EP0188206 - System for generating a substantially uniform plasma [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 20.10.1990 Database last updated on 24.08.2024 | Most recent event Tooltip | 20.10.1990 | No opposition filed within time limit | published on 12.12.1990 [1990/50] | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
Former [1986/30] | For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
Babu, Suryadevara Vijayakumar One Carol Court Potsdam New York 13676 / US | 02 /
Horwath, Ronald Stephen 22 Floral Avenue Binghampton New York 13905 / US | 03 /
Lu, Neng-hsing 1206 Park Manor Boulevard Endwell New York 13760 / US | 04 /
Welsh, John Andrew 142 Helen Street Binghampton New York 13905 / US | [1986/30] | Representative(s) | Schröder, Otto Heinrich Albrecht, et al IBM Corporation Säumerstrasse 4 8803 Rüschlikon / CH | [N/P] |
Former [1986/46] | Schröder, Otto H., Dr. Ing., et al IBM Corporation Säumerstrasse 4 CH-8803 Rüschlikon / CH | ||
Former [1986/30] | Schröder, Otto H., Dr. Ing. IBM Corporation Säumerstrasse 4 CH-8803 Rüschlikon / CH | Application number, filing date | 86100107.1 | 07.01.1986 | [1986/30] | Priority number, date | US19850692145 | 17.01.1985 Original published format: US 692145 | [1986/30] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0188206 | Date: | 23.07.1986 | Language: | EN | [1986/30] | Type: | A3 Search report | No.: | EP0188206 | Date: | 07.10.1987 | Language: | EN | [1987/41] | Type: | B1 Patent specification | No.: | EP0188206 | Date: | 27.12.1989 | Language: | EN | [1989/52] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.08.1987 | Classification | IPC: | H05H1/46, H01J37/32, C23C14/40, C23C16/50 | [1987/37] | CPC: |
H05H1/46 (EP,US);
H01J37/32082 (EP,US);
H01J37/32165 (EP,US);
H05K3/0055 (EP,US);
H05K2203/095 (EP,US)
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Former IPC [1986/30] | H05H1/46, C23C14/40, C23C16/50, H01J37/32 | Designated contracting states | DE, FR, GB [1986/30] | Title | German: | Einrichtung zur Erzeugung eines im wesentlichen homogenen Plasmas | [1986/30] | English: | System for generating a substantially uniform plasma | [1986/30] | French: | Dispositif de génération de plasma principalement homogène | [1986/30] | Examination procedure | 25.11.1986 | Examination requested [1987/04] | 25.10.1988 | Despatch of a communication from the examining division (Time limit: M04) | 07.01.1989 | Reply to a communication from the examining division | 14.04.1989 | Despatch of communication of intention to grant (Approval: Yes) | 30.06.1989 | Communication of intention to grant the patent | 16.08.1989 | Fee for grant paid | 16.08.1989 | Fee for publishing/printing paid | Opposition(s) | 28.09.1990 | No opposition filed within time limit [1990/50] | Fees paid | Renewal fee | 26.01.1988 | Renewal fee patent year 03 | 27.01.1989 | Renewal fee patent year 04 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]JP59070762 ; | [A]WO8301075 (ENGLE FRANK WESLEY [US]); | [A]EP0016603 (FUJITSU LTD [JP]) | [A] - PATENT ABSTRACTS OF JAPAN, vol. 8, no. 172 (C-237)[1609], 09th August 1984; & JP-A-59 070 762 (NIPPON SHINKU GIJUTSU K.K.) 21-04-1984, & JP59070762 A 00000000 | Examination | EP0099174 |