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EP0200086
European procedure
Extract from the Register of European Patents
EP About this file: EP0200086
| EP0200086 - Plasma chemical vapor deposition SI02-X coated articles and plasma assisted chemical vapor deposition method of applying the coating [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 30.05.1991 Database last updated on 19.07.2024 | Most recent event Tooltip | 30.05.1991 | No opposition filed within time limit | published on 17.07.1991 [1991/29] | Applicant(s) | For all designated states Ovonic Synthetic Materials Company, Inc. 1100 West Maple Road Troy Michigan 48084 / US | [N/P] |
| Former [1987/23] | For all designated states Ovonic Synthetic Materials Company, Inc. 1100 West Maple Road Troy Michigan 48084 / US | ||
| Former [1986/45] | For all designated states ENERGY CONVERSION DEVICES, INC. 1675 West Maple Road Troy Michigan 48084 / US | Inventor(s) | 01 /
Pai, Purnachandra 31320 Churchill Birmingham MI 48009 / US | 02 /
Chao, Benjamin S. 3513 Sherwood Dr. Troy MI 48084 / US | 03 /
Hart, Keith Laverne 29265 Aspen Flat Rock MI 48134 / US | 04 /
Takagi, Yasuo Stanford University Department of Material Science & Engineering Stanford CA 94305 / US | 05 /
Custer, Russ C. 339 South Batchewana Clawson MI 48017 / US | 06 /
Murata, Tomomi 2231-66, Kamigo-Cho Totsuka Yokohama / JP | 07 /
Ito, Satoshi 5-24-3-55, Fukazawa Setagaya-Ku Tokyo / JP | [1986/45] | Representative(s) | Müller, Hans-Jürgen, et al Müller Schupfner & Partner Patentanwälte Bavariaring 11 80336 München / DE | [N/P] |
| Former [1986/45] | Müller, Hans-Jürgen, Dipl.-Ing., et al Müller, Schupfner & Gauger Postfach 10 11 61 D-80085 München / DE | Application number, filing date | 86105164.7 | 15.04.1986 | [1986/45] | Priority number, date | US19850727314 | 25.04.1985 Original published format: US 727314 | [1986/45] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0200086 | Date: | 05.11.1986 | Language: | EN | [1986/45] | Type: | A3 Search report | No.: | EP0200086 | Date: | 16.06.1987 | Language: | EN | [1987/25] | Type: | B1 Patent specification | No.: | EP0200086 | Date: | 25.07.1990 | Language: | EN | [1990/30] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 29.04.1987 | Classification | IPC: | C23C16/40 | [1986/45] | CPC: |
C23C16/402 (EP,US);
C23C14/24 (KR);
C23C16/40 (KR)
| Designated contracting states | DE, FR, GB, IT, NL [1986/45] | Title | German: | Mit SiO2-x überzogene Gegenstände durch plasmachemische Abscheidung aus der Dampfphase Und Verfahren zur Herstellung solcher Überzüge durch plasmachemische Abscheidung aus der Dampfphase | [1986/45] | English: | Plasma chemical vapor deposition SI02-X coated articles and plasma assisted chemical vapor deposition method of applying the coating | [1986/45] | French: | Articles revêtus de SiO2-x par dépôt chimique à partir de la phase vapeur à l'aide d'un plasma et procédé de dépôt chimique à partir de la phase vapeur assisté par un plasma pour l'obtention de ce revêtement | [1986/45] | Examination procedure | 28.07.1987 | Examination requested [1987/39] | 05.07.1988 | Despatch of a communication from the examining division (Time limit: M04) | 06.10.1988 | Reply to a communication from the examining division | 15.12.1988 | Despatch of a communication from the examining division (Time limit: M04) | 13.04.1989 | Reply to a communication from the examining division | 11.05.1989 | Despatch of a communication from the examining division (Time limit: M02) | 11.07.1989 | Reply to a communication from the examining division | 16.10.1989 | Despatch of communication of intention to grant (Approval: Yes) | 17.01.1990 | Communication of intention to grant the patent | 16.03.1990 | Fee for grant paid | 16.03.1990 | Fee for publishing/printing paid | Opposition(s) | 26.04.1991 | No opposition filed within time limit [1991/29] | Fees paid | Renewal fee | 18.03.1988 | Renewal fee patent year 03 | 21.03.1989 | Renewal fee patent year 04 | 21.03.1990 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US4355052 (KAGANOWICZ GRZEGORZ, et al); | [Y]GB1463053 (CENTRAL ELECTR GENERAT BOARD); | [X]EP0046059 (FUJITSU LTD [JP]) | Examination | EP0104658 |