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Extract from the Register of European Patents

EP About this file: EP0142414

EP0142414 - Ion source, in particular for highly charged metallic ions, whose ion current is controlled [Right-click to bookmark this link]
Former [1985/21]Device for controlling a current of ions, in particular for highly charged metallic ions
[1989/12]
StatusNo opposition filed within time limit
Status updated on  17.01.1990
Database last updated on 02.11.2024
Most recent event   Tooltip17.01.1990No opposition filed within time limitpublished on 07.03.1990 [1990/10]
Applicant(s)For all designated states
COMMISSARIAT A L'ENERGIE ATOMIQUE
31/33, rue de la Fédération
75015 Paris Cédex 15 / FR
[N/P]
Former [1988/03]For all designated states
COMMISSARIAT A L'ENERGIE ATOMIQUE
31/33, rue de la Fédération
F-75015 Paris Cédex 15 / FR
Former [1985/21]For all designated states
COMMISSARIAT A L'ENERGIE ATOMIQUE Etablissement de Caractère Scientifique Technique et Industriel
31/33, rue de la Fédération
F-75015 Paris / FR
Inventor(s)01 / Jacquot, Bernard
1, Boulevard Jomardière
F-38120 Saint Egreve / FR
[1985/21]
Representative(s)Mongrédien, André, et al
c/o BREVATOME 25, rue de Ponthieu
F-75008 Paris / FR
[1985/21]
Application number, filing date84402080.016.10.1984
[1985/21]
Priority number, dateFR1983001646517.10.1983         Original published format: FR 8316465
[1985/21]
Filing languageFR
Procedural languageFR
PublicationType: A2 Application without search report 
No.:EP0142414
Date:22.05.1985
Language:FR
[1985/21]
Type: A3 Search report 
No.:EP0142414
Date:04.06.1986
Language:FR
[1986/23]
Type: B1 Patent specification 
No.:EP0142414
Date:22.03.1989
Language:FR
[1989/12]
Search report(s)(Supplementary) European search report - dispatched on:EP15.04.1986
ClassificationIPC:H01J27/18
[1985/21]
CPC:
H01J27/18 (EP,US)
Designated contracting statesDE,   GB,   NL [1985/21]
TitleGerman:Ionenquelle insbesondere zum Erzeugen eines Stroms mehrfachgeladener metallischer Ionen, bei der der Ionenstrom geregelt wird[1989/12]
English:Ion source, in particular for highly charged metallic ions, whose ion current is controlled[1989/12]
French:Source d'ions, notamment métalliques fortement chargés dont le courant d'ions est régulé[1989/12]
Former [1985/21]Vorrichtung zur Steuerung eines Ionenstroms insbesondere eines Stroms mehrfachgeladener metallischer Ionen
Former [1985/21]Device for controlling a current of ions, in particular for highly charged metallic ions
Former [1985/21]Dispositif de régulation d'un courant d'ions, notamment métalliques fortement chargés
File destroyed:02.03.1998
Examination procedure06.11.1986Examination requested  [1986/52]
31.03.1988Despatch of a communication from the examining division (Time limit: M02)
16.04.1988Reply to a communication from the examining division
31.05.1988Despatch of communication of intention to grant (Approval: Yes)
20.09.1988Communication of intention to grant the patent
23.11.1988Fee for grant paid
23.11.1988Fee for publishing/printing paid
Opposition(s)23.12.1989No opposition filed within time limit [1990/10]
Fees paidRenewal fee
22.10.1986Renewal fee patent year 03
21.10.1987Renewal fee patent year 04
28.10.1988Renewal fee patent year 05
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Documents cited:Search[A]GB2069230  (COMMISSARIAT ENERGIE ATOMIQUE);
 [AD]FR2512623  (COMMISSARIAT ENERGIE ATOMIQUE [FR])
 [A]  - REVUE DE PHYSIQUE APPLIQUEE, vol. 15, no. 5, mai 1980, pages 995-1005, Paris, FR; R. GELLER et al.: "Micromafios source d'ions multichargés basée sur la résonance cyclotronique des électrons"
 [A]  - NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, vol. 202, no. 3, novembre 1982, pages 399-401, North-Holland, Amsterdam, NL; R. GELLER et al.: "Minimafios, source d'ions pulsee fournissant des faisceux d'ions completement epluches"
by applicantFR2475798
 FR2512623
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.