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Extract from the Register of European Patents

EP About this file: EP0188206

EP0188206 - System for generating a substantially uniform plasma [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  20.10.1990
Database last updated on 24.08.2024
Most recent event   Tooltip20.10.1990No opposition filed within time limitpublished on 12.12.1990 [1990/50]
Applicant(s)For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, NY 10504 / US
[N/P]
Former [1986/30]For all designated states
International Business Machines Corporation
Old Orchard Road
Armonk, N.Y. 10504 / US
Inventor(s)01 / Babu, Suryadevara Vijayakumar
One Carol Court
Potsdam New York 13676 / US
02 / Horwath, Ronald Stephen
22 Floral Avenue
Binghampton New York 13905 / US
03 / Lu, Neng-hsing
1206 Park Manor Boulevard
Endwell New York 13760 / US
04 / Welsh, John Andrew
142 Helen Street
Binghampton New York 13905 / US
[1986/30]
Representative(s)Schröder, Otto Heinrich Albrecht, et al
IBM Corporation Säumerstrasse 4
8803 Rüschlikon / CH
[N/P]
Former [1986/46]Schröder, Otto H., Dr. Ing., et al
IBM Corporation Säumerstrasse 4
CH-8803 Rüschlikon / CH
Former [1986/30]Schröder, Otto H., Dr. Ing.
IBM Corporation Säumerstrasse 4
CH-8803 Rüschlikon / CH
Application number, filing date86100107.107.01.1986
[1986/30]
Priority number, dateUS1985069214517.01.1985         Original published format: US 692145
[1986/30]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0188206
Date:23.07.1986
Language:EN
[1986/30]
Type: A3 Search report 
No.:EP0188206
Date:07.10.1987
Language:EN
[1987/41]
Type: B1 Patent specification 
No.:EP0188206
Date:27.12.1989
Language:EN
[1989/52]
Search report(s)(Supplementary) European search report - dispatched on:EP17.08.1987
ClassificationIPC:H05H1/46, H01J37/32, C23C14/40, C23C16/50
[1987/37]
CPC:
H05H1/46 (EP,US); H01J37/32082 (EP,US); H01J37/32165 (EP,US);
H05K3/0055 (EP,US); H05K2203/095 (EP,US)
Former IPC [1986/30]H05H1/46, C23C14/40, C23C16/50, H01J37/32
Designated contracting statesDE,   FR,   GB [1986/30]
TitleGerman:Einrichtung zur Erzeugung eines im wesentlichen homogenen Plasmas[1986/30]
English:System for generating a substantially uniform plasma[1986/30]
French:Dispositif de génération de plasma principalement homogène[1986/30]
Examination procedure25.11.1986Examination requested  [1987/04]
25.10.1988Despatch of a communication from the examining division (Time limit: M04)
07.01.1989Reply to a communication from the examining division
14.04.1989Despatch of communication of intention to grant (Approval: Yes)
30.06.1989Communication of intention to grant the patent
16.08.1989Fee for grant paid
16.08.1989Fee for publishing/printing paid
Opposition(s)28.09.1990No opposition filed within time limit [1990/50]
Fees paidRenewal fee
26.01.1988Renewal fee patent year 03
27.01.1989Renewal fee patent year 04
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Documents cited:Search[A]JP59070762  ;
 [A]WO8301075  (ENGLE FRANK WESLEY [US]);
 [A]EP0016603  (FUJITSU LTD [JP])
 [A]  - PATENT ABSTRACTS OF JAPAN, vol. 8, no. 172 (C-237)[1609], 09th August 1984; & JP-A-59 070 762 (NIPPON SHINKU GIJUTSU K.K.) 21-04-1984, & JP59070762 A 00000000
ExaminationEP0099174
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.