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Extract from the Register of European Patents

EP About this file: EP0194323

EP0194323 - Scanning tunneling microscope [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  01.06.1990
Database last updated on 15.07.2024
Most recent event   Tooltip01.06.1990No opposition filed within time limitpublished on 18.07.1990 [1990/29]
Applicant(s)For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, NY 10504 / US
[N/P]
Former [1986/38]For all designated states
International Business Machines Corporation
Old Orchard Road
Armonk, N.Y. 10504 / US
Inventor(s)01 / Gimzewski, James Kazimierz, Dr.
Milchbuckstrasse 1
CH-8057 Zürich / CH
02 / Pohl, Wolfgang Dieter, Dr.
Felsenhofstrasse 10
CH-8134 Adliswil / CH
[1986/38]
Representative(s)Rudack, Günter Otto
IBM Corporation Säumerstrasse 4
CH-8803 Rüschlikon / CH
[N/P]
Former [1986/38]Rudack, Günter O., Dipl.-Ing.
IBM Corporation Säumerstrasse 4
CH-8803 Rüschlikon / CH
Application number, filing date85102554.407.03.1985
[1986/38]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0194323
Date:17.09.1986
Language:EN
[1986/38]
Type: B1 Patent specification 
No.:EP0194323
Date:02.08.1989
Language:EN
[1989/31]
Search report(s)(Supplementary) European search report - dispatched on:EP08.01.1986
ClassificationIPC:G01N27/00
[1986/38]
CPC:
G01Q10/04 (EP,US); G01Q60/16 (EP,US); G01Q70/02 (EP,US);
H01J37/20 (EP,US); Y10S977/861 (EP,US); Y10S977/872 (EP,US)
Designated contracting statesCH,   DE,   FR,   GB,   IT,   LI,   NL,   SE [1986/38]
TitleGerman:Tunneleffektabtastungsmikroskop[1986/38]
English:Scanning tunneling microscope[1986/38]
French:Microscope à balayage à effet tunnel[1986/38]
Examination procedure16.01.1987Examination requested  [1987/13]
22.11.1988Despatch of communication of intention to grant (Approval: Yes)
18.01.1989Communication of intention to grant the patent
23.01.1989Fee for grant paid
23.01.1989Fee for publishing/printing paid
Opposition(s)03.05.1990No opposition filed within time limit [1990/29]
Fees paidRenewal fee
27.03.1987Renewal fee patent year 03
29.03.1988Renewal fee patent year 04
22.03.1989Renewal fee patent year 05
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Documents cited:Search[AD]US4343993  (BINNIG GERD, et al);
 [A]WO8401660  (SCIRE FREDRIC E)
 [A]  - IEEE TRANSACTIONS ON ELECTRON DEVICES, vol. ED-25, no. 10, October 1978, pages 1241-1250, IEEE, New York, US; K.E. PETERSEN: "Dynamic micromechanics on silicon: techniques and devices"
 [AD]  - SCIENTIFIC AMERICAN, vol. 248, no. 4, April 1983, pages 36-47, US; J.B. ANGELL et al.: "Silicon micromechanical devices"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.