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EP0227851
European procedure
Extract from the Register of European Patents
EP About this file: EP0227851
| EP0227851 - Process for obtaining photoresist patterns [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 28.12.1991 Database last updated on 24.08.2024 | Most recent event Tooltip | 28.09.2007 | Lapse of the patent in a contracting state | published on 31.10.2007 [2007/44] | Applicant(s) | For:DE
IBM DEUTSCHLAND GMBH Pascalstrasse 100 D-70569 Stuttgart / DE | For:FR
GB
IT
International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
| Former [1987/28] | For:DE
IBM DEUTSCHLAND GMBH Pascalstrasse 100 D-70569 Stuttgart / DE | ||
| For:FR
GB
IT
International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
Moritz, Holger 72 Cherry Blossom Drive San Jose CA 95123 / US | 02 /
Pietsch, Dieter Hermannstrasse 6 D-7037 Magstadt / DE | 03 /
Wüstenhagen, Jürgen, Dr. Amsterdamer Strasse 7 D-7030 Böblingen / DE | 04 /
Ziegler, Johanna Dresdener Strasse 37 D-7032 Sindelfingen / DE | [1991/09] |
| Former [1987/28] | 01 /
Moritz, Holger 72 Cherry Blossom Drive San Jose CA 95123 / US | ||
| 02 /
Pietsch, Peter Hermannstrasse 6 D-7037 Magstadt / DE | |||
| 03 /
Wüstenhagen, Jürgen, Dr. Amsterdamer Strasse 7 D-7030 Böblingen / DE | |||
| 04 /
Ziegler, Johanna Dresdener Strasse 37 D-7032 Sindelfingen / DE | Representative(s) | Mönig, Anton IBM Deutschland Informationssysteme GmbH, Patentwesen und Urheberrecht 70548 Stuttgart / DE | [N/P] |
| Former [1990/29] | Mönig, Anton, Dipl.-Ing. IBM Deutschland Informationssysteme GmbH, Patentwesen und Urheberrecht D-70548 Stuttgart / DE | ||
| Former [1987/28] | Oechssler, Dietrich, Dr. rer. nat. IBM Deutschland GmbH Patentwesen und Urheberrecht Schönaicher Strasse 220 D-71032 Böblingen / DE | Application number, filing date | 85116430.1 | 21.12.1985 | [1987/28] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0227851 | Date: | 08.07.1987 | Language: | DE | [1987/28] | Type: | B1 Patent specification | No.: | EP0227851 | Date: | 27.02.1991 | Language: | DE | [1991/09] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.10.1986 | Classification | IPC: | G03F7/20, G03F1/00 | [1987/28] | CPC: |
G03F7/70433 (EP);
G03F1/36 (EP);
G03F7/2022 (EP)
| Designated contracting states | DE, FR, GB, IT [1987/28] | Title | German: | Verfahren zum Herstellen eines Photolackmusters | [1987/28] | English: | Process for obtaining photoresist patterns | [1987/28] | French: | Procédé pour réaliser des modèles dans une couche de photoréserve | [1987/28] | File destroyed: | 15.01.2000 | Examination procedure | 23.10.1987 | Examination requested [1987/52] | 14.04.1989 | Despatch of a communication from the examining division (Time limit: M04) | 16.08.1989 | Reply to a communication from the examining division | 26.09.1989 | Despatch of a communication from the examining division (Time limit: M04) | 23.12.1989 | Reply to a communication from the examining division | 14.03.1990 | Despatch of communication of intention to grant (Approval: No) | 15.06.1990 | Despatch of communication of intention to grant (Approval: later approval) | 22.06.1990 | Communication of intention to grant the patent | 02.08.1990 | Fee for grant paid | 02.08.1990 | Fee for publishing/printing paid | Opposition(s) | 28.11.1991 | No opposition filed within time limit [1992/08] | Fees paid | Renewal fee | 11.12.1987 | Renewal fee patent year 03 | 30.11.1988 | Renewal fee patent year 04 | 14.12.1989 | Renewal fee patent year 05 | 10.12.1990 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | IT | 27.02.1991 | [1999/42] | Documents cited: | Search | [X]JP60135949 ; | [X]US4308337 ; | [X]DE2854045 | [X] - IBM TECHNICAL DISCLOSURE BULLETIN, Band 21, Nr. 12, Mai 1979, Seite 4787, New York, US; O.R. ABOLAFIA: "Tapered vias in a photosensitive dielectric film" | [X] - IBM TECHNICAL DISCLOSURE BULLETIN, Band 25. Nr. 4, September 1982, Seite 2057, New York, US; E. COURTENS: "Enhancement of edge exposure by modified photolithography masks for proximity printing on thick resists" | [X] - IBM TECHNICAL DISCLOSURE BULLETIN, Band 23, Nr. 2, Juli 1980, Seiten 826-827, New York, US; J.L. SPEIDELL: " "Trench" elimination from ion etching" | [X] - PATENTS ABSTRACTS OF JAPAN, Band 9, Nr. 299 (P-408)[2022], 27. November 1985; & JP-A-60 135 949 (MATSUSHITA DENKO K.K.) 19-07-1985, & JP60135949 A 00000000 | [A] - XEROX DISCLOSURE JOURNAL, Band 7, Nr. 4, Juli/August 1982, Seiten 293-294, Stamford, Connecticut, US; R.B. RAUCH: "A double exposure technique for positive resist lift-off" | [A] - MICROELECTRONIC ENGINEERING, Band 1, Nr. 4, Dezember 1983, Seiten 295-300, Elsevier Publishers B.V., Amsterdam, NL; K. ISMAIL: "A novel method for submicron structurization using optical projection lithography" | [A] - IBM TECHNICAL DISCLOSURE BULLETIN, Band 18, Nr. 7, Dezember 1975, Seite 2179, New York, US; J.E. KULAK et al.: "Tool for blanket exposure of photopolymer films" |