 (EP,US); Y10S430/12 (EP,US)
Designated contracting statesCH,   DE,   FR,   GB,   LI,   NL [1984/39]
TitleGerman:Strahlungsempfindliche Polymermasse[1984/39]
English:Radiation sensitive polymer composition[1984/39]
French:Composition de polymère sensible au rayonnement[1984/39]
Examination procedure11.02.1985Examination requested  [1985/18]
05.02.1986Despatch of a communication from the examining division (Time limit: M06)
13.06.1986Reply to a communication from the examining division
12.08.1986Despatch of communication of intention to grant (Approval: )
31.10.1986Communication of intention to grant the patent
08.12.1986Fee for grant paid
08.12.1986Fee for publishing/printing paid
Opposition(s)09.02.1988No opposition filed within time limit [1988/19]
Fees paidRenewal fee
19.02.1986Renewal fee patent year 03
31.10.1986Renewal fee patent year 04
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Documents cited:Search[A]JP7322345  ;
 [AD]US4243743  (HIRAMOTO HIROO, et al)
 [A]  - CHEMICAL ABSTRACTS, vol. 81, 1974, page 442, no. 31877t, Columbus, Ohio, USA; & JP - A - 73 22345 (TORAY INDUSTRIES, INC.) 05-07-1973, & JP7322345 A 00000000
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.